SCHEMBL707269

SCHEMBL707269

CC[Si](F)(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4340889 0.74
SCHEMBL5917037 0.74
SCHEMBL705954 0.74
SCHEMBL707900 0.74
SCHEMBL8165580 0.70
SCHEMBL7711810 0.70
SCHEMBL8166034 0.70
SCHEMBL701366 0.68
SCHEMBL706332 0.67
SCHEMBL705859 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 282 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4724507-A1 SOLUTION CATALYST SYSTEMS AND USES THEREOF ExxonMobil Technology and Engineering Company (US) 2026-04-15 EP claimed
EP-4724505-A1 NON-COORDINATED ALKYLALUMINUM FREE ANION MODIFIED ALUMOXANES AND METHODS THEREOF ExxonMobil Technology and Engineering Company (US) 2026-04-15 EP claimed
WO-2024253831-A1 NON-COORDINATED ALKYLALUMINUM FREE ANION MODIFIED ALUMOXANES AND METHODS THEREOF ExxonMobil Technology and Engineering Company (US) 2024-12-12 WO claimed
WO-2024253829-A1 SOLUTION CATALYST SYSTEMS AND USES THEREOF ExxonMobil Technology and Engineering Company (US) 2024-12-12 WO claimed
WO-2024232632-A1 TRANSITION METAL SUPPORTED CATALYST WITH IMPROVED HYDROGENATION ACTIVITY AND USE THEREOF 한양대학교 산학협력단 2024-11-14 WO claimed
CN-118909206-A Preparation method of controllable silicon-containing gel 上海源叶生物科技有限公司 2024-11-08 CN claimed
WO-2024217291-A1 SECONDARY BATTERY AND PREPARATION METHOD THEREFOR AND ELECTRIC DEVICE 华为技术有限公司 2024-10-24 WO claimed
CN-118772345-A Preparation method of silicon-containing polymer gel 上海源叶生物科技有限公司 2024-10-15 CN claimed
CN-118745118-A Full-hydrophobic friction-resistant structural material and preparation method thereof 北京林业大学 2024-10-08 CN claimed
US-11786883-B2 Adsorption cooling system using metal organic frameworks LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2023-10-17 US claimed
US-11769871-B2 Lithium secondary batteries and nonaqueous electrolyte for use in the same MITSUBISHI CHEMICAL CORPORATION (JP) 2023-09-26 US claimed
CN-116495759-A Method for preparing lithium fluoride by adopting fluorosilane compound 广州天赐高新材料股份有限公司 2023-07-28 CN claimed
US-11686508-B2 Adsorption cooling system using metal organic frameworks LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2023-06-27 US claimed
US-20210299633-A1 ADSORPTION COOLING SYSTEM USING METAL ORGANIC FRAMEWORKS U.S. DEPARTMENT OF ENERGY 2021-09-30 US claimed
US-20210095899-A1 ADSORPTION COOLING SYSTEM USING METAL ORGANIC FRAMEWORKS LAWRENCE LIVERMORE NATIONAL SECURITY, LLC 2021-04-01 US claimed
US-20210066707-A1 LITHIUM SECONDARY BATTERIES AND NONAQUEOUS ELECTROLYTE FOR USE IN THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2021-03-04 US claimed
US-20130283849-A1 ADSORPTION COOLING SYSTEM USING METAL ORGANIC FRAMEWORKS LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2013-10-31 US claimed
US-20130283846-A1 ADSORPTION COOLING SYSTEM USING METAL ORGANIC FRAMEWORKS LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2013-10-31 US claimed
EP-2011834-B1 CURABLE COMPOSITION KANEKA CORP (JP) 2012-07-25 EP claimed
EP-3772130-B1 ADDITIVE FOR NON-AQUEOUS ELECTROLYTE SOLUTIONS, NON-AQUEOUS ELECTROLYTE SOLUTION, AND ELECTRICITY STORAGE DEVICE SUMITOMO SEIKA CHEMICALS (JP) 2026-05-06 EP disclosed
EP-4724507-A1 SOLUTION CATALYST SYSTEMS AND USES THEREOF ExxonMobil Technology and Engineering Company (US) 2026-04-15 EP disclosed
EP-4724505-A1 NON-COORDINATED ALKYLALUMINUM FREE ANION MODIFIED ALUMOXANES AND METHODS THEREOF ExxonMobil Technology and Engineering Company (US) 2026-04-15 EP disclosed
US-20260058199-A1 NON-AQUEOUS ELECTROLYTE FOR SECONDARY BATTERY, LITHIUM ION BATTERY, AND LITHIUM ION CAPACITOR SUMITOMO SEIKA CHEMICALS (JP) 2026-02-26 US disclosed
US-20260024810-A1 ADDITIVE FOR NON-AQUEOUS ELECTROLYTIC SOLUTION, NON-AQUEOUS ELECTROLYTIC SOLUTION, AND POWER STORAGE DEVICE SUMITOMO SEIKA CHEMICALS (JP) 2026-01-22 US disclosed
US-20260004977-A1 ELECTROCHEMICAL CAPACITOR PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2026-01-01 US disclosed
US-20250337021-A1 ELECTRODE FOR LITHIUM ION BATTERIES, AND LITHIUM ION BATTERY SUMITOMO SEIKA CHEMICALS (JP) 2025-10-30 US disclosed
US-20250323274-A1 LITHIUM-ION BATTERY ELECTRODE AND LITHIUM-ION BATTERY SUMITOMO SEIKA CHEMICALS (JP) 2025-10-16 US disclosed
US-12418046-B2 Nonaqueous electrolyte solution MITSUBISHI CHEMICAL CORPORATION (JP) 2025-09-16 US disclosed
US-12403437-B2 Method for producing nanodiamonds doped with group 14 element, and method for purifying same DAICEL CORPORATION (JP) 2025-09-02 US disclosed
US-20250260058-A1 NONAQUEOUS ELECTROLYTE SOLUTION AND NONAQUEOUS-ELECTROLYTIC-SOLUTION BATTERY MITSUBISHI CHEMICAL CORPORATION (JP) 2025-08-14 US disclosed
US-12351463-B2 Heteroatom-doped nanodiamond DAICEL CORPORATION (JP) 2025-07-08 US disclosed
CN-113631252-B Method for producing and purifying nanodiamond doped with carbon group element 株式会社大赛璐 2025-05-23 CN disclosed
EP-4546489-A1 ADDITIVE FOR NON-AQUEOUS ELECTROLYTIC SOLUTION, NON-AQUEOUS ELECTROLYTIC SOLUTION, AND POWER STORAGE DEVICE Sumitomo Seika Chemicals Co., Ltd. (JP) 2025-04-30 EP disclosed
EP-4546488-A1 SECONDARY BATTERY NON-AQUEOUS ELECTROLYTIC SOLUTION, LITHIUM ION BATTERY, AND LITHIUM ION CAPACITOR Sumitomo Seika Chemicals Co., Ltd. (JP) 2025-04-30 EP disclosed
WO-2025084071-A1 NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY 住友精化株式会社 2025-04-24 WO disclosed
EP-4542711-A1 NON-AQUEOUS ELECTROLYTE FOR SECONDARY BATTERY, LITHIUM ION BATTERY, AND LITHIUM ION CAPACITOR Sumitomo Seika Chemicals Co., Ltd. (JP) 2025-04-23 EP disclosed
CN-119812477-A Lithium secondary battery and nonaqueous electrolyte used therein 三菱化学株式会社 2025-04-11 CN disclosed
EP-4510241-A1 LITHIUM-ION BATTERY ELECTRODE AND LITHIUM-ION BATTERY Sumitomo Seika Chemicals Co., Ltd. (JP) 2025-02-19 EP disclosed
EP-4507038-A1 ELECTRODE FOR LITHIUM ION BATTERIES, AND LITHIUM ION BATTERY Sumitomo Seika Chemicals Co., Ltd. (JP) 2025-02-12 EP disclosed
US-20250026962-A1 COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME SOULBRAIN CO., LTD. (KR) 2025-01-23 US disclosed
CN-119343732-A Electrochemical capacitor 松下知识产权经营株式会社 2025-01-21 CN disclosed
US-20250002355-A1 HETEROATOM-DOPED NANODIAMOND PARTICLES AND METHOD FOR PRODUCING HETEROATOM-DOPED NANODIAMOND PARTICLES DAICEL CORPORATION (JP) 2025-01-02 US disclosed
WO-2024258914-A1 PRECURSORS FOR LOW DIELECTRIC FILM DEPOSITION LAM RESEARCH CORPORATION (US) 2024-12-19 WO disclosed
CN-119133604-A Lithium secondary battery and nonaqueous electrolyte used therein 三菱化学株式会社 2024-12-13 CN disclosed
WO-2024253829-A1 SOLUTION CATALYST SYSTEMS AND USES THEREOF ExxonMobil Technology and Engineering Company (US) 2024-12-12 WO disclosed
WO-2024253831-A1 NON-COORDINATED ALKYLALUMINUM FREE ANION MODIFIED ALUMOXANES AND METHODS THEREOF ExxonMobil Technology and Engineering Company (US) 2024-12-12 WO disclosed
US-12163058-B2 Semiconductor element SOULBRAIN CO., LTD. (KR) 2024-12-10 US disclosed
US-12146076-B2 Semiconductor element SOULBRAIN CO., LTD. (KR) 2024-11-19 US disclosed
WO-2024232632-A1 TRANSITION METAL SUPPORTED CATALYST WITH IMPROVED HYDROGENATION ACTIVITY AND USE THEREOF 한양대학교 산학협력단 2024-11-14 WO disclosed
CN-118909206-A Preparation method of controllable silicon-containing gel 上海源叶生物科技有限公司 2024-11-08 CN disclosed
WO-2024217291-A1 SECONDARY BATTERY AND PREPARATION METHOD THEREFOR AND ELECTRIC DEVICE 华为技术有限公司 2024-10-24 WO disclosed
WO-2024219059-A1 NV CENTER-CONTAINING NANODIAMOND PARTICLE AND METHOD FOR PRODUCING SAME 株式会社ダイセル 2024-10-24 WO disclosed
CN-118772345-A Preparation method of silicon-containing polymer gel 上海源叶生物科技有限公司 2024-10-15 CN disclosed
CN-118745118-A Full-hydrophobic friction-resistant structural material and preparation method thereof 北京林业大学 2024-10-08 CN disclosed
US-12074286-B2 Additive for nonaqueous electrolyte solutions, nonaqueous electrolyte solution, and electricity storage device SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2024-08-27 US disclosed
US-12012525-B2 Composition for etching and manufacturing method of semiconductor device using the same SOULBRAIN CO., LTD. (KR) 2024-06-18 US disclosed
EP-4382481-A1 HETEROATOM-DOPED NANODIAMOND PARTICLES AND METHOD FOR PRODUCING HETEROATOM-DOPED NANODIAMOND PARTICLES Daicel Corporation (JP) 2024-06-12 EP disclosed
CN-118048095-A Preparation process of solvent-free epoxy composite coating 江西百盛精细化学品有限公司 2024-05-17 CN disclosed
CN-117794856-A Heteroatom-doped nanodiamond particles and method for producing heteroatom-doped nanodiamond particles 株式会社大赛璐 2024-03-29 CN disclosed
US-11912902-B2 Composition for etching and manufacturing method of semiconductor device using the same SOULBRAIN CO., LTD. (KR) 2024-02-27 US disclosed
CN-117580824-A Modulators of integrated stress pathways 卡里科生命科学有限责任公司 2024-02-20 CN disclosed
CN-117568038-A Etching composition and method for manufacturing semiconductor device using the same 秀博瑞殷株式公社 2024-02-20 CN disclosed
WO-2024034520-A1 NON-AQUEOUS ELECTROLYTE FOR SECONDARY BATTERY, LITHIUM ION BATTERY, AND LITHIUM ION CAPACITOR 住友精化株式会社 2024-02-15 WO disclosed
WO-2024034521-A1 SECONDARY BATTERY NON-AQUEOUS ELECTROLYTIC SOLUTION, LITHIUM ION BATTERY, AND LITHIUM ION CAPACITOR 住友精化株式会社 2024-02-15 WO disclosed
US-20240044722-A1 TEMPERATURE SENSITIVE PROBE DAICEL CORPORATION (JP) 2024-02-08 US disclosed
WO-2024024675-A1 ELECTROCHEMICAL CAPACITOR パナソニックIPマネジメント株式会社 2024-02-01 WO disclosed
CN-113948770-B Electrolyte for improving high-temperature storage characteristics of battery and lithium ion battery 远景动力技术(江苏)有限公司 2024-01-30 CN disclosed
EP-3557684-B1 LITHIUM SECONDARY BATTERIES AND NONAQUEOUS ELECTROLYTE FOR USE IN THE SAME MITSUBISHI CHEM CORP (JP) 2024-01-24 EP disclosed
US-11878282-B2 Adsorption cooling system using carbon aerogel LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2024-01-23 US disclosed
EP-3385353-B1 COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME SOULBRAIN CO LTD (KR) 2023-12-13 EP disclosed
CN-108375878-B Polymerizable composition, method for producing cured film, and cured film 东京应化工业株式会社 2023-12-08 CN disclosed
WO-2023234016-A1 ELECTRODE FOR LITHIUM ION BATTERIES, AND LITHIUM ION BATTERY 住友精化株式会社 2023-12-07 WO disclosed
WO-2023234017-A1 LITHIUM-ION BATTERY ELECTRODE AND LITHIUM-ION BATTERY 住友精化株式会社 2023-12-07 WO disclosed
US-20230378435-A1 LITHIUM SECONDARY BATTERIES AND NONAQUEOUS ELECTROLYTE FOR USE IN THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2023-11-23 US disclosed
EP-4269969-A1 TEMPERATURE SENSITIVE PROBE Daicel Corporation (JP) 2023-11-01 EP disclosed
US-11786883-B2 Adsorption cooling system using metal organic frameworks LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2023-10-17 US disclosed
US-11769871-B2 Lithium secondary batteries and nonaqueous electrolyte for use in the same MITSUBISHI CHEMICAL CORPORATION (JP) 2023-09-26 US disclosed
CN-116670501-A Temperature sensitive probe 株式会社大赛璐 2023-08-29 CN disclosed
US-11718717-B2 Resin composition, method for producing resin composition, film formation method, and cured product TOKYO OHKA KOGYO CO., LTD. (JP) 2023-08-08 US disclosed
CN-116495759-A Method for preparing lithium fluoride by adopting fluorosilane compound 广州天赐高新材料股份有限公司 2023-07-28 CN disclosed
US-11697762-B2 Organic-inorganic hybrid coating layer, quantum dot nanocapsule, quantum dot light emitting diode package, and method of fabricating the same KOREA UNIVERSITY RESEARCH AND BUSINESS FOUNDATION, SEJONG CAMPUS (KR) 2023-07-11 US disclosed
US-11686508-B2 Adsorption cooling system using metal organic frameworks LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2023-06-27 US disclosed
US-20230141924-A1 COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME SOULBRAIN CO., LTD. (KR) 2023-05-11 US disclosed
US-20230136538-A1 COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME SOULBRAIN CO., LTD. (KR) 2023-05-04 US disclosed
EP-4175001-A1 NONAQUEOUS ELECTROLYTIC SOLUTION AND NONAQUEOUS ELECTROLYTIC SOLUTION BATTERY Mitsubishi Chemical Corporation (JP) 2023-05-03 EP disclosed
US-20230125746-A1 Nonaqueous Electrolytic Solution and Nonaqueous Electrolytic Solution Battery MITSUBISHI CHEMICAL CORPORATION (JP) 2023-04-27 US disclosed
US-11634634-B2 Composition for etching SOULBRAIN CO., LTD. (KR) 2023-04-25 US disclosed
US-11634632-B2 Composition for etching SOULBRAIN CO., LTD. (KR) 2023-04-25 US disclosed
US-11634633-B2 Composition for etching SOULBRAIN CO., LTD. (KR) 2023-04-25 US disclosed
CN-115997316-A Nonaqueous electrolyte and nonaqueous electrolyte battery 三菱化学株式会社 2023-04-21 CN disclosed
WO-2023063015-A1 HETEROATOM-DOPED NANODIAMOND PARTICLE 株式会社ダイセル 2023-04-20 WO disclosed
WO-2023013659-A1 HETEROATOM-DOPED NANODIAMOND PARTICLES AND METHOD FOR PRODUCING HETEROATOM-DOPED NANODIAMOND PARTICLES 株式会社ダイセル 2023-02-09 WO disclosed
US-11566178-B2 Composition for etching and method for manufacturing semiconductor device using same SOULBRAIN CO., LTD. (KR) 2023-01-31 US disclosed
US-11530355-B2 Composition for etching and method for manufacturing semiconductor device using same SOULBRAIN CO., LTD. (KR) 2022-12-20 US disclosed
US-11512226-B2 Composition for etching and manufacturing method of semiconductor device using the same SOULBRAIN CO., LTD. (KR) 2022-11-29 US disclosed
US-11499073-B2 Composition for etching and manufacturing method of semiconductor device using the same SOULBRAIN CO., LTD. (KR) 2022-11-15 US disclosed
WO-2022230733-A1 IMPLANTABLE DEVICE 株式会社ダイセル 2022-11-03 WO disclosed
US-11479720-B2 Composition for etching and method for manufacturing semiconductor device using same SOULBRAIN CO., LTD. (KR) 2022-10-25 US disclosed
US-20220331766-A1 METHOD FOR PRODUCING NANODIAMONDS DOPED WITH GROUP 14 ELEMENT, AND METHOD FOR PURIFYING SAME DAICEL CORPORATION (JP) 2022-10-20 US disclosed
US-11466208-B2 Composition for etching SOULBRAIN CO., LTD. (KR) 2022-10-11 US disclosed
US-11466207-B2 Composition for etching SOULBRAIN CO., LTD. (KR) 2022-10-11 US disclosed
US-11421156-B2 Composition for etching and method for manufacturing semiconductor device using same SOULBRAIN CO., LTD. (KR) 2022-08-23 US disclosed
CN-110383565-B Additive for nonaqueous electrolyte solution, and electricity storage device 住友精化株式会社 2022-08-23 CN disclosed
US-11414569-B2 Composition for etching and manufacturing method of semiconductor device using the same SEONGNAM-SI, GYEONGGI-DO (KR) 2022-08-16 US disclosed
US-11390807-B2 Composition for etching and method for manufacturing semiconductor device using same SOULBRAIN CO., LTD. (KR) 2022-07-19 US disclosed
US-11390806-B2 Composition for etching and method for manufacturing semiconductor device using same SOULBRAIN CO., LTD. (KR) 2022-07-19 US disclosed
US-11387490-B2 Additive for nonaqueous electrolyte solutions, nonaqueous electrolyte solution, and electricity storage device SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2022-07-12 US disclosed
WO-2022138854-A1 TEMPERATURE SENSITIVE PROBE 株式会社ダイセル 2022-06-30 WO disclosed
US-11370968-B2 Composition for etching SOULBRAIN CO., LTD. (KR) 2022-06-28 US disclosed
US-11365352-B2 Composition for etching SOULBRAIN CO., LTD. (KR) 2022-06-21 US disclosed
US-20220185676-A1 HETEROATOM-DOPED NANODIAMOND DAICEL CORPORATION (JP) 2022-06-16 US disclosed
EP-4012814-A1 NONAQUEOUS ELECTROLYTIC SOLUTION AND NONAQUEOUS-ELECTROLYTIC-SOLUTION BATTERY Mitsubishi Chemical Corporation (JP) 2022-06-15 EP disclosed
US-20220177388-A1 EXPLOSIVE COMPOSITION AND METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING HETEROATOM-DOPED NANODIAMOND DAICEL CORPORATION (JP) 2022-06-09 US disclosed
US-20220158244-A1 Nonaqueous Electrolyte Solution and Nonaqueous-Electrolytic-Solution Battery MITSUBISHI CHEMICAL CORPORATION (JP) 2022-05-19 US disclosed
CN-109913220-B Etching composition 秀博瑞殷株式公社 2022-03-29 CN disclosed
CN-114207901-A Nonaqueous electrolyte solution and nonaqueous electrolyte battery 三菱化学株式会社 2022-03-18 CN disclosed
EP-3950586-A1 HETEROATOM-DOPED NANODIAMOND Daicel Corporation (JP) 2022-02-09 EP disclosed
EP-3950109-A1 METHOD FOR PRODUCING NANODIAMONDS DOPED WITH GROUP 14 ELEMENT, AND METHOD FOR PURIFYING SAME Daicel Corporation (JP) 2022-02-09 EP disclosed
EP-3950110-A1 EXPLOSIVE COMPOSITION AND METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING HETEROATOM-DOPED NANODIAMOND Daicel Corporation (JP) 2022-02-09 EP disclosed
CN-113948770-A Electrolyte for improving high-temperature storage characteristics of battery and lithium ion battery 远景动力技术(江苏)有限公司 2022-01-18 CN disclosed
WO-2021261579-A1 NONAQUEOUS ELECTROLYTIC SOLUTION AND NONAQUEOUS ELECTROLYTIC SOLUTION BATTERY 三菱ケミカル株式会社 2021-12-30 WO disclosed
US-20210367269-A1 ADDITIVE FOR NONAQUEOUS ELECTROLYTE SOLUTIONS, NONAQUEOUS ELECTROLYTE SOLUTION, AND ELECTRICITY STORAGE DEVICE SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 2021-11-25 US disclosed
US-20210346864-A1 ADSORPTION COOLING SYSTEM USING CARBON AEROGEL LAWRENCE LIVERMORE NATIONAL SECURITY, LLC 2021-11-11 US disclosed
CN-113631252-A Method for producing and purifying carbon group element-doped nanodiamond 株式会社大赛璐 2021-11-09 CN disclosed
CN-113631253-A Explosive composition, method for producing same, and method for producing heteroatom-doped nanodiamond 株式会社大赛璐 2021-11-09 CN disclosed
CN-113631512-A Nano-diamond doped with heteroatom 株式会社大赛璐 2021-11-09 CN disclosed
CN-113594543-A Lithium secondary battery and nonaqueous electrolyte used therein 三菱化学株式会社 2021-11-02 CN disclosed
CN-113571772-A Lithium secondary battery and nonaqueous electrolyte used therein 三菱化学株式会社 2021-10-29 CN disclosed
US-11149200-B2 Composition for etching and method for manufacturing semiconductor device using same SOULBRAIN CO., LTD. (KR) 2021-10-19 US disclosed
US-20210308651-A1 ADSORPTION COOLING SYSTEM USING CARBON AEROGEL LAWRENCE LIVERMORE NATIONAL SECURITY, LLC 2021-10-07 US disclosed
US-20210299633-A1 ADSORPTION COOLING SYSTEM USING METAL ORGANIC FRAMEWORKS U.S. DEPARTMENT OF ENERGY 2021-09-30 US disclosed
CN-113394458-A Lithium secondary battery and nonaqueous electrolyte used therein 三菱化学株式会社 2021-09-14 CN disclosed
US-11052375-B2 Adsorption cooling system using carbon aerogel LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2021-07-06 US disclosed
EP-3840101-A1 LITHIUM SECONDARY BATTERIES AND NONAQUEOUS ELECTROLYTE FOR USE IN THE SAME Mitsubishi Chemical Corporation (JP) 2021-06-23 EP disclosed
US-11008513-B2 Composition for etching SOULBRAIN CO., LTD. (KR) 2021-05-18 US disclosed
US-11000823-B2 Adsorption cooling system using carbon aerogel LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2021-05-11 US disclosed
US-20210130691-A1 COMPOSITION FOR ETCHING SOULBRAIN CO., LTD. (KR) 2021-05-06 US disclosed
US-20210130692-A1 COMPOSITION FOR ETCHING SOULBRAIN CO., LTD. (KR) 2021-05-06 US disclosed
US-10994258-B2 Adsorption cooling system using metal organic frameworks LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2021-05-04 US disclosed
CN-107428891-B Curable composition 施敏打硬株式会社 2021-04-20 CN disclosed
US-20210095899-A1 ADSORPTION COOLING SYSTEM USING METAL ORGANIC FRAMEWORKS LAWRENCE LIVERMORE NATIONAL SECURITY, LLC 2021-04-01 US disclosed
US-20210079266-A1 COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME SOULBRAIN CO., LTD. (KR) 2021-03-18 US disclosed
US-20210066707-A1 LITHIUM SECONDARY BATTERIES AND NONAQUEOUS ELECTROLYTE FOR USE IN THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2021-03-04 US disclosed
US-20210054282-A1 COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME SOULBRAIN CO., LTD. (KR) 2021-02-25 US disclosed
US-20210054236-A1 COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME SOULBRAIN CO., LTD. (KR) 2021-02-25 US disclosed
US-20210054280-A1 COMPOSITION FOR ETCHING SOULBRAIN CO., LTD. (KR) 2021-02-25 US disclosed
US-20210054286-A1 COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME SOULBRAIN CO., LTD. (KR) 2021-02-25 US disclosed
US-20210054238-A1 COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME SOULBRAIN CO., LTD. (KR) 2021-02-25 US disclosed
US-20210054276-A1 COMPOSITION FOR ETCHING SOULBRAIN CO., LTD. (KR) 2021-02-25 US disclosed
US-20210054283-A1 COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME SOULBRAIN CO., LTD. (KR) 2021-02-25 US disclosed
US-20210054284-A1 COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME SOULBRAIN CO., LTD. (KR) 2021-02-25 US disclosed
US-20210054281-A1 COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME SOULBRAIN CO., LTD. (KR) 2021-02-25 US disclosed
US-20210054277-A1 COMPOSITION FOR ETCHING SOULBRAIN CO., LTD. (KR) 2021-02-25 US disclosed
US-20210054235-A1 COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME SOULBRAIN CO., LTD. (KR) 2021-02-25 US disclosed
US-20210054237-A1 COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME SEONGNAM-SI, GYEONGGI-DO (KR) 2021-02-25 US disclosed
US-20210054278-A1 COMPOSITION FOR ETCHING SOULBRAIN CO., LTD. (KR) 2021-02-25 US disclosed
US-20210054234-A1 COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING THE SAME SOULBRAIN CO., LTD. (KR) 2021-02-25 US disclosed
US-20210054285-A1 COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME SOULBRAIN CO., LTD. (KR) 2021-02-25 US disclosed
US-20210054279-A1 COMPOSITION FOR ETCHING SOULBRAIN CO., LTD. (KR) 2021-02-25 US disclosed
US-20210047564-A1 COMPOSITION FOR ETCHING SOULBRAIN CO., LTD. (KR) 2021-02-18 US disclosed
EP-3772130-A1 ADDITIVE FOR NONAQUEOUS ELECTROLYTE SOLUTIONS, NONAQUEOUS ELECTROLYTE SOLUTION, AND ELECTRICITY STORAGE DEVICE Sumitomo Seika Chemicals Co., Ltd. (JP) 2021-02-03 EP disclosed
US-20200392292-A1 RESIN COMPOSITION, METHOD FOR PRODUCING RESIN COMPOSITION, FILM FORMATION METHOD, AND CURED PRODUCT TOKYO OHKA KOGYO CO., LTD. (JP) 2020-12-17 US disclosed
EP-1939971-B1 LITHIUM SECONDARY CELL AND NONAQUEOUS ELECTROLYTIC SOLUTION FOR USE THEREIN MITSUBISHI CHEM CORP (JP) 2020-12-09 EP disclosed
WO-2020195998-A9 EXPLOSIVE COMPOSITION AND METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING HETEROATOM-DOPED NANODIAMOND 株式会社ダイセル 2020-12-03 WO disclosed
CN-111937216-A Additive for nonaqueous electrolyte solution, and electricity storage device 住友精化株式会社 2020-11-13 CN disclosed
US-10830504-B2 Adsorption cooling system using metal organic frameworks LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2020-11-10 US disclosed
CN-105392845-B Photocurable composition 思美定株式会社 2020-10-20 CN disclosed
WO-2020195998-A1 EXPLOSIVE COMPOSITION AND METHOD FOR MANUFACTURING SAME, AND METHOD FOR MANUFACTURING HETEROATOM-DOPED NANODIAMOND 株式会社ダイセル 2020-10-01 WO disclosed
US-10767017-B2 Resin composition, method for producing resin composition, film formation method, and cured product TOKYO OHKA KOGYO CO., LTD. (JP) 2020-09-08 US disclosed
US-20200263087-A1 COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME SOULBRAIN CO., LTD. (KR) 2020-08-20 US disclosed
CN-110854433-A Electrolyte and electrochemical device 欣旺达电动汽车电池有限公司 2020-02-28 CN disclosed
US-10465112-B2 Composition for etching SOULBRAIN CO., LTD. (KR) 2019-11-05 US disclosed
EP-3557684-A2 LITHIUM SECONDARY BATTERIES AND NONAQUEOUS ELECTROLYTE FOR USE IN THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2019-10-23 EP disclosed
US-20190252672-A1 LITHIUM SECONDARY BATTERIES AND NONAQUEOUS ELECTROLYTE FOR USE IN THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2019-08-15 US disclosed
EP-2560229-B1 Lithium secondary batteries and nonaqueous electrolyte for use in the same MITSUBISHI CHEM CORP (JP) 2019-06-05 EP disclosed
EP-3217463-B1 LITHIUM SECONDARY BATTERIES AND NONAQUEOUS ELECTROLYTE FOR USE IN THE SAME MITSUBISHI CHEM CORP (JP) 2019-06-05 EP disclosed
US-20190136090-A1 COMPOSITION FOR ETCHING AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE USING THE SAME SOULBRAIN CO., LTD. (KR) 2019-05-09 US disclosed
CN-109535045-A A kind of preparation method of fluoroalkyl (S-oroalkane sulfonyl imido grpup) sulfonamide 华中科技大学 2019-03-29 CN disclosed
EP-3081612-B1 PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES CEMEDINE CO LTD (JP) 2018-11-14 EP disclosed
EP-3385353-A1 COMPOSITION FOR ETCHING AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE USING SAME Soulbrain Co., Ltd. (KR) 2018-10-10 EP disclosed
CN-108291132-A Etching composition and method for manufacturing semiconductor device using the same 秀博瑞殷株式公社 2018-07-17 CN disclosed
US-20180179338-A1 RESIN COMPOSITION, METHOD FOR PRODUCING RESIN COMPOSITION, FILM FORMATION METHOD, AND CURED PRODUCT TOKYO OHKA KOGYO CO., LTD. (JP) 2018-06-28 US disclosed
US-20180179442-A1 COMPOSITION FOR ETCHING SOULBRAIN CO., LTD. (KR) 2018-06-28 US disclosed
US-9868902-B2 Composition for etching SOULBRAIN CO., LTD. (KR) 2018-01-16 US disclosed
US-RE46657-E1 Method of making a trihalosilane DOW CORNING CORPORATION (US) 2018-01-02 US disclosed
EP-3217463-A1 LITHIUM SECONDARY BATTERIES AND NONAQUEOUS ELECTROLYTE FOR USE IN THE SAME Mitsubishi Chemical Corporation (JP) 2017-09-13 EP disclosed
US-9718999-B2 Photocurable composition having adhesive properties CEMEDINE CO., LTD (JP) 2017-08-01 US disclosed
US-20170040593-A1 LITHIUM SECONDARY BATTERIES AND NONAQUEOUS ELECTROLYTE FOR USE IN THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2017-02-09 US disclosed
US-20160312089-A1 PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES CEMEDINE CO., LTD. (JP) 2016-10-27 US disclosed
EP-3081612-A1 PHOTOCURABLE COMPOSITION HAVING ADHESIVE PROPERTIES Cemedine Co., Ltd. (JP) 2016-10-19 EP disclosed
US-20160152783-A1 PHOTOCURABLE COMPOSITION CEMEDINE CO., LTD. (JP) 2016-06-02 US disclosed
EP-3023462-A1 PHOTOCURABLE COMPOSITION Cemedine Co., Ltd. (JP) 2016-05-25 EP disclosed
US-20160017224-A1 COMPOSITION FOR ETCHING SOULBRAIN CO., LTD. (KR) 2016-01-21 US disclosed
US-9163046-B2 Process for producing substituted metallocene compounds for olefin polymerization EXXONMOBIL CHEMICAL PATENTS INC. (US) 2015-10-20 US disclosed
EP-2651954-B1 METHOD OF MAKING A TRIHALOSILANE DOW CORNING (US) 2015-09-16 EP disclosed
US-20150243936-A1 LITHIUM SECONDARY BATTERIES AND NONAQUEOUS ELECTROLYTE FOR USE IN THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2015-08-27 US disclosed
US-9112236-B2 Lithium secondary batteries and nonaqueous electrolyte for use in the same MITSUBISHI CHEMICAL CORPORATION (JP) 2015-08-18 US disclosed
EP-2780347-B1 A METHOD FOR PREPARING A DIORGANODIHALOSILANE DOW CORNING (US) 2015-08-12 EP disclosed
US-9091466-B2 Solar-powered cooling system LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2015-07-28 US disclosed
US-9029022-B2 Lithium secondary batteries and nonaqueous electrolyte for use in the same MITSUBISHI CHEMICAL CORPORATION (JP) 2015-05-12 US disclosed
CN-104530820-A Printing ink containing titanium dioxide/calcium carbonate/silicone rubber, porous titanium dioxide/high-temperature vulcanizing silicone rubber coating and preparation method thereof WUHAN YIZHIHE TECHNOLOGY CO LTD 2015-04-22 CN disclosed
US-8974889-B2 Nanostructured thin film and method for controlling surface properties thereof SAMSUNG ELECTRONICS CO., LTD. (KR) 2015-03-10 US disclosed
US-8865927-B2 Method for preparing a diorganodihalosilane DOW CORNING CORPORATION (US) 2014-10-21 US disclosed
EP-2780347-A1 A METHOD FOR PREPARING A DIORGANODIHALOSILANE Dow Corning Corporation (US) 2014-09-24 EP disclosed
US-20140243494-A1 Method for Preparing a Diorganodihalosilane DOW SILICONES CORPORATION 2014-08-28 US disclosed
US-8697022-B2 Method of making a trihalosilane DOW CORNING CORPORATION (US) 2014-04-15 US disclosed
US-8674129-B2 Method of making a diorganodihalosilane DOW CORNING CORPORATION (US) 2014-03-18 US disclosed
US-20140060093-A1 SOLAR-POWERED COOLING SYSTEM LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2014-03-06 US disclosed
US-8613204-B2 Solar-powered cooling system LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2013-12-24 US disclosed
US-20130283849-A1 ADSORPTION COOLING SYSTEM USING METAL ORGANIC FRAMEWORKS LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2013-10-31 US disclosed
US-20130283846-A1 ADSORPTION COOLING SYSTEM USING METAL ORGANIC FRAMEWORKS LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2013-10-31 US disclosed
US-20130283845-A1 ADSORPTION COOLING SYSTEM USING CARBON AEROGEL LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2013-10-31 US disclosed
US-20130283847-A1 ADSORPTION COOLING SYSTEM USING CARBON AEROGEL LAWRENCE LIVERMORE NATIONAL SECURITY, LLC (US) 2013-10-31 US disclosed
EP-2651955-A1 METHOD OF MAKING A DIORGANODIHALOSILANE Dow Corning Corporation (US) 2013-10-23 EP disclosed
EP-2651954-A1 METHOD OF MAKING A TRIHALOSILANE Dow Corning Corporation (US) 2013-10-23 EP disclosed
US-20130261279-A1 Method of Making a Diorganodihalosilane DOW CORNING CORPORATION (US) 2013-10-03 US disclosed
US-20130251617-A1 Method of Making a Trihalosilane DOW SILICONES CORPORATION 2013-09-26 US disclosed
WO-2013074219-A1 A METHOD FOR PREPARING A DIORGANODIHALOSILANE DOW CORNING CORPORATION (US) 2013-05-23 WO disclosed
EP-2560229-A2 Lithium secondary batteries and nonaqueous electrolyte for use in the same Mitsubishi Chemical Corporation (JP) 2013-02-20 EP disclosed
US-20130022861-A1 LITHIUM SECONDARY BATTERIES AND NONAQUEOUS ELECTROLYTE FOR USE IN THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2013-01-24 US disclosed
EP-2011834-B1 CURABLE COMPOSITION KANEKA CORP (JP) 2012-07-25 EP disclosed
WO-2012082385-A1 METHOD OF MAKING A DIORGANODIHALOSILANE DOW CORNING CORPORATION (US) 2012-06-21 WO disclosed
WO-2012082686-A1 METHOD OF MAKING A TRIHALOSILANE DOW CORNING CORPORATION (US) 2012-06-21 WO disclosed
US-8124239-B2 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2012-02-28 US disclosed
US-20110100036-A1 Solar-Powered Cooling System U.S. DEPARTMENT OF ENERGY 2011-05-05 US disclosed
US-20100279066-A1 NANOSTRUCTURED THIN FILM AND METHOD FOR CONTROLLING SURFACE PROPERTIES THEREOF SAMSUNG ELECTRONICS CO., LTD. (KR) 2010-11-04 US disclosed
US-7772332-B2 organotin-free catalyst; fluorosilane catalyst and an amine or aminoalkylsiloxane coupler used together for high curing of a polymer with a reactive silicon group; polymer is hydrosilylated polyether, polyisobutylene, or polyacrylate; sealant, adhesive; oil resistance; elasticity KANEKA CORPORATION (JP) 2010-08-10 US disclosed
US-20100155121-A1 SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME FUJITSU LIMITED (JP) 2010-06-24 US disclosed
US-20100113717-A1 Process For Producing Substituted Metallocene Compounds For Olefin Polymerization EXXONMOBIL CHEMICAL PATENTS INC. 2010-05-06 US disclosed
US-7709670-B2 Process for producing substituted metallocene compounds for olefin polymerization EXXONMOBIL CHEMICAL PATENTS INC. (US) 2010-05-04 US disclosed
EP-1866322-B1 PROCESS FOR PRODUCING SUBSTITUTED METALLOCENE COMPOUNDS FOR OLEFIN POLYMERIZATION EXXONMOBIL CHEM PATENTS INC (US) 2010-02-24 EP disclosed
US-7659357-B2 Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed FUJITSU LIMITED (JP) 2010-02-09 US disclosed
US-20100015514-A1 LITHIUM SECONDARY BATTERIES AND NONAQUEOUS ELECTROLYTE FOR USE IN THE SAME MITSUBISHI CHEMICAL CORPORATION (JP) 2010-01-21 US disclosed
US-7572303-B2 A symmetrical dialkyl carbonate, a metal, borong, silicon, or group 7 compound, a hydrogen or hydrocarbon-based fuel, an oxidizer, and a metallic cocatalyst; minimized hydrolysis; improved combustion and storage stability OCTANE INTERNATIONAL, LTD. (US) 2009-08-11 US disclosed
US-20090069505-A1 CURABLE COMPOSITION KANEKA CORPORATION (JP) 2009-03-12 US disclosed
EP-2011834-A1 CURABLE COMPOSITION Kaneka Corporation (JP) 2009-01-07 EP disclosed
EP-1939971-A1 LITHIUM SECONDARY CELL AND NONAQUEOUS ELECTROLYTIC SOLUTION FOR USE THEREIN Mitsubishi Chemical Corporation (JP) 2008-07-02 EP disclosed
US-7332446-B2 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. (JP) 2008-02-19 US disclosed
EP-1866322-A2 PROCESS FOR PRODUCING SUBSTITUTED METALLOCENE COMPOUNDS FOR OLEFIN POLYMERIZATION ExxonMobil Chemical Patents Inc. (US) 2007-12-19 EP disclosed
US-20070026689-A1 Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same FUJITSU LIMITED (JP) 2007-02-01 US disclosed
US-20060160968-A1 Process for producing substituted metallocene compounds for olefin polymerization EXXONMOBIL CHEMICAL PATENTS INC. 2006-07-20 US disclosed
WO-2006065844-A2 PROCESS FOR PRODUCING SUBSTITUTED METALLOCENE COMPOUNDS FOR OLEFIN POLYMERIZATION EXXONMOBIL CHEMICAL PATENTS INC. (US) 2006-06-22 WO disclosed
EP-0954558-B1 FUEL COMPOSITIONS EXHIBITING IMPROVED FUEL STABILITY ORR WILLIAM C (US) 2006-06-14 EP disclosed
US-20060110351-A1 Use of silanes on cosmetic agents and methods for treating hair ITN NANOVATION AG (DE) 2006-05-25 US disclosed
EP-1555990-A1 USE OF SILANES IN COSMETIC AGENTS AND METHODS FOR TREATING HAIR ITN NANOVATION GMBH (DE) 2005-07-27 EP disclosed
US-20050118742-A1 Method for reducing the adhesive properties of MEMS and anti-adhesion-coated device ROBERT BOSCH GMBH (DE) 2005-06-02 US disclosed
US-20050053552-A1 Phase shift colloids as ultrasound contrast agents QUAY STEVEN C (US) 2005-03-10 US disclosed
US-20050044778-A1 Fuel compositions employing catalyst combustion structure OCTANE INTERNATIONAL, LTD. 2005-03-03 US disclosed
US-20040237384-A1 Fuel compositions exhibiting improved fuel stability OCTANE INTERNATIONAL, LTD. 2004-12-02 US disclosed
CN-1542071-A Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device ��Խ��ѧ��ҵ��ʽ���� 2004-11-03 CN disclosed
US-20040188809-A1 Composition for forming porous film, porous film and method for forming the same, interlevel insulator film and semiconductor device SHIN-ETSU CHEMICAL CO., LTD. 2004-09-30 US disclosed
EP-1016667-B1 Redistributing silalkylenes in an alkyl-rich silalkylene-containing residue DOW CORNING (US) 2004-04-07 EP disclosed
WO-2004012691-A1 USE OF SILANES IN COSMETIC AGENTS AND METHODS FOR TREATING HAIR ITN NANOVATION GMBH (DE) 2004-02-12 WO disclosed
US-6652608-B1 Fuel compositions exhibiting improved fuel stability OCTANE INTERNATIONAL, LTD. 2003-11-25 US disclosed
US-6569404-B1 Aqueous colloidal suspension, dispersed phase is gas microbubbles of perfluoropropane, perfluorobutane, perfluoropentane, perfluorohexane or sulfur hexafluoride; fluorinated amphiphile for stabilizing microbubbles AMERSHAM HEALTH A/S (NO) 2003-05-27 US disclosed
US-6340843-B1 Plasma CVD dielectric film and process for forming the same NEC CORPORATION (JP) 2002-01-22 US disclosed
US-6245319-B1 Colloidal dispersions of perfluoropentane SONUS PHARMACEUTICALS, INC. 2001-06-12 US disclosed
EP-0680341-B1 PHASE SHIFT COLLOIDS AS ULTRASOUND CONTRAST AGENTS SONUS PHARMA INC (US) 2001-05-09 EP disclosed
EP-1051461-A2 FUEL COMPOSITIONS EMPLOYING CATALYST COMBUSTION STRUCTURE ORR, William C. (US) 2000-11-15 EP disclosed
EP-1038535-A2 Use of selected perfluorocarbons for the preparation of diagnostic ultrasound contrast agents SONUS PHARMACEUTICALS, INC. (US) 2000-09-27 EP disclosed
EP-1016667-A2 Redistributing silalkylenes in an alkyl-rich silalkylene-containing residue DOW CORNING CORPORATION (US) 2000-07-05 EP disclosed
US-6077574-A Plasma CVD process for forming a fluorine-doped SiO2 dielectric film NEC CORPORATION (JP) 2000-06-20 US disclosed
EP-0762527-B1 Rechargeable lithium battery having a specific electrolyte CANON KK (JP) 2000-05-31 EP disclosed
US-6013824-A CONTACTING ALKYL-RICH SILALKYLENE-CONTAINING RESIDUE WITH HALOSILANE SELECTED FROM ALKYLTRIHALOSILANES AND TETRAHALOSILANES IN PRESENCE OF REDISTRIBUTION CATALYST, HEATING TO FORM DIALKYLDIHALOSILANE DOW CORNING CORPORATION (US) 2000-01-11 US disclosed
WO-1999066009-A2 FUEL COMPOSITIONS EMPLOYING CATALYST COMBUSTION STRUCTURE ORR WILLIAM C (US) 1999-12-23 WO disclosed
EP-0954558-A1 FUEL COMPOSITIONS EXHIBITING IMPROVED FUEL STABILITY ORR, William C. (US) 1999-11-10 EP disclosed
WO-1998026028-A1 FUEL COMPOSITIONS EXHIBITING IMPROVED FUEL STABILITY ORR WILLIAM C (US) 1998-06-18 WO disclosed
US-5658689-A Rechargeable lithium battery having a specific electrolyte CANON KABUSHIKI KAISHA (JP) 1997-08-19 US disclosed
EP-0762527-A1 Rechargeable lithium battery having a specific electrolyte CANON KABUSHIKI KAISHA (JP) 1997-03-12 EP disclosed
EP-0680341-A1 PHASE SHIFT COLLOIDS AS ULTRASOUND CONTRAST AGENTS SONUS PHARMACEUTICALS, INC. (US) 1995-11-08 EP disclosed
EP-0405780-B1 An integrated process for alkylation and redistribution of halosilanes DOW CORNING (US) 1995-02-15 EP disclosed
EP-0365207-B1 Preparation of organosilanes DOW CORNING (US) 1995-02-15 EP disclosed
WO-1994016739-A1 PHASE SHIFT COLLOIDS AS ULTRASOUND CONTRAST AGENTS SONUS PHARMACEUTICALS, INC. (US) 1994-08-04 WO disclosed
EP-0405780-A1 An integrated process for alkylation and redistribution of halosilanes DOW CORNING CORPORATION (US) 1991-01-02 EP disclosed
US-4946980-A BY REACTING A HALIDE OF SILICON WITH AN ALKYL HALIDE IN THE PRESENCE OF A METAL WHICH IS A HALOGEN ACCEPTOR AND A CATALYST DOW CORNING CORPORATION (US) 1990-08-07 US disclosed
EP-0365207-A2 Preparation of organosilanes DOW CORNING CORPORATION (US) 1990-04-25 EP disclosed
US-4888435-A REACTING SILICON HALIDE AND ALKYL HALIDE IN PRESENCE OF HALOGEN ACCEPTOR METAL DOW CORNING CORPORATION (US) 1989-12-19 US disclosed
US-4853251-A REACTING IN SPACE HOUSING SUBSTRATE A HALOGEN-CARBON COMPOUND AND HYDROGEN OR A HALOGEN CANON KABUSHIKI KAISHA (JP) 1989-08-01 US disclosed
US-4818563-A FORMING ACTIVATED SPECIES SEPARATELY, FEEDING INTO CHAMBER WITH SUBSTRATE, HEATING CANON KABUSHIKI KAISHA (JP) 1989-04-04 US disclosed
US-4610859-A REACTING ALLOY WITH ACID TO GIVE SILANE, DISILANE TRISILANE, TETRASILANE MITSUI TOATSU CHEMICALS, INC. (JP) 1986-09-09 US disclosed
EP-0149363-A2 Process for producing silicon hydrides MITSUI TOATSU CHEMICALS, Inc. (JP) 1985-07-24 EP disclosed
US-4393229-A HALOGENATION, TRANSALKYLATION GENERAL ELECTRIC COMPANY (US) 1983-07-12 US disclosed
US-4393229-A HALOGENATION, TRANSALKYLATION GENERAL ELECTRIC COMPANY (US) 1983-07-12 US disclosed