⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15091536 | 0.88 | — | — | |
| SCHEMBL705378 | 0.82 | — | — | |
| SCHEMBL706612 | 0.82 | — | — | |
| SCHEMBL15091434 | 0.79 | — | — | |
| SCHEMBL15091693 | 0.79 | — | — | |
| SCHEMBL15091764 | 0.79 | — | — | |
| SCHEMBL15091663 | 0.79 | — | — | |
| SCHEMBL15092033 | 0.79 | — | — | |
| SCHEMBL9224627 | 0.79 | — | — | |
| SCHEMBL17666253 | 0.74 | ALDH1A1 (0.45) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20210384554-A1 | LITHIUM SECONDARY BATTERY ELECTROLYTE FOR REDUCING INTERNAL RESISTANCE OF BATTERY AND LITHIUM SECONDARY BATTERY | GUANGZHOU TINCI MATERIALS TECHNOLOGY CO., LTD. (CN) | 2021-12-09 | — | — | US | disclosed |
| EP-3352281-B1 | NON-AQUEOUS ELECTROLYTE SOLUTION AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY | ADEKA CORP (JP) | 2021-08-11 | — | — | EP | disclosed |
| EP-3819976-A1 | LITHIUM SECONDARY BATTERY ELECTROLYTE FOR REDUCING INTERNAL RESISTANCE OF BATTERY AND LITHIUM SECONDARY BATTERY | Guangzhou Tinci Materials Technology Co., Ltd (CN) | 2021-05-12 | — | — | EP | disclosed |
| US-10734684-B2 | Nonaqueous electrolyte solution and nonaqueous electrolyte secondary battery | ADEKA CORPORATION (JP) | 2020-08-04 | — | — | US | disclosed |
| US-10186732-B2 | Nonaqueous electrolyte solution for batteries, and nonaqueous electrolyte secondary battery using same | DENSO CORPORATION (JP) | 2019-01-22 | — | — | US | disclosed |
| US-20180226683-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROPLYTE SECONDARY BATTERY | ADKEA CORPORATION (JP) | 2018-08-09 | — | — | US | disclosed |
| EP-3352281-A1 | NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY | Adeka Corporation (JP) | 2018-07-25 | — | — | EP | disclosed |
| EP-2683011-B1 | NONAQUEOUS ELECTROLYTE SOLUTION FOR BATTERIES, AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY USING SAME | DENSO CORP (JP) | 2018-02-28 | — | — | EP | disclosed |
| EP-2779299-B1 | NONAQUEOUS ELECTROLYTE SOLUTION, AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY USING SAID ELECTROLYTE SOLUTION | ADEKA CORP (JP) | 2017-08-02 | — | — | EP | disclosed |
| EP-2642579-B1 | NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY | ADEKA CORP (JP) | 2017-07-26 | — | — | EP | disclosed |
| US-20130236777-A1 | NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY | ADEKA CORPORATION (JP) | 2013-09-12 | — | — | US | disclosed |
| US-20130177822-A1 | NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY | ADEKA CORPORATION (JP) | 2013-07-11 | — | — | US | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| JP-2010238506-A | NONAQUEOUS ELECTROLYTE SOLUTION AND LITHIUM ION SECONDARY CELL USING THE SAME | SANWA YUKA KOGYO KK | 2010-10-21 | — | — | JP | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| EP-0378430-B1 | Novel organosilicon compound and process for producing organosilicon compound | AGENCY IND SCIENCE TECHN (JP) | 1995-02-01 | — | — | EP | disclosed |
| US-5151538-A | ORGANOSILICON COMPOUND AND PROCESS FOR PRODUCING ORGANOSILICON COMPOUND | AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1992-09-29 | — | — | US | disclosed |
| EP-0378430-A1 | Novel organosilicon compound and process for producing organosilicon compound | DIRECTOR-GENERAL OF THE AGENCY OF INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 1990-07-18 | — | — | EP | disclosed |