Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP2C19 | P33261 | 2/20 | 0.43 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.43 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.43 |
| ▸ | TPMT | P51580 | 1/20 | 0.43 |
| ▸ | CA12 | O43570 | 1/20 | 0.42 |
| ▸ | CA1 | P00915 | 1/20 | 0.42 |
| ▸ | CA2 | P00918 | 1/20 | 0.42 |
| ▸ | CA9 | Q16790 | 1/20 | 0.42 |
| ▸ | CA14 | Q9ULX7 | 1/20 | 0.42 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.41 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.41 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.41 |
| ▸ | GABRA3 | P34903 | 1/20 | 0.41 |
| ▸ | GABRA2 | P47869 | 1/20 | 0.41 |
| ▸ | SLC7A5 | Q01650 | 2/20 | 0.40 |
| ▸ | CNR2 | P34972 | 1/20 | 0.38 |
| ▸ | HCAR1 | Q9BXC0 | 1/20 | 0.38 |
| ▸ | ATM | Q13315 | 1/20 | 0.37 |
| ▸ | SRD5A1 | P18405 | 1/20 | 0.37 |
| ▸ | MEN1 | O00255 | 2/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16406592 | 0.96 | TPMT (0.48) | CYP2C19CYP2C9NPSR1TPMTCA12 | |
| SCHEMBL25708271 | 0.92 | TPMT (0.57) | CYP2C19CYP2C9NPSR1TPMTCA12 | |
| SCHEMBL7058435 | 0.91 | CA12 (0.47) | CYP2C19CYP2C9NPSR1CA12CA1 | |
| SCHEMBL16518349 | 0.87 | NOTUM (0.42) | CYP2C19CYP2C9NPSR1TPMTCA12 | |
| SCHEMBL17747120 | 0.83 | CA1 (0.54) | CA12CA1CA2CA9CA14 | |
| SCHEMBL3403399 | 0.83 | TPMT (0.43) | CYP2C19CYP2C9TPMTCA12CA1 | |
| SCHEMBL6577887 | 0.83 | TPMT (0.43) | CYP2C19CYP2C9TPMTCA12CA1 | |
| SCHEMBL4530957 | 0.83 | CA12 (0.54) | CA12CA1CA2CA9CA14 | |
| SCHEMBL15681471 | 0.81 | ELANE (0.44) | CYP2C19CYP2C9NPSR1CA12CA1 | |
| SCHEMBL8122251 | 0.81 | CA12 (0.45) | CA12CA1CA2CA9CA14 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 246 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2020157128-A1 | SILICON-FLUORIDE ACCEPTOR SUBSTITUTED RADIOPHARMACEUTICALS AND PRECURSORS THEREOF | Technische Universität München (DE) | 2020-08-06 | — | — | WO | disclosed |
| US-10031419-B2 | Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device | FUJIFILM CORPORATION (JP) | 2018-07-24 | — | — | US | disclosed |
| US-9915870-B2 | Pattern forming method, composition kit and resist film, and method for producing electronic device using them, and electronic device | FUJIFILM CORPORATION (JP) | 2018-03-13 | — | — | US | disclosed |
| US-20180051149-A1 | HARDCOAT FILM, POLARIZING PLATE, AND TOUCH PANEL DISPLAY | FUJIFILM CORPORATION (JP) | 2018-02-22 | — | — | US | disclosed |
| US-9897922-B2 | Method of forming pattern and developer for use in the method | FUJIFILM CORPORATION (JP) | 2018-02-20 | — | — | US | disclosed |
| US-9835945-B2 | Positive resist composition and method of pattern formation with the same | FUJIFILM CORPORATION (JP) | 2017-12-05 | — | — | US | disclosed |
| US-9829796-B2 | Pattern formation method, active light-sensitive or radiation-sensitive resin composition, resist film, production method for electronic device using same, and electronic device | FUJIFILM CORPORATION (JP) | 2017-11-28 | — | — | US | disclosed |
| US-20170285482-A1 | ORGANIC PROCESSING LIQUID AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2017-10-05 | — | — | US | disclosed |
| US-9766547-B2 | Pattern forming method, actinic ray-sensitive or radiation-sensitive resin composition, resist film, method of manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2017-09-19 | — | — | US | disclosed |
| US-9760003-B2 | Pattern forming method and actinic-ray- or radiation-sensitive resin composition | FUJIFILM CORPORATION (JP) | 2017-09-12 | — | — | US | disclosed |
| US-20110014570-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2011-01-20 | — | — | US | disclosed |
| US-20110008731-A1 | ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2011-01-13 | — | — | US | disclosed |
| US-20100015554-A1 | ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-01-21 | — | — | US | disclosed |
| EP-1141335-B1 | CHEMICALLY MODIFIED ENZYMES WITH MULTIPLE CHARGED VARIANTS | GENENCOR INT (US) | 2009-08-05 | — | — | EP | disclosed |
| US-7371553-B2 | Chemically modified enzymes with multiple charged variants | GENENCOR INTERNATIONAL, INC. (US) | 2008-05-13 | — | — | US | disclosed |
| US-20050089966-A1 | Chemically modified enzymes with multiple charged variants | DAVID BENJAMIN G (GB) | 2005-04-28 | — | — | US | disclosed |
| US-20020127695-A1 | Chemically modified enzymes with multiple charged variants | GENENCOR INTERNATIONAL, INC. | 2002-09-12 | — | — | US | disclosed |
| US-6379942-B1 | SUBTILISIN ENZYME, WITH CYSTEINE RESIDUES AT GIVE AMINO ACID SEQUENCE POSITIONS, WHERE THE THIOL HYDROGEN IN THE CYSTEINE RESIDUE IS REPLACED, PROVIDING A SIDE CHAIN IWTH A MULTIPLY CHARGED MOIETY; DETERGENTS | GENENCOR INTERNATIONAL, INC. | 2002-04-30 | — | — | US | disclosed |
| EP-1141335-A2 | CHEMICALLY MODIFIED ENZYMES WITH MULTIPLE CHARGED VARIANTS | GENENCOR INTERNATIONAL, INC. (US) | 2001-10-10 | — | — | EP | disclosed |
| WO-2000037658-A2 | CHEMICALLY MODIFIED ENZYMES WITH MULTIPLE CHARGED VARIANTS | GENENCOR INTERNATIONAL, INC. (US) | 2000-06-29 | — | — | WO | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20110008731-A1 | ACTINIC-RAY-OR RADIATION-SENSITIVE RESIN COMPOSITION, COMPOUND AND METHOD OF FORMING PATTERN USING THE COMPOSITION | RER1, XRN2, RXRA | CYP2C19 3524/4885CYP2C9 4074/4885NPSR1 1450/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.