Known targets — ChEMBL curated mechanism
ACHEBDKRB2CHRM1CHRM2CHRM3CHRNA1CHRNB1CHRNDCHRNECHRNGGUCY1A1GUCY1A2GUCY1B1GUCY1B2NAMPTPTAFRSLC10A2SLC6A2SLC6A3TACR1dacAdacBdacCftsImrcAmrcBmrdA
The experimentally established mechanism targets of Hydrochloric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE known ✓ | P22303 | 5/20 | 0.37 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | LMNA | P02545 | 1/20 | 0.48 |
| ▸ | TYR | P14679 | 1/20 | 0.48 |
| ▸ | KIF11 | P52732 | 3/20 | 0.46 |
| ▸ | SLC22A2 | O15244 | 1/20 | 0.43 |
| ▸ | SLC22A1 | O15245 | 1/20 | 0.43 |
| ▸ | SLC22A3 | O75751 | 1/20 | 0.43 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.39 |
| ▸ | HPGD | P15428 | 2/20 | 0.38 |
| ▸ | NPC1 | O15118 | 1/20 | 0.38 |
| ▸ | MAPT | P10636 | 1/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.38 |
| ▸ | RAB9A | P51151 | 1/20 | 0.38 |
| ▸ | HDAC1 | Q13547 | 1/20 | 0.38 |
| ▸ | BCHE | P06276 | 5/20 | 0.37 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.37 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.37 |
| ▸ | SRD5A2 | P31213 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12762156 | 0.97 | TSHR (0.52) | TSHRLMNATYRKIF11SLC22A2 | |
| SCHEMBL70734 | 0.97 | TSHR (0.52) | TSHRLMNATYRKIF11SLC22A2 | |
| Water SCHEMBL515827 | 0.94 | TSHR (0.50) | TSHRLMNATYRKIF11SLC22A2 | |
| Iodide SCHEMBL2968443 | 0.94 | TSHR (0.50) | TSHRLMNATYRKIF11SLC22A2 | |
| Bromide SCHEMBL10810288 | 0.94 | TSHR (0.50) | TSHRLMNATYRKIF11SLC22A2 | |
| Hydrochloric Acid SCHEMBL5360882 | 0.91 | KDM1A (0.44) | TSHRLMNATYRKIF11SLC22A2 | |
| SCHEMBL4180074 | 0.87 | TSHR (0.71) | TSHRLMNATYRKIF11SLC22A2 | |
| SCHEMBL425907 | 0.87 | KDM1A (0.45) | TSHRLMNATYRKIF11SLC22A2 | |
| SCHEMBL3813161 | 0.87 | TSHR (0.44) | TSHRLMNATYRKIF11SLC22A2 | |
| SCHEMBL374593 | 0.87 | TSHR (0.44) | TSHRLMNATYRKIF11SLC22A2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 146 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4563614-A1 | CURABLE COMPOSITION COMPRISING A MULTIFUNCTIONAL HALOGENATED THIOXANTHONE AND ITS USES | ARKEMA FRANCE (FR) | 2025-06-04 | — | — | EP | claimed |
| WO-2025106936-A1 | POLY(METH)ACRYLIMIDE MATERIALS WITH ENHANCED THERMOMECHANICAL PROPERTIES | GENCORES, INC. (US) | 2025-05-22 | — | — | WO | claimed |
| CN-119390619-A | Preparation method of bis (4-tert-butylphenyl) iodonium bis (perfluorobutane sulfonyl) imine | 天津众泰材料科技有限公司 | 2025-02-07 | — | — | CN | claimed |
| US-11535758-B2 | Thermosetting powder coating compositions having lower chalk-free temperature | COVESTRO (NETHERLANDS) B.V. (NL) | 2022-12-27 | — | — | US | claimed |
| US-20210363357-A1 | THERMOSETTING POWDER COATING COMPOSITIONS HAVING LOWER CHALK-FREE TEMPERATURE | COVESTRO (NETHERLANDS) B.V. (NL) | 2021-11-25 | — | — | US | claimed |
| EP-3519515-B1 | THERMOSETTING POWDER COATING COMPOSITIONS HAVING LOWER CHALK-FREE TEMPERATURE | DSM IP ASSETS BV (NL) | 2020-07-15 | — | — | EP | claimed |
| EP-3519515-A1 | THERMOSETTING POWDER COATING COMPOSITIONS HAVING LOWER CHALK-FREE TEMPERATURE | DSM IP Assets B.V. (NL) | 2019-08-07 | — | — | EP | claimed |
| WO-2018060286-A1 | THERMOSETTING POWDER COATING COMPOSITIONS HAVING LOWER CHALK-FREE TEMPERATURE | DSM IP ASSETS B.V. (NL) | 2018-04-05 | — | — | WO | claimed |
| US-20260117080-A1 | METAL OXIDE PARTICLES HAVING CORE/SHELL STRUCTURE HAVING UNIFORM PARTICLE SIZE DISTRIBUTION, AND METHOD FOR PRODUCING SAME | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-30 | — | — | US | disclosed |
| US-20260118757-A1 | RADIATION-SENSITIVE RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2026-04-30 | — | — | US | disclosed |
| US-12606711-B2 | Conductive stannic oxide particle-containing organic solvent-dispersed sol and method of production thereof | NISSAN CHEMICAL CORPORATION (JP) | 2026-04-21 | — | — | US | disclosed |
| EP-4725976-A1 | POLYMERIC CYCLOALIPHATIC EPOXIDES | ARKEMA FRANCE (FR) | 2026-04-15 | — | — | EP | disclosed |
| EP-4722811-A1 | RESIST COMPOSITION AND PATTERN FORMING METHOD | TOKYO OHKA KOGYO CO., LTD. (JP) | 2026-04-08 | — | — | EP | disclosed |
| EP-4703352-A1 | SULFONATE, OXIME SULFONATE, IMIDE SULFONATE, AMIDE SULFONATE, ACID GENERATING AGENT CONTAINING SAID COMPOUND, AND PHOTORESIST CONTAINING SAID ACID GENERATING AGENT | San-Apro Ltd. (JP) | 2026-03-04 | — | — | EP | disclosed |
| EP-0907109-A1 | Process for device fabrication using a radiation-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1999-04-07 | — | — | EP | disclosed |
| US-5879857-A | POLYMER, PHOTOACID GENERATOR, DISSOLUTION INHIBITOR | LUCENT TECHNOLOGIES INC. (US) | 1999-03-09 | — | — | US | disclosed |
| EP-0880074-A1 | An energy-sensitive resist material and a process for device fabrication using an energy-sensitive resist material | LUCENT TECHNOLOGIES INC. (US) | 1998-11-25 | — | — | EP | disclosed |
| EP-0848288-A1 | Resist materials | LUCENT TECHNOLOGIES INC. (US) | 1998-06-17 | — | — | EP | disclosed |
| US-5587224-A | COATING COMPRISES PHOTOLYSIS REACTION PRODUCT OF CHARGE TRANSPORTING POLYMER AND PHOTO ACID COMPOUND | XEROX CORPORATION (US) | 1996-12-24 | — | — | US | disclosed |
| US-4439517-A | Process for the formation of images with epoxide resin | CIBA-GEIGY CORPORATION (US) | 1984-03-27 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (3 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20260117080-A1 | METAL OXIDE PARTICLES HAVING CORE/SHELL STRUCTURE HAVING UNIFORM PARTICLE SIZE DISTRIBUTION, AND METHOD FOR PRODUCING SAME | CD63, SLC39A3, ZRANB2 | ACHE 1550/4885TSHR 76/4885LMNA 2902/4885 |
| US-12606711-B2 | Conductive stannic oxide particle-containing organic solvent-dispersed sol and method of production thereof | SCO2, SOD1, SPOP | ACHE 1431/4885TSHR 1394/4885LMNA 954/4885 |
| US-20260118757-A1 | RADIATION-SENSITIVE RESIST COMPOSITION AND PATTERN FORMATION METHOD USING THE SAME | SLC39A14, HCN4, SLC11A2 | ACHE 4420/4885TSHR 897/4885LMNA 3584/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.