Predicted protein targets (top 7)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | HPGD | P15428 | 1/20 | 0.33 |
| ▸ | NCEH1 | Q6PIU2 | 1/20 | 0.33 |
| ▸ | HMGCR | P04035 | 1/20 | 0.32 |
| ▸ | PRKCI | P41743 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL706649 | 0.85 | TYR (0.38) | KDM4EALDH1A1GAAHPGDNCEH1 | |
| SCHEMBL18784878 | 0.82 | LTB4R (0.42) | KDM4EALDH1A1GAAHPGD | |
| SCHEMBL1711830 | 0.80 | KDM4E (0.39) | KDM4EALDH1A1GAAHPGDHMGCR | |
| SCHEMBL448419 | 0.78 | KDM4E (0.32) | KDM4EALDH1A1GAAHPGDNCEH1 | |
| SCHEMBL3627072 | 0.78 | KDM4E (0.32) | KDM4EALDH1A1GAAHPGDNCEH1 | |
| Ammonia Solution, Strong SCHEMBL5848979 | 0.78 | KDM4E (0.38) | KDM4EALDH1A1GAAHPGDHMGCR | |
| SCHEMBL1837919 | 0.76 | NCEH1 (0.46) | NCEH1HMGCRPRKCI | |
| SCHEMBL8848990 | 0.76 | KDM4E (0.31) | KDM4EALDH1A1GAAHPGDNCEH1 | |
| SCHEMBL3627074 | 0.76 | NCEH1 (0.33) | KDM4EALDH1A1GAAHPGDNCEH1 | |
| SCHEMBL448420 | 0.76 | NCEH1 (0.33) | KDM4EALDH1A1GAAHPGDNCEH1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 18 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7129311-B2 | Additives to prevent degradation of alkyl-hydrogen siloxanes | ARCH SPECIALTY CHEMICALS, INC. (US) | 2006-10-31 | — | — | US | claimed |
| US-20060159861-A1 | Additives to prevent degradation of alkyl-hydrogen siloxanes | ARCH SPECIALTY CHEMICALS, INC. (US) | 2006-07-20 | — | — | US | claimed |
| EP-1573086-A2 | ADDITIVES TO PREVENT DEGRADATION OF ALKYL-HYDROGEN SILOXANES | Arch Specialty Chemicals, Inc. (US) | 2005-09-14 | — | — | EP | claimed |
| US-20040127070-A1 | Additives to prevent degradation of alkyl-hydrogen siloxanes | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-01 | — | — | US | claimed |
| WO-2004027110-A2 | ADDITIVES TO PREVENT DEGRADATION OF ALKYL-HYDROGEN SILOXANES | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-04-01 | — | — | WO | claimed |
| US-9546237-B2 | Stabilization of polymers that contain a hydrolyzable functionality | BRIDGESTONE CORPORATION (JP) | 2017-01-17 | — | — | US | disclosed |
| US-20130331520-A1 | STABILIZATION OF POLYMERS THAT CONTAIN A HYDROLYZABLE FUNCTIONALITY | BRIDGESTONE CORPORATION (JP) | 2013-12-12 | — | — | US | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-7531590-B2 | Additives to prevent degradation of alkyl-hydrogen siloxanes | FUJIFILM ELECTRONIC MATERIALS U.S.A., INC. (US) | 2009-05-12 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| US-20060270787-A1 | Additives to prevent degradation of alkyl-hydrogen siloxanes | VERSUM MATERIALS US, LLC | 2006-11-30 | — | — | US | disclosed |
| US-7129311-B2 | Additives to prevent degradation of alkyl-hydrogen siloxanes | ARCH SPECIALTY CHEMICALS, INC. (US) | 2006-10-31 | — | — | US | disclosed |
| US-20060159861-A1 | Additives to prevent degradation of alkyl-hydrogen siloxanes | ARCH SPECIALTY CHEMICALS, INC. (US) | 2006-07-20 | — | — | US | disclosed |
| EP-1573086-A2 | ADDITIVES TO PREVENT DEGRADATION OF ALKYL-HYDROGEN SILOXANES | Arch Specialty Chemicals, Inc. (US) | 2005-09-14 | — | — | EP | disclosed |
| US-20040127070-A1 | Additives to prevent degradation of alkyl-hydrogen siloxanes | ARCH SPECIALTY CHEMICALS, INC. | 2004-07-01 | — | — | US | disclosed |
| WO-2004027110-A2 | ADDITIVES TO PREVENT DEGRADATION OF ALKYL-HYDROGEN SILOXANES | ARCH SPECIALTY CHEMICALS, INC. (US) | 2004-04-01 | — | — | WO | disclosed |