Predicted protein targets (top 18)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | HDAC8 | Q9BY41 | 1/20 | 0.67 |
| ▸ | HDAC6 | Q9UBN7 | 1/20 | 0.67 |
| ▸ | CES2 | O00748 | 1/20 | 0.55 |
| ▸ | CES1 | P23141 | 1/20 | 0.55 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.54 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.50 |
| ▸ | TSHR | P16473 | 3/20 | 0.50 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.50 |
| ▸ | HPGD | P15428 | 2/20 | 0.48 |
| ▸ | POLB | P06746 | 2/20 | 0.48 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.48 |
| ▸ | MAPT | P10636 | 1/20 | 0.48 |
| ▸ | HTT | P42858 | 1/20 | 0.48 |
| ▸ | PTPN1 | P18031 | 1/20 | 0.48 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.46 |
| ▸ | RAB9A | P51151 | 2/20 | 0.46 |
| ▸ | NPC1 | O15118 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11291275 | 0.91 | HDAC8 (0.55) | HDAC8HDAC6CES2CES1EPHX1 | |
| SCHEMBL19325393 | 0.87 | HDAC8 (0.58) | HDAC8HDAC6CES2CES1EPHX1 | |
| SCHEMBL20565788 | 0.87 | HDAC8 (0.58) | HDAC8HDAC6CES2CES1EPHX1 | |
| SCHEMBL917236 | 0.85 | HDAC8 (0.56) | HDAC8HDAC6CES2CES1EPHX1 | |
| SCHEMBL20427412 | 0.85 | HDAC8 (0.56) | HDAC8HDAC6CES2CES1EPHX1 | |
| SCHEMBL20787869 | 0.85 | HDAC8 (0.56) | HDAC8HDAC6CES2CES1EPHX1 | |
| SCHEMBL8332232 | 0.85 | HDAC8 (0.56) | HDAC8HDAC6CES2CES1EPHX1 | |
| SCHEMBL246975 | 0.84 | POLB (0.48) | HDAC8HDAC6EPHX1ALDH1A1HPGD | |
| SCHEMBL12323193 | 0.82 | HDAC8 (0.67) | HDAC8HDAC6CES2CES1EPHX1 | |
| SCHEMBL23368629 | 0.81 | HDAC8 (0.52) | HDAC8HDAC6CES2CES1EPHX1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9766545-B2 | Methods for small trench patterning using chemical amplified photoresist compositions | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2017-09-19 | — | — | US | disclosed |
| US-20150331324-A1 | Methods for Small Trench Patterning Using Chemical Amplified Photoresist Compositions | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2015-11-19 | — | — | US | disclosed |
| US-9093276-B2 | Methods for small trench patterning using chemical amplified photoresist compositions | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2015-07-28 | — | — | US | disclosed |
| US-20140065552-A1 | Methods For Small Trench Patterning Using Chemical Amplified Photoresist Compositions | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2014-03-06 | — | — | US | disclosed |
| US-8592137-B2 | Methods for small trench patterning using chemical amplified photoresist compositions | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2013-11-26 | — | — | US | disclosed |
| US-20130155381-A1 | METHODS FOR SMALL TRENCH PATTERNING USING CHEMICAL AMPLIFIED PHOTORESIST COMPOSITIONS | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LTD. (TW) | 2013-06-20 | — | — | US | disclosed |
| EP-1117003-B1 | Process of preparing a chemical amplification type resist composition | SHINETSU CHEMICAL CO (JP) | 2012-06-20 | — | — | EP | disclosed |
| EP-1399149-A2 | TAXANE PRODRUGS | Nobex Corporation (US) | 2004-03-24 | — | — | EP | disclosed |
| US-6653044-B2 | Addition copolymer | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2003-11-25 | — | — | US | disclosed |
| WO-2002072010-A2 | TAXANE PRODRUGS | NOBEX CORPORATION (US) | 2002-09-19 | — | — | WO | disclosed |
| US-20010036593-A1 | Chemical amplification type resist composition | SHIN-ETSU CHEMICAL CO., LTD. | 2001-11-01 | — | — | US | disclosed |
| EP-1117003-A1 | Chemical amplification type resist composition | Shin-Etsu Chemical Co., Ltd. (JP) | 2001-07-18 | — | — | EP | disclosed |