SCHEMBL705125

SCHEMBL705125

CC[SiH](F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7713843 0.74
Propane SCHEMBL23701107 0.67
Fluoromethane SCHEMBL28237587 0.63
SCHEMBL23701183 0.62
SCHEMBL23701149 0.62
SCHEMBL23701105 0.62
SCHEMBL4309 0.59
SCHEMBL467769 0.59
SCHEMBL6308113 0.59
SCHEMBL296998 0.59

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200165180-A1 METHOD FOR PRODUCING AND PURIFYING 2,3,3,3-TETRAFLUORO-1-PROPENE ARKEMA FRANCE (FR) 2020-05-28 US claimed
EP-3394016-A1 METHOD FOR PRODUCING AND PURIFYING 2,3,3,3-TETRAFLUORO-1-PROPENE Arkema France (FR) 2018-10-31 EP claimed
WO-2017108519-A1 METHOD FOR PRODUCING AND PURIFYING 2,3,3,3-TETRAFLUORO-1-PROPENE ARKEMA FRANCE (FR) 2017-06-29 WO claimed
US-12371447-B2 Method for producing (meth)acryloxy group-containing organosilicon compounds SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-07-29 US disclosed
WO-2024181754-A1 DIELECTRIC FILM FOR ELECTROWETTING ㈜쓰리나인 2024-09-06 WO disclosed
EP-4174076-B1 METHOD FOR PRODUCING (METH)ACRYLOXY GROUP-CONTAINING ORGANOSILICON COMPOUNDS SHINETSU CHEMICAL CO (JP) 2024-07-24 EP disclosed
US-12012486-B2 System and method for a semi-continuous process for producing polysilazanes A/G INNOVATION PARTNERS, LTD. (US) 2024-06-18 US disclosed
EP-3394016-B1 METHOD FOR PRODUCING AND PURIFYING 2,3,3,3-TETRAFLUORO-1-PROPENE ARKEMA FRANCE (FR) 2023-05-10 EP disclosed
US-20230134471-A1 METHOD FOR PRODUCING (METH)ACRYLOXY GROUP-CONTAINING ORGANOSILICON COMPOUNDS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2023-05-04 US disclosed
EP-4174076-A1 METHOD FOR PRODUCING (METH)ACRYLOXY GROUP-CONTAINING ORGANOSILICON COMPOUNDS Shin-Etsu Chemical Co., Ltd. (JP) 2023-05-03 EP disclosed
CN-116041382-A Method for producing organosilicon compounds containing (meth) acryloxy groups 信越化学工业株式会社 2023-05-02 CN disclosed
US-20030083453-A1 Thermally stable, moisture curable polysilazanes and polysiloxazanes KION CORPORATION 2003-05-01 US disclosed
US-6534184-B2 Coatings/protective coatings having heat and corrosion resistance, and adhesion derived from the polysilazane and superior gloss, durability, waterproofing, oil rellency and release properties derived from the polysiloxane KION CORPORATION 2003-03-18 US disclosed
WO-2002090108-A2 THERMALLY STABLE, MOISTURE CURABLE POLYSILAZANES AND POLYSILOXAZANES KION CORPORATION (US) 2002-11-14 WO disclosed
US-20020165319-A1 Polysilazane/polysiloxane block copolymers AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.À R.L. (LU) 2002-11-07 US disclosed
WO-2002068535-A1 POLYSILAZANE/POLYSILOXANE BLOCK COPOLYMERS KION CORPORATION (US) 2002-09-06 WO disclosed
EP-1232162-A1 NOVEL SILAZANE AND/OR POLYSILAZANE COMPOUNDS AND METHODS OF MAKING Kion Corporation (US) 2002-08-21 EP disclosed
WO-2001036427-A9 NOVEL SILAZANE AND/OR POLYSILAZANE COMPOUNDS AND METHODS OF MAKING KION CORP (US) 2002-08-15 WO disclosed
US-6329487-B1 CAN BE PYROLYZED TO YIELD CERAMIC MATERIALS, SUCH AS SILICON CARBIDE AND SILICON NITRIDE KION CORPORATION 2001-12-11 US disclosed
WO-2001036427-A1 NOVEL SILAZANE AND/OR POLYSILAZANE COMPOUNDS AND METHODS OF MAKING KION CORPORATION (US) 2001-05-25 WO disclosed