⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL730665 | 0.93 | ALDH1A1 (0.44) | — | |
| SCHEMBL702746 | 0.83 | — | — | |
| SCHEMBL329326 | 0.83 | — | — | |
| SCHEMBL730610 | 0.77 | — | — | |
| SCHEMBL31248582 | 0.77 | — | — | |
| Fluoride Ion SCHEMBL9191251 | 0.72 | — | — | |
| SCHEMBL1452160 | 0.72 | — | — | |
| SCHEMBL8087597 | 0.72 | — | — | |
| Fluoride Ion SCHEMBL9191252 | 0.72 | — | — | |
| SCHEMBL3891838 | 0.72 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 520 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4747226-A1 | METHODS OF TREATING DIFLUOROPROPENE COMPOSITIONS | The Chemours Company FC, LLC (US) | 2026-05-27 | — | — | EP | claimed |
| EP-4724505-A1 | NON-COORDINATED ALKYLALUMINUM FREE ANION MODIFIED ALUMOXANES AND METHODS THEREOF | ExxonMobil Technology and Engineering Company (US) | 2026-04-15 | — | — | EP | claimed |
| EP-4724507-A1 | SOLUTION CATALYST SYSTEMS AND USES THEREOF | ExxonMobil Technology and Engineering Company (US) | 2026-04-15 | — | — | EP | claimed |
| WO-2025019197-A1 | METHODS OF TREATING DIFLUOROPROPENE COMPOSITIONS | THE CHEMOURS COMPANY FC, LLC (US) | 2025-01-23 | — | — | WO | claimed |
| WO-2024253829-A1 | SOLUTION CATALYST SYSTEMS AND USES THEREOF | ExxonMobil Technology and Engineering Company (US) | 2024-12-12 | — | — | WO | claimed |
| WO-2024253831-A1 | NON-COORDINATED ALKYLALUMINUM FREE ANION MODIFIED ALUMOXANES AND METHODS THEREOF | ExxonMobil Technology and Engineering Company (US) | 2024-12-12 | — | — | WO | claimed |
| WO-2024232632-A1 | TRANSITION METAL SUPPORTED CATALYST WITH IMPROVED HYDROGENATION ACTIVITY AND USE THEREOF | 한양대학교 산학협력단 | 2024-11-14 | — | — | WO | claimed |
| CN-118878349-A | Super-hydrophobic modification method of oxide porous ceramic | 巡航(苏州)新材料技术有限公司 | 2024-11-01 | — | — | CN | claimed |
| CN-116495759-A | Method for preparing lithium fluoride by adopting fluorosilane compound | 广州天赐高新材料股份有限公司 | 2023-07-28 | — | — | CN | claimed |
| CN-112919441-B | Method for coproducing lithium difluorophosphate and lithium difluorooxalate phosphate | 江苏国泰超威新材料有限公司 | 2022-07-29 | — | — | CN | claimed |
| CN-109888387-A | Capacitor batteries electrolyte and preparation method thereof | 无锡凯帕德瑞科技有限公司 | 2019-06-14 | — | — | CN | claimed |
| CN-109888180-A | Capacitor batteries | 无锡凯帕德瑞科技有限公司 | 2019-06-14 | — | — | CN | claimed |
| CN-107556932-A | A kind of preparation method of glass-encapsulated EVA adhesive film | 陈建峰 | 2018-01-09 | — | — | CN | claimed |
| EP-2600460-B1 | NONAQUEOUS ELECTROLYTE SOLUTION FOR LITHIUM SECONDARY BATTERY, AND LITHIUM SECONDARY BATTERY CONTAINING SAME | LG CHEMICAL LTD (KR) | 2015-01-28 | — | — | EP | claimed |
| EP-2600460-A2 | NONAQUEOUS ELECTROLYTE SOLUTION FOR LITHIUM SECONDARY BATTERY, AND LITHIUM SECONDARY BATTERY CONTAINING SAME | LG Chem, Ltd. (KR) | 2013-06-05 | — | — | EP | claimed |
| US-20130136997-A1 | NON-AQUEOUS ELECTROLYTE FOR LITHIUM SECONDARY BATTERY AND LITHIUM SECONDARY BATTERY COMPRISING THE SAME | LG CHEM, LTD. (KR) | 2013-05-30 | — | — | US | claimed |
| EP-2011834-B1 | CURABLE COMPOSITION | KANEKA CORP (JP) | 2012-07-25 | — | — | EP | claimed |
| US-7087519-B2 | Method for forming contact having low resistivity using porous plug and method for forming semiconductor devices using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2006-08-08 | — | — | US | claimed |
| US-20050054183-A1 | Method for forming contact having low resistivity using porous plug and method for forming semiconductor devices using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2005-03-10 | — | — | US | claimed |
| US-20020137276-A1 | Method for forming contact having low resistivity using porous plug and method for forming semiconductor devices using the same | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2002-09-26 | — | — | US | claimed |