⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Propylamine SCHEMBL15476979 | 1.00 | DNM1 (0.44) | — | |
| Propylamine SCHEMBL2570107 | 1.00 | — | — | |
| Propylamine SCHEMBL8669074 | 0.95 | — | — | |
| Propylamine SCHEMBL1330797 | 0.89 | — | — | |
| Propylamine SCHEMBL9181 | 0.89 | — | — | |
| Propylamine SCHEMBL448871 | 0.89 | — | — | |
| Propylamine SCHEMBL26633365 | 0.86 | — | — | |
| Propylamine SCHEMBL11723777 | 0.86 | DNM1 (0.41) | — | |
| Propylamine SCHEMBL23706286 | 0.84 | — | — | |
| Propylamine SCHEMBL4634067 | 0.84 | DNM1 (0.47) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0557138-A2 | Direct imaging process for forming resist pattern on a surface, and use thereof in fabricating printed circuit boards | MACDERMID INCORPORATED (US) | 1993-08-25 | — | — | EP | claimed |
| EP-4237406-A1 | NON-CATIONIC SOFTENERS AND METHODS OF USE | Ecolab USA Inc. (US) | 2023-09-06 | — | — | EP | disclosed |
| US-20220204889-A1 | NON-CATIONIC SOFTENERS AND METHODS OF USE | ECOLAB USA INC. | 2022-06-30 | — | — | US | disclosed |
| WO-2022140518-A1 | NON-CATIONIC SOFTENERS AND METHODS OF USE | ECOLAB USA INC. (US) | 2022-06-30 | — | — | WO | disclosed |
| CN-101449206-A | Silicone composite mold with low thermal deformation | DOW CORNING (US) | 2009-06-03 | — | — | CN | disclosed |
| CN-101410753-A | Method for forming nanoscale features using soft lithography | DOW CORNING (US) | 2009-04-15 | — | — | CN | disclosed |
| US-6632588-B2 | Film of thermo-resist applied to a substrate surface is scanned by a focused heat source without a phototool | CITIBANK, N.A. | 2003-10-14 | — | — | US | disclosed |
| US-20030003406-A1 | Film of thermo-resist applied to a substrate surface is scanned by a focused heat source without a phototool | MACDERMID, INC. | 2003-01-02 | — | — | US | disclosed |
| US-5641608-A | APPLYING THERMO-RESIST COMPOSITION TO SUBSTRATE, DIRECTING FOCUSED BEAM OF INFRARED ENERGY TO SELECTED AREAS, CONTACTING WITH DEVELOPER | MACDERMID, INCORPORATED (US) | 1997-06-24 | — | — | US | disclosed |
| EP-0557138-A2 | Direct imaging process for forming resist pattern on a surface, and use thereof in fabricating printed circuit boards | MACDERMID INCORPORATED (US) | 1993-08-25 | — | — | EP | disclosed |