⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6709810 | 0.77 | — | — | |
| SCHEMBL8613555 | 0.72 | — | — | |
| SCHEMBL706060 | 0.67 | — | — | |
| SCHEMBL1066530 | 0.65 | — | — | |
| SCHEMBL3754808 | 0.65 | — | — | |
| SCHEMBL705855 | 0.64 | — | — | |
| SCHEMBL5930655 | 0.64 | — | — | |
| SCHEMBL8015485 | 0.64 | — | — | |
| SCHEMBL16553510 | 0.61 | — | — | |
| SCHEMBL251798 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| CN-101472959-A | Ziegler-Natta catalyst with in situ-generated donor | NOVOLEN TECH HOLDINGS CV (NL) | 2009-07-01 | — | — | CN | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| US-4395357-A | ABSORBERS; ADSORBERS; ANIMALS; SANITATION | MARS INC. (US) | 1983-07-26 | — | — | US | disclosed |
| EP-0013915-B1 | USE OF OPTIONALLY CRUSHED LIGHTWEIGHT BUILDING ELEMENTS BASED ON FIBRE REINFORCED CALCIUM SILICATE COMPOSITIONS | MARS INCORPORATED (US) | 1983-04-13 | — | — | EP | disclosed |
| EP-0014343-B1 | CALCIUM SILICATE IN GRANULAR OR POWDER FORM AND ITS USE | MARS INCORPORATED (US) | 1982-06-02 | — | — | EP | disclosed |
| EP-0014343-A1 | Calcium silicate in granular or powder form and its use | MARS INCORPORATED (US) | 1980-08-20 | — | — | EP | disclosed |
| EP-0013915-A1 | Use of optionally crushed lightweight building elements based on fibre reinforced calcium silicate compositions | MARS INCORPORATED (US) | 1980-08-06 | — | — | EP | disclosed |