⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2880681 | 0.74 | — | — | |
| SCHEMBL17713129 | 0.72 | ALDH1A1 (0.31) | — | |
| SCHEMBL1455794 | 0.69 | — | — | |
| SCHEMBL8668506 | 0.67 | — | — | |
| SCHEMBL4275376 | 0.67 | — | — | |
| SCHEMBL5834056 | 0.67 | — | — | |
| SCHEMBL4276281 | 0.67 | — | — | |
| SCHEMBL106461 | 0.67 | — | — | |
| SCHEMBL17718003 | 0.67 | — | — | |
| Ethane SCHEMBL5833141 | 0.65 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2024080149-A1 | ANTI-REFLECTION FILM, LIQUID COMPOSITION, LIQUID COMPOSITION GROUP, AND METHOD FOR MANUFACTURING ANTI-REFLECTION FILM | 日本板硝子株式会社 | 2024-04-18 | — | — | WO | disclosed |
| CN-111208710-A | Iodine-containing thermosetting silicon-containing material, resist underlayer film-forming composition for extreme ultraviolet lithography containing the same, and pattern formation method | 信越化学工业株式会社 | 2020-05-29 | — | — | CN | disclosed |
| CN-104428331-B | Active energy beam polymer resin composition and the laminated body for using the resin combination | 东洋油墨SC控股株式会社 | 2019-02-15 | — | — | CN | disclosed |
| EP-3083765-A1 | METHOD OF SYNTHESIS OF SILICA VESICLES AND USE THEREOF | The University Of Queensland (AU) | 2016-10-26 | — | — | EP | disclosed |
| WO-2015089590-A1 | METHOD OF SYNTHESIS OF SILICA VESICLES AND USE THEREOF | THE UNIVERSITY OF QUEENSLAND (AU) | 2015-06-25 | — | — | WO | disclosed |
| CN-104428331-A | Active energy ray-polymerizable resin composition and laminate obtained using resin composition | TOYO INK SC HOLDINGS CO LTD | 2015-03-18 | — | — | CN | disclosed |
| CN-102712811-B | Silicone resin composition and protective coating method using silicone resin composition | NIPPON JIKKOU CO LTD | 2014-08-13 | — | — | CN | disclosed |
| CN-101639628-B | Radioactive linear composition for forming of coloring layer, color filter and color liquid crystal display element | JSR CORP JP | 2013-04-03 | — | — | CN | disclosed |
| CN-101646718-B | Curable resin composition, protective film, and method for forming protective film | JSR CORP JP | 2013-04-03 | — | — | CN | disclosed |
| CN-102712811-A | Silicone resin composition and protective coating method using silicone resin composition | NIPPON JIKKOU CO LTD | 2012-10-03 | — | — | CN | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| US-20060269724-A1 | Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2006-11-30 | — | — | US | disclosed |
| CN-1250557-C | Process for preparing alkoxysilanes | TOAGOSEI CO LTD (JP) | 2006-04-12 | — | — | CN | disclosed |
| US-7005532-B2 | Process of producing alkoxysilanes | TOAGOSEI CO., LTD. (JP) | 2006-02-28 | — | — | US | disclosed |
| CN-1637098-A | Curing composition for organosilicon compound and silicone-based coating agent composition | SHINETSU CHEMICAL CO (JP) | 2005-07-13 | — | — | CN | disclosed |
| US-20050020845-A1 | Process of producing alkoxysilanes | TOAGOSEI CO., LTD. (JP) | 2005-01-27 | — | — | US | disclosed |
| US-20040260048-A1 | Organosilicon compound - curing composition and silicone-base coating composition | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2004-12-23 | — | — | US | disclosed |
| CN-1555380-A | Process for preparing alkoxysilanes | 东亚合成株式会社 | 2004-12-15 | — | — | CN | disclosed |
| EP-1428828-A1 | PROCESS FOR PREPARATION OF ALKOXYSILANES | TOAGOSEI CO., LTD. (JP) | 2004-06-16 | — | — | EP | disclosed |
| US-20040077757-A1 | Coating composition for use in producing an insulating thin film | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2004-04-22 | — | — | US | disclosed |