SCHEMBL7047424

SCHEMBL7047424

O=C(O)C1CC2(C3CC4CCC3C4)C=CC1C2

nearest known ligand 0.35

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 1/20 0.32
POLB P06746 1/20 0.30
HPGD P15428 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7046424 0.78
SCHEMBL7050826 0.76
SCHEMBL4170806 0.70
SCHEMBL4174620 0.70 HSD11B1 (0.32)
SCHEMBL8742210 0.64 POLB (0.55) L3MBTL1POLBHPGD
SCHEMBL15057174 0.64 POLB (0.55) L3MBTL1POLBHPGD
SCHEMBL18629176 0.64 POLB (0.55) L3MBTL1POLBHPGD
SCHEMBL18628994 0.64 POLB (0.55) L3MBTL1POLBHPGD
SCHEMBL744692 0.64 POLB (0.55) L3MBTL1POLBHPGD
SCHEMBL13012405 0.64 POLB (0.55) L3MBTL1POLBHPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20030219680-A1 Photoresists useful for microfabrication utilizing deep ultraviolet rays such as an excimer laser, x-rays such as synchrotron radiation, and electron beams JSR CORPORATION (JP) 2003-11-27 US disclosed