⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL708396 | 0.82 | — | — | |
| SCHEMBL703332 | 0.82 | — | — | |
| SCHEMBL706251 | 0.76 | — | — | |
| SCHEMBL704943 | 0.76 | — | — | |
| SCHEMBL190904 | 0.74 | — | — | |
| SCHEMBL9154732 | 0.70 | — | — | |
| SCHEMBL9350798 | 0.70 | ALDH1A1 (0.33) | — | |
| SCHEMBL1805920 | 0.70 | — | — | |
| SCHEMBL23581792 | 0.67 | — | — | |
| SCHEMBL8160870 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 187 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20250060673-A1 | DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS | LAM RES CORP (US) | 2025-02-20 | — | — | US | claimed |
| WO-2024232632-A1 | TRANSITION METAL SUPPORTED CATALYST WITH IMPROVED HYDROGENATION ACTIVITY AND USE THEREOF | 한양대학교 산학협력단 | 2024-11-14 | — | — | WO | claimed |
| WO-2023115023-A1 | DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS | LAM RESEARCH CORPORATION (US) | 2023-06-22 | — | — | WO | claimed |
| CN-108147385-B | Method for producing lithium difluorophosphate | 中央硝子株式会社 | 2021-02-23 | — | — | CN | claimed |
| CN-108147385-A | The manufacturing method of difluorophosphate | 中央硝子株式会社 | 2018-06-12 | — | — | CN | claimed |
| US-7057065-B2 | Process for production of vinylphosphonic acids and silyl esters thereof | RHODIA INC. (US) | 2006-06-06 | — | — | US | claimed |
| WO-2004085695-A2 | PROCESS FOR PRODUCTION OF VINYLPHOSPHONIC ACIDS AND SILYL ESTERS THEREOF | RHODIA, INC. (US) | 2004-10-07 | — | — | WO | claimed |
| US-20040186315-A1 | Process for production of vinylphosphonic acids and silyl esters thereof | Energy Solutions (US) LLC | 2004-09-23 | — | — | US | claimed |
| US-3960845-A | HALOGENATION | SANKYO COMPANY LIMITED (JA) | 1976-06-01 | — | — | US | claimed |
| US-20250376758-A1 | SELECTIVE DEPOSITION OF METAL-CONTAINING MATERIAL | ASM IP HOLDING BV (NL) | 2025-12-11 | — | — | US | disclosed |
| WO-2025047528-A1 | METHOD FOR PRODUCING CYCLIC SILANE COMPOUND | 株式会社クレハ | 2025-03-06 | — | — | WO | disclosed |
| US-20250060673-A1 | DEVELOPMENT STRATEGY FOR HIGH-ABSORBING METAL-CONTAINING PHOTORESISTS | LAM RES CORP (US) | 2025-02-20 | — | — | US | disclosed |
| WO-2025028549-A1 | METHOD FOR PRODUCING CYCLIC SILANE COMPOUND | 株式会社クレハ | 2025-02-06 | — | — | WO | disclosed |
| WO-2025013834-A1 | CYCLIC SILANE COMPOUND PRODUCTION METHOD | 株式会社クレハ | 2025-01-16 | — | — | WO | disclosed |
| EP-0127487-B1 | CATALYST COMPONENT FOR POLYMERIZATION OF OLEFINS | TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) | 1988-10-12 | — | — | EP | disclosed |
| US-4751170-A | Silylation method onto surface of polymer membrane and pattern formation process by the utilization of silylation method | NIPPON TELEGRAPH AND TELEPHONE CORPORATION (JP) | 1988-06-14 | — | — | US | disclosed |
| US-4595735-A | Organoaluminum compound containing magnesium, titanium, silicon | TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) | 1986-06-17 | — | — | US | disclosed |
| US-4544648-A | COORDINATION CATALYST | TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) | 1985-10-01 | — | — | US | disclosed |
| EP-0127487-A1 | Catalyst component for polymerization of olefins | TOA NENRYO KOGYO KABUSHIKI KAISHA (JP) | 1984-12-05 | — | — | EP | disclosed |
| US-3960845-A | HALOGENATION | SANKYO COMPANY LIMITED (JA) | 1976-06-01 | — | — | US | disclosed |