⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL704385 | 0.79 | TRPA1 (0.42) | — | |
| SCHEMBL2879034 | 0.77 | TSHR (0.53) | — | |
| SCHEMBL4141599 | 0.74 | TSHR (0.50) | — | |
| SCHEMBL29776859 | 0.74 | — | — | |
| SCHEMBL1054362 | 0.74 | — | — | |
| SCHEMBL9504424 | 0.74 | TSHR (0.43) | — | |
| SCHEMBL6114402 | 0.72 | — | — | |
| SCHEMBL18860810 | 0.72 | — | — | |
| SCHEMBL3202391 | 0.72 | — | — | |
| SCHEMBL9506546 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 13 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| EP-0617044-B1 | Process for preparing cyclopentadienyl group-containing silicon compound or cyclopentadienyl group-containing germanium compound | MITSUI CHEMICALS INC (JP) | 1999-01-20 | — | — | EP | disclosed |
| EP-0514034-B1 | Silane products from reaction of solid silicon monoxide with aromatic halides | DOW CORNING (US) | 1996-02-28 | — | — | EP | disclosed |
| US-5360921-A | REACTING LITHIUM, SODIUM OR POTASSIUM SALT OF A CYCLOPENTADIENE DERIVATIVE WITH A SILICON OR GERMANIUM HALIDE COMPOUND IN THE PRESENCE OF A CYANIDE OR A THIOCYANATE | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1994-11-01 | — | — | US | disclosed |
| EP-0617044-A2 | Process for preparing cyclopentadienyl group-containing silicon compound or cyclopentadienyl group-containing germanium compound | MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) | 1994-09-28 | — | — | EP | disclosed |
| EP-0292260-B1 | Process for producing 1,3-bis(dicarboxyphenyl)-disiloxane derivative or dianhydride thereof | HITACHI CHEMICAL CO LTD (JP) | 1994-04-13 | — | — | EP | disclosed |
| US-5166363-A | Process for producing 1,3-bis(dicarboxyphenyl)-disiloxane derivative or dianhydride thereof | HITACHI CHEMICAL COMPANY, LTD. (JP) | 1992-11-24 | — | — | US | disclosed |
| EP-0514034-A1 | Silane products from reaction of solid silicon monoxide with aromatic halides | DOW CORNING CORPORATION (US) | 1992-11-19 | — | — | EP | disclosed |
| US-5120520-A | In presence of metal or metal-contianing catalyst | DOW CORNING CORPORATION (US) | 1992-06-09 | — | — | US | disclosed |
| EP-0292260-A2 | Process for producing 1,3-bis(dicarboxyphenyl)-disiloxane derivative or dianhydride thereof | Hitachi Chemical Co., Ltd. (JP) | 1988-11-23 | — | — | EP | disclosed |