⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1123060 | 0.80 | — | — | |
| SCHEMBL2044088 | 0.78 | — | — | |
| SCHEMBL15090757 | 0.75 | — | — | |
| SCHEMBL11231412 | 0.73 | ALDH1A1 (0.30) | — | |
| Hydrochloric Acid SCHEMBL308639 | 0.71 | — | — | |
| SCHEMBL29201665 | 0.71 | — | — | |
| SCHEMBL23093307 | 0.69 | — | — | |
| SCHEMBL365877 | 0.69 | ALDH1A1 (0.30) | — | |
| SCHEMBL23093202 | 0.67 | — | — | |
| SCHEMBL14841059 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| CN-101472959-A | Ziegler-Natta catalyst with in situ-generated donor | NOVOLEN TECH HOLDINGS CV (NL) | 2009-07-01 | — | — | CN | disclosed |
| CN-100501532-C | Liquid crystal directing agent, liquid crystal oriented film and liquid crystal display element | JSR CORP (JP) | 2009-06-17 | — | — | CN | disclosed |
| CN-100367472-C | Material for insulating film containing organic silane compound, method for producing the same, and semiconductor device | TOKURI CO LTD (JP) | 2008-02-06 | — | — | CN | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| CN-1664657-A | Liquid crystal directing agent, liquid crystal oriented film and liquid crystal indicator element | JSR CORP (JP) | 2005-09-07 | — | — | CN | disclosed |
| CN-1437228-A | Material for insulating film containing organic silane compound, method for producing the same, and semiconductor device | TOKURI CO LTD (JP) | 2003-08-20 | — | — | CN | disclosed |