⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL23701161 | 0.87 | — | — | |
| SCHEMBL23701183 | 0.85 | — | — | |
| SCHEMBL706176 | 0.75 | — | — | |
| SCHEMBL7202178 | 0.72 | — | — | |
| SCHEMBL23701007 | 0.65 | — | — | |
| SCHEMBL5616763 | 0.65 | — | — | |
| SCHEMBL23701346 | 0.65 | — | — | |
| SCHEMBL23700995 | 0.65 | — | — | |
| SCHEMBL8384938 | 0.64 | LMNA (0.31) | — | |
| SCHEMBL126009 | 0.64 | LMNA (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12371447-B2 | Method for producing (meth)acryloxy group-containing organosilicon compounds | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2025-07-29 | — | — | US | disclosed |
| EP-4174076-B1 | METHOD FOR PRODUCING (METH)ACRYLOXY GROUP-CONTAINING ORGANOSILICON COMPOUNDS | SHINETSU CHEMICAL CO (JP) | 2024-07-24 | — | — | EP | disclosed |
| US-11807758-B2 | Siloxane polymer and method of producing siloxane polymer | JNC CORPORATION (JP) | 2023-11-07 | — | — | US | disclosed |
| US-20230134471-A1 | METHOD FOR PRODUCING (METH)ACRYLOXY GROUP-CONTAINING ORGANOSILICON COMPOUNDS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2023-05-04 | — | — | US | disclosed |
| EP-4174076-A1 | METHOD FOR PRODUCING (METH)ACRYLOXY GROUP-CONTAINING ORGANOSILICON COMPOUNDS | Shin-Etsu Chemical Co., Ltd. (JP) | 2023-05-03 | — | — | EP | disclosed |
| CN-116041382-A | Method for producing organosilicon compounds containing (meth) acryloxy groups | 信越化学工业株式会社 | 2023-05-02 | — | — | CN | disclosed |
| CN-114207901-A | Nonaqueous electrolyte solution and nonaqueous electrolyte battery | 三菱化学株式会社 | 2022-03-18 | — | — | CN | disclosed |
| US-20210238419-A1 | SILOXANE POLYMER AND METHOD OF PRODUCING SILOXANE POLYMER | JNC CORPORATION (JP) | 2021-08-05 | — | — | US | disclosed |
| CN-107428891-B | Curable composition | 施敏打硬株式会社 | 2021-04-20 | — | — | CN | disclosed |
| CN-105392845-B | Photocurable composition | 思美定株式会社 | 2020-10-20 | — | — | CN | disclosed |
| US-20160312089-A1 | PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES | CEMEDINE CO., LTD. (JP) | 2016-10-27 | — | — | US | disclosed |
| EP-3081612-A1 | PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES | Cemedine Co., Ltd. (JP) | 2016-10-19 | — | — | EP | disclosed |
| US-20160152783-A1 | PHOTOCURABLE COMPOSITION | CEMEDINE CO., LTD. (JP) | 2016-06-02 | — | — | US | disclosed |
| EP-3023462-A1 | PHOTOCURABLE COMPOSITION | Cemedine Co., Ltd. (JP) | 2016-05-25 | — | — | EP | disclosed |
| US-8791221-B2 | Addition-curable metallosiloxane compound | DAICEL CORPORATION (JP) | 2014-07-29 | — | — | US | disclosed |
| EP-2650319-A1 | ADDITION-CURABLE METALLOSILOXANE COMPOUND | Daicel Corporation (JP) | 2013-10-16 | — | — | EP | disclosed |
| US-20130267653-A1 | ADDITION-CURABLE METALLOSILOXANE COMPOUND | DAICEL CORPORATION (JP) | 2013-10-10 | — | — | US | disclosed |
| US-8124690-B2 | Moisture curable polymer having SiF group, and curable composition containing the same | KANEKA CORPORATION (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20090275702-A1 | MOISTURE CURABLE POLYMER HAVING SiF GROUP, AND CURABLE COMPOSITION CONTAINING THE SAME | KANEKA CORPORATION (JP) | 2009-11-05 | — | — | US | disclosed |
| EP-2062929-A1 | MOISTURE-CURABLE POLYMER HAVING SiF GROUP AND CURABLE COMPOSITION CONTAINING THE SAME | Kaneka Corporation (JP) | 2009-05-27 | — | — | EP | disclosed |