SCHEMBL7068436

SCHEMBL7068436

COc1ccccc1/C=C\C(=O)Cl

nearest known ligand 0.74

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NFE2L2 Q16236 2/20 0.74
TFEB P19484 1/20 0.74
KDM4E B2RXH2 2/20 0.72
MAPT P10636 4/20 0.66
NPC1 O15118 3/20 0.66
RAB9A P51151 2/20 0.66
LMNA P02545 2/20 0.66
BCHE P06276 1/20 0.66
MAPK1 P28482 2/20 0.64
ATM Q13315 1/20 0.64
NPSR1 Q6W5P4 1/20 0.64
TDP1 Q9NUW8 1/20 0.64
CYP1A2 P05177 3/20 0.63
CYP2D6 P10635 3/20 0.63
HPGD P15428 3/20 0.63
CYP3A4 P08684 2/20 0.63
CYP2C9 P11712 1/20 0.63
CYP2C19 P33261 1/20 0.63
RECQL P46063 1/20 0.63
GPR55 Q9Y2T6 1/20 0.63

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1569432 1.00 NFE2L2 (0.74) NFE2L2TFEBKDM4EMAPTNPC1
SCHEMBL1569425 1.00 NFE2L2 (0.74) NFE2L2TFEBKDM4EMAPTNPC1
SCHEMBL31202230 1.00 NFE2L2 (0.74) NFE2L2TFEBKDM4EMAPTNPC1
SCHEMBL2744047 0.85 NFE2L2 (1.00) NFE2L2TFEBKDM4EMAPTNPC1
SCHEMBL30307386 0.85 NFE2L2 (1.00) NFE2L2TFEBKDM4EMAPTNPC1
SCHEMBL29805195 0.85 NFE2L2 (1.00) NFE2L2TFEBKDM4EMAPTNPC1
SCHEMBL16403662 0.85 NFE2L2 (1.00) NFE2L2TFEBKDM4EMAPTNPC1
SCHEMBL2744044 0.85 NFE2L2 (1.00) NFE2L2TFEBKDM4EMAPTNPC1
SCHEMBL27732245 0.85 NFE2L2 (0.77) NFE2L2TFEBMAPTNPC1RAB9A
SCHEMBL7730832 0.84 NFE2L2 (0.55) NFE2L2TFEBKDM4EMAPTNPC1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0945764-B1 Photoresist composition SUMITOMO CHEMICAL CO (JP) 2003-06-18 EP disclosed
US-6258507-B1 UNSATURATED AROMATIC ACRYLATED ESTER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-07-10 US disclosed
EP-0945764-A2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-09-29 EP disclosed