SCHEMBL7068796

SCHEMBL7068796

CCc1occc1C(=O)Cl

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.38
TDP1 Q9NUW8 3/20 0.36
L3MBTL1 Q9Y468 2/20 0.36
TSHR P16473 1/20 0.36
HSD17B10 Q99714 3/20 0.36
ALDH1A1 P00352 3/20 0.35
SMN1; SMN2 Q16637 2/20 0.35
CYP2C19 P33261 2/20 0.35
LMNA P02545 1/20 0.35
POLB P06746 4/20 0.35
MEN1 O00255 1/20 0.33
KMT2A Q03164 1/20 0.33
MAPT P10636 1/20 0.33
CYP3A4 P08684 1/20 0.33
CYP2C9 P11712 1/20 0.33
MAPK1 P28482 1/20 0.33
ESR2 Q92731 1/20 0.33
ALOX15 P16050 1/20 0.32
GAA P10253 1/20 0.32
NPSR1 Q6W5P4 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2223238 0.82 TP53 (0.54) TP53TDP1L3MBTL1TSHRHSD17B10
SCHEMBL15782799 0.82 TP53 (0.39) TP53TDP1L3MBTL1TSHRHSD17B10
SCHEMBL3067735 0.82 TSHR (0.37) TP53TDP1L3MBTL1TSHRHSD17B10
SCHEMBL27746850 0.80 ALDH1A1 (0.43) TP53TSHRALDH1A1SMN1; SMN2LMNA
SCHEMBL11668571 0.79 TP53 (0.45) TP53TDP1L3MBTL1TSHRHSD17B10
SCHEMBL13825394 0.77 HSD17B10 (0.48) TP53TDP1L3MBTL1TSHRHSD17B10
SCHEMBL11531142 0.76 TP53 (0.42) TP53TDP1L3MBTL1TSHRHSD17B10
SCHEMBL8635719 0.76 ALDH1A1 (0.53) TP53TSHRHSD17B10ALDH1A1MEN1
SCHEMBL1164338 0.72
SCHEMBL8633550 0.72 TDP1 (0.38) TP53TDP1L3MBTL1TSHRHSD17B10

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1231816-C Photoresist compositions SUMITOMO CHEMICAL CO (JP) 2005-12-14 CN disclosed
EP-0945764-B1 Photoresist composition SUMITOMO CHEMICAL CO (JP) 2003-06-18 EP disclosed
US-6258507-B1 UNSATURATED AROMATIC ACRYLATED ESTER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-07-10 US disclosed
CN-1230704-A Photoresist compositions SUMITOMO CHEMICAL CO (JP) 1999-10-06 CN disclosed
EP-0945764-A2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-09-29 EP disclosed