SCHEMBL706358

SCHEMBL706358

C[SiH](C)CCCC[SiH](C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9637398 0.95
SCHEMBL6904202 0.95
SCHEMBL15468501 0.95
SCHEMBL13002890 0.95
SCHEMBL2981631 0.95
SCHEMBL705578 0.90
SCHEMBL475884 0.84
SCHEMBL17090764 0.82 TSHR (0.53)
SCHEMBL502670 0.82 TSHR (0.53)
SCHEMBL18406264 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250010331-A1 ALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM VERSUM MATERIALS US, LLC 2025-01-09 US claimed
EP-4402300-A1 ALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM Versum Materials US, LLC (US) 2024-07-24 EP claimed
CN-118251514-A Alkoxysilane and dense organosilicon film prepared therefrom 弗萨姆材料美国有限责任公司 2024-06-25 CN claimed
WO-2023064773-A1 ALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM VERSUM MATERIALS US, LLC (US) 2023-04-20 WO claimed
EP-3983418-B1 ORGANOSILANE, IONIC ORGANOSILANE, MEMBRANE COMPOSITION, AND MEMBRANE 3M INNOVATIVE PROPERTIES COMPANY (US) 2025-11-05 EP disclosed
US-20250010331-A1 ALKOXYSILANES AND DENSE ORGANOSILICA FILMS MADE THEREFROM VERSUM MATERIALS US, LLC 2025-01-09 US disclosed
US-20240384120-A1 FREE-RADICALLY POLYMERIZABLE MONOMER, FREE-RADICALLY POLYMERIZABLE COMPOSITION, METHOD OF USING THE SAME, POLYMERIZED COMPOSITION, AND ELECTRONIC ARTICLE 3M INNOVATIVE PROPERTIES COMPANY 2024-11-21 US disclosed
US-12122797-B2 Organosilane, ionic organosilane, membrane composition, and membrane 3M INNOVATIVE PROPERTIES COMPANY (US) 2024-10-22 US disclosed
CN-117677626-A Free radically polymerizable monomers, free radically polymerizable compositions, methods of use, polymerized compositions, and electronic articles 3M创新有限公司 2024-03-08 CN disclosed
WO-2023285900-A1 FREE-RADICALLY POLYMERIZABLE MONOMER, FREE-RADICALLY POLYMERIZABLE COMPOSITION, METHOD OF USING THE SAME, POLYMERIZED COMPOSITION, AND ELECTRONIC ARTICLE 3M INNOVATIVE PROPERTIES COMPANY (US) 2023-01-19 WO disclosed
US-20220251120-A1 ORGANOSILANE, IONIC ORGANOSILANE, MEMBRANE COMPOSITION, AND MEMBRANE US DEPARTMENT OF ENERGY 2022-08-11 US disclosed
US-8344067-B2 Rubber composition and uses thereof NOK CORPORATION (JP) 2013-01-01 US disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed
US-20060270800-A1 Molding compound BASF AKTIENGESELLSCHAFT (DE) 2006-11-30 US disclosed
EP-1658319-A1 MOLDING COMPOUND BASF AKTIENGESELLSCHAFT (DE) 2006-05-24 EP disclosed
WO-2005019285-A1 MOLDING COMPOUND BASF AKTIENGESELLSCHAFT (DE) 2005-03-03 WO disclosed
US-5484950-A Process for selective monoaddition to silanes containing two silicon-hydrogen bonds and products thereof POLYSET COMPANY, INC. (US) 1996-01-16 US disclosed
US-5350538-A High polymer, ferroelectric liquid-crystalline composition containing the high polymer and raw material of the high polymer IDEMITSU KOSAN CO., LTD. (JP) 1994-09-27 US disclosed
EP-0578135-A2 High polymer, ferro-electric liquid-crystalline composition containing the high polymer and raw material of the high polymer IDEMITSU KOSAN COMPANY LIMITED (JP) 1994-01-12 EP disclosed
US-4906713-A \"Acrylic\" ladder polymers E. I. DU PONT DE NEMOURS AND COMPANY (US) 1990-03-06 US disclosed