SCHEMBL705855

SCHEMBL705855

CO[SiH2]C(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL505237 0.70
SCHEMBL11304502 0.69
SCHEMBL8846733 0.69
SCHEMBL707000 0.64
SCHEMBL251798 0.64
SCHEMBL18431078 0.64
SCHEMBL7039492 0.64
SCHEMBL16553510 0.64
SCHEMBL12228801 0.63
SCHEMBL12971280 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 98 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2025264567-A1 LOW-K FILM COEFFICIENT OF THERMAL EXPANSION MODULATION BY UV TREATMENT APPLIED MATERIALS, INC. (US) 2025-12-26 WO claimed
US-20250391656-A1 LOW-K FILM COEFFICIENT OF THERMAL EXPANSION MODULATION BY UV TREATMENT APPLIED MATERIALS INC (US) 2025-12-25 US claimed
US-20250357107-A1 RF PULSING ASSISTED LOW-K MATERIAL DEPOSITION WITH HIGH DENSITY APPLIED MATERIALS, INC. (US) 2025-11-20 US claimed
WO-2025049147-A1 METHODS FOR FORMING LOW-K DIELECTRIC MATERIALS WITH REDUCED DIELECTRIC CONSTANT AND HIGH MECHANICAL STRENGTH APPLIED MATERIALS, INC. (US) 2025-03-06 WO claimed
US-20250069884-A1 METHODS FOR FORMING LOW-K DIELECTRIC MATERIALS WITH REDUCED DIELECTRIC CONSTANT AND HIGH MECHANICAL STRENGTH APPLIED MATERIALS, INC. (US) 2025-02-27 US claimed
WO-2025038375-A1 METHODS FOR FORMING LOW-Κ DIELECTRIC MATERIALS WITH REDUCED DIELECTRIC CONSTANT AND INCREASED DENSITY APPLIED MATERIALS, INC. (US) 2025-02-20 WO claimed
WO-2024238097-A1 METHODS FOR FORMING LOW-Κ DIELECTRIC MATERIALS WITH INCREASED ETCH SELECTIVITY APPLIED MATERIALS, INC. (US) 2024-11-21 WO claimed
WO-2024226342-A1 METHODS FOR FORMING LOW-Κ DIELECTRIC MATERIALS APPLIED MATERIALS, INC. (US) 2024-10-31 WO claimed
CN-118546527-A Preparation method of modified organic silicon composition 南京瑞思化学技术有限公司 2024-08-27 CN claimed
CN-114316299-B Method for improving stability of organosilicon emulsion 南京瑞思化学技术有限公司 2024-08-13 CN claimed
WO-2015132577-A1 PYRIDINE DERIVATIVES AND METHODS OF USE LINK TECHNOLOGIES LIMITED (GB) 2015-09-11 WO claimed
US-20260018409-A1 POST TREATMENT PROCESSES APPLIED MATERIALS INC (US) 2026-01-15 US disclosed
WO-2025264567-A1 LOW-K FILM COEFFICIENT OF THERMAL EXPANSION MODULATION BY UV TREATMENT APPLIED MATERIALS, INC. (US) 2025-12-26 WO disclosed
US-20250391656-A1 LOW-K FILM COEFFICIENT OF THERMAL EXPANSION MODULATION BY UV TREATMENT APPLIED MATERIALS INC (US) 2025-12-25 US disclosed
US-20250369102-A1 LOWER K AND HIGHER HARDNESS WITH IMPROVED PLASMA INDUCED DAMAGE (PID) DIELECTRIC FILM DEPOSITION APPLIED MATERIALS INC (US) 2025-12-04 US disclosed
US-20060285194-A1 Display medium, display device and display method using the display medium FUJI XEROX CO., LTD. 2006-12-21 US disclosed
US-20060285195-A1 Display medium, display device and display method using the display medium FUJI XEROX CO., LTD. 2006-12-21 US disclosed
CN-1289536-C Oleifin polymerization catalyst, catalyst component for olefin polymerization, method of storing these, and process for producing olefin polymer SUNALLOMER LTD (JP) 2006-12-13 CN disclosed
WO-2006038735-A1 RESIN COMPOSITION FOR OPTICAL PACKAGING MATERIAL AND PROCESS FOR PREPARING THE SAME, AND OPTICAL PACKAGING MATERIAL, OPTICAL PACKAGING COMPONENT, AND OPTICAL MODULE NIPPON SHOKUBAI CO., LTD. (JP) 2006-04-13 WO disclosed
CN-1481394-A Olefin polymerization catalyst, olefin polymerization catalyst component and method for storing the same, and process for producing olefin polymer 胜亚诺盟股份有限公司 2004-03-10 CN disclosed