SCHEMBL705522

SCHEMBL705522

CCCCCCCCn1c2ccc(C(=O)C(C)(C)N3CCOCC3)cc2c2cc(C(=O)C(C)(C)N3CCOCC3)ccc21

nearest known ligand 0.62

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
CNR2 P34972 18/20 0.62
CNR1 P21554 2/20 0.51
ALDH1A1 P00352 1/20 0.47
TSHR P16473 1/20 0.47
MAPK1 P28482 1/20 0.47
SMN1; SMN2 Q16637 1/20 0.47
NPC1 O15118 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29413745 1.00 CNR2 (0.62) CNR2CNR1ALDH1A1TSHRMAPK1
SCHEMBL29415349 1.00 CNR2 (0.62) CNR2CNR1ALDH1A1TSHRMAPK1
SCHEMBL476866 1.00 CNR2 (0.62) CNR2CNR1ALDH1A1TSHRMAPK1
SCHEMBL29391189 0.95 CNR2 (0.59) CNR2CNR1ALDH1A1TSHRMAPK1
SCHEMBL262367 0.95 CNR2 (0.59) CNR2CNR1ALDH1A1TSHRMAPK1
SCHEMBL15387690 0.91 CNR2 (0.58) CNR2CNR1ALDH1A1TSHRMAPK1
SCHEMBL9266413 0.91 CNR2 (0.54) CNR2CNR1ALDH1A1TSHRMAPK1
SCHEMBL9762472 0.90 CNR2 (0.68) CNR2CNR1ALDH1A1NPC1
SCHEMBL13318972 0.87 CNR2 (0.51) CNR2CNR1ALDH1A1TSHRMAPK1
SCHEMBL23533403 0.86 CNR2 (0.48) CNR2ALDH1A1TSHRMAPK1SMN1; SMN2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 329 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2820073-B1 GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK ELECTRONICS FOR IMAGING INC (US) 2018-09-05 EP claimed
US-9260616-B2 Gloss-controllable, radiation-curable inkjet ink ELECTRONICS FOR IMAGING, INC. (US) 2016-02-16 US claimed
CN-104508025-A Gloss-controllable, radiation-curable inkjet inks ELECTRONICS FOR IMAGING INC 2015-04-08 CN claimed
US-20130222499-A1 GLOSS-CONTROLLABLE, RADIATION-CURABLE INKJET INK GLAS USA LLC [SUCCESSOR COLLATERAL AGENT] 2013-08-29 US claimed
US-7670749-B2 Resist material and method for forming a patterned resist layer on a substrate THE UNIVERSITY OF BIRMINGHAM (GB) 2010-03-02 US claimed
EP-1789850-B1 NOVEL RESIST MATERIAL AND METHOD FOR FORMING A PATTERNED RESIST LAYER ON A SUBSTRATE UNIV BIRMINGHAM (GB) 2008-10-01 EP claimed
US-20070298328-A1 Novel Resist Material and Method for Forming a Patterned Resist Layer on a Substrate UNIVERSITY OF BIRMINGHAM, THE (GB) 2007-12-27 US claimed
EP-1789850-A2 NOVEL RESIST MATERIAL AND METHOD FOR FORMING A PATTERNED RESIST LAYER ON A SUBSTRATE The University of Birmingham (GB) 2007-05-30 EP claimed
WO-2006030239-A2 NOVEL RESIST MATERIAL AND METHOD FOR FORMING A PATTERNED RESIST LAYER ON A SUBSTRATE THE UNIVERSITY OF BIRMINGHAM (GB) 2006-03-23 WO claimed
US-20020042022-A1 Alkylphenylbisacylphosphine oxides and photoinitiator mixtures LEPPARD DAVID GEORGE (CH) 2002-04-11 US claimed
US-6361925-B1 WHICH ARE CAPABLE OF CURING PHOTOPOLYMERIZABLE COMPOSITIONS EFFICIENTLY AND WITHOUT EXTREME YELLOWING CIBA SPECIALTY CHEMICALS CORPORATION 2002-03-26 US claimed
US-12548830-B2 All-solid-state battery and photocurable composition used in all-solid-state battery TOYOTA JIDOSHA KABUSHIKI KAISHA (JP) 2026-02-10 US disclosed
EP-3765060-B1 EMBEDDING MEDIUM OF BIOLOGICAL SAMPLE FOR ITS IMAGING BY LIGHT AND/OR ELECTRON MICROSCOPY CRYOCAPCELL (FR) 2025-09-03 EP disclosed
US-20250199401-A1 RESIN COMPOSITION, CURED PRODUCT, ELECTRONIC COMPONENT, AND DISPLAY DEVICE TORAY INDUSTRIES, INC. (JP) 2025-06-19 US disclosed
US-20250172873-A1 PHOTOSENSITIVE RESIN COMPOSITION, CURED ARTICLE, METHOD FOR MANUFACTURING CURED ARTICLE, ORGANIC EL DISPLAY DEVICE, AND DISPLAY DEVICE TORAY INDUSTRIES, INC. (JP) 2025-05-29 US disclosed
US-20020137816-A1 Phase change inks XEROX CORPORATION 2002-09-26 US disclosed
US-20020042022-A1 Alkylphenylbisacylphosphine oxides and photoinitiator mixtures LEPPARD DAVID GEORGE (CH) 2002-04-11 US disclosed
US-6361925-B1 WHICH ARE CAPABLE OF CURING PHOTOPOLYMERIZABLE COMPOSITIONS EFFICIENTLY AND WITHOUT EXTREME YELLOWING CIBA SPECIALTY CHEMICALS CORPORATION 2002-03-26 US disclosed
US-6336963-B1 INK COMPOSITION COMPRISING INK VEHICLE COMPRISING FIRST NITRILE COMPOUND HAVING FIRST VISCOSITY AT MELT TEMPERATURE, VISCOSITY MODIFIER COMPRISING SECOND NITRILE COMPOUND HAVING LOWER VISCOSITY AT MELT TEMPERATURE, COLORANT XEROX CORPORATION 2002-01-08 US disclosed
US-6020528-A Alkylphenylbisacylphosphine oxides and photoinitiator mixtures CIBA SPECIALTY CHEMICALS CORPORATION (US) 2000-02-01 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-12548830-B2 All-solid-state battery and photocurable composition used in all-solid-state battery SETDB1, SEM1, EIF2B1 CNR2 4695/4885CNR1 4773/4885ALDH1A1 336/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.