SCHEMBL7058435

SCHEMBL7058435

CC(C)(C)OC(=O)c1cc(C(=O)OC(C)(C)C)cc(C(=O)OC(C)(C)C)c1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CA12 O43570 2/20 0.47
CA1 P00915 2/20 0.47
CA2 P00918 2/20 0.47
CA9 Q16790 2/20 0.47
CA14 Q9ULX7 2/20 0.47
GABRA1 P14867 2/20 0.45
GABRG2 P18507 2/20 0.45
GABRB3 P28472 2/20 0.45
GABRA3 P34903 2/20 0.45
GABRA2 P47869 2/20 0.45
SLC7A5 Q01650 1/20 0.44
ELANE P08246 2/20 0.41
SERPINE1 P05121 2/20 0.39
CA7 P43166 1/20 0.39
TDP1 Q9NUW8 2/20 0.39
ALDH1A1 P00352 1/20 0.39
TSHR P16473 1/20 0.39
HSD17B10 Q99714 1/20 0.39
STAT3 P40763 2/20 0.39
ALOX15 P16050 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17747120 0.91 CA1 (0.54) CA12CA1CA2CA9CA14
SCHEMBL4530957 0.91 CA12 (0.54) CA12CA1CA2CA9CA14
SCHEMBL3403399 0.91 TPMT (0.43) CA12CA1CA2CA9CA14
SCHEMBL6577887 0.91 TPMT (0.43) CA12CA1CA2CA9CA14
SCHEMBL106447 0.91 CYP2C19 (0.43) CA12CA1CA2CA9CA14
SCHEMBL7595533 0.89 NOTUM (0.47) CA12CA1CA2CA9CA14
SCHEMBL12534669 0.89 CA12 (0.41) CA12CA1CA2CA9CA14
SCHEMBL8122251 0.89 CA12 (0.45) CA12CA1CA2CA9CA14
SCHEMBL13705731 0.89 CA12 (0.41) CA12CA1CA2CA9CA14
SCHEMBL110296 0.86 SLC7A5 (0.58) CA12CA1CA2CA9CA14

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7534547-B2 Optically active compound and photosensitive resin composition OSAKA GAS COMPANY LIMITED (JP) 2009-05-19 US disclosed
US-6582878-B2 Coating on substrate chemical amplification resist comprising alkali-soluble base resin, photoacid generator and dissolution inhibitor, exposing coating to patterning radiation to decompose dissolution inhibitor, developing with aqueous base FUJITSU LIMITED (JP) 2003-06-24 US disclosed
EP-1314714-A2 Method for hydrogenating benzene polycarboxylic acids or derivatives thereof by using a catalyst containing macropores BASF AKTIENGESELLSCHAFT (DE) 2003-05-28 EP disclosed
EP-1042273-B1 METHOD FOR HYDROGENATING BENZENE POLYCARBOXYLIC ACIDS OR DERIVATIVES THEREOF BY USING A CATALYST CONTAINING MACROPORES BASF AG (DE) 2003-05-07 EP disclosed
US-20030073027-A1 Chemical amplification resist compositions and process for the formation of resist patterns FUJITSU LIMITED (JP) 2003-04-17 US disclosed
US-6200724-B1 CHEMICAL AMPLIFICATION RESIST COMPRISES AN ALKALI-SOLUBLE BASE RESIN, A PHOTOACID GENERATOR AND A DISSOLUTION INHIBITOR, IN WHICH A CYCLIC STRUCTURE FORMS A MATRIX PORTION CONTAINS ONE LONE PAIR CONTAINING PORTION FUJITSU LIMITED (JP) 2001-03-13 US disclosed
EP-1042273-A1 METHOD FOR HYDROGENATING BENZENE POLYCARBOXYLIC ACIDS OR DERIVATIVES THEREOF BY USING A CATALYST CONTAINING MACROPORES BASF AKTIENGESELLSCHAFT (DE) 2000-10-11 EP disclosed
WO-1999032427-A1 METHOD FOR HYDROGENATING BENZENE POLYCARBOXYLIC ACIDS OR DERIVATIVES THEREOF BY USING A CATALYST CONTAINING MACROPORES BASF AKTIENGESELLSCHAFT (DE) 1999-07-01 WO disclosed