Predicted protein targets (top 2)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.38 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL11198457 | 0.97 | — | — | |
| SCHEMBL22228986 | 0.92 | — | — | |
| SCHEMBL1496435 | 0.86 | — | — | |
| SCHEMBL28306447 | 0.80 | SMN1; SMN2 (0.33) | SMN1; SMN2 | |
| SCHEMBL9737573 | 0.78 | SMN1; SMN2 (0.36) | SMN1; SMN2 | |
| SCHEMBL28508385 | 0.77 | — | — | |
| SCHEMBL8837037 | 0.77 | TSHR (0.33) | SMN1; SMN2 | |
| SCHEMBL27975816 | 0.77 | MEN1 (0.37) | SMN1; SMN2 | |
| SCHEMBL17593537 | 0.75 | — | — | |
| SCHEMBL16544485 | 0.75 | CA1 (0.33) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107109045-B | Thin walled optical component poly carbonate resin composition and thin walled optical component | 三菱工程塑料株式会社 | 2019-06-07 | — | — | CN | disclosed |
| CN-104974045-B | A kind of method for preparing aminated compounds | 岳阳昌德化工实业有限公司 | 2018-03-20 | — | — | CN | disclosed |
| CN-107109045-A | Thin walled optical part poly carbonate resin composition and thin walled optical part | 三菱工程塑料株式会社 | 2017-08-29 | — | — | CN | disclosed |
| WO-2010110472-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME AND PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2010-09-30 | — | — | WO | disclosed |
| EP-1296190-B1 | Positive resist composition | FUJIFILM CORP (JP) | 2010-05-05 | — | — | EP | disclosed |
| EP-1366026-A2 | PYRIMIDINE COMPOUNDS AND THEIR USE | SUMITOMO CHEMICAL COMPANY LIMITED (JP) | 2003-12-03 | — | — | EP | disclosed |
| WO-2002024663-A2 | PYRIMIDINE COMPOUNDS AND THEIR USE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-03-28 | — | — | WO | disclosed |
| US-4983497-A | Silicate layer contacting layer formed by aqueous zinc acetate bath treatment | EASTMAN KODAK COMPANY (US) | 1991-01-08 | — | — | US | disclosed |
| EP-0218160-B1 | TREATED ANODIZED ALUMINUM SUPPORT AND LITHOGRAPHIC PRINTING PLATE CONTAINING SAME | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1989-12-06 | — | — | EP | disclosed |
| EP-0218160-A1 | Treated anodized aluminum support and lithographic printing plate containing same | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1987-04-15 | — | — | EP | disclosed |