⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL703833 | 0.83 | ADRB2 (0.38) | — | |
| SCHEMBL8667193 | 0.79 | TDP1 (0.32) | — | |
| SCHEMBL28998036 | 0.78 | — | — | |
| SCHEMBL29201652 | 0.78 | — | — | |
| SCHEMBL5834114 | 0.78 | — | — | |
| SCHEMBL5834628 | 0.78 | — | — | |
| SCHEMBL22534475 | 0.77 | — | — | |
| SCHEMBL5834468 | 0.76 | — | — | |
| SCHEMBL707891 | 0.75 | — | — | |
| SCHEMBL15839797 | 0.74 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 102 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115093245-A | Foaming ceramic plate containing rare earth elements | 江西现代职业技术学院 | 2022-09-23 | — | — | CN | claimed |
| US-20260118791-A1 | TONER | CANON KK (JP) | 2026-04-30 | — | — | US | disclosed |
| EP-4086705-B1 | TONER | CANON KK (JP) | 2026-03-25 | — | — | EP | disclosed |
| EP-4012501-B1 | EXTERNAL ADDITIVE FOR TONER, TONER AND IMAGE FORMING APPARATUS | CANON KK (JP) | 2026-02-11 | — | — | EP | disclosed |
| US-12487539-B2 | Fine particle, external additive for toners, and toner | CANON KABUSHIKI KAISHA (JP) | 2025-12-02 | — | — | US | disclosed |
| US-20250334892-A1 | FINE POWDER FOR TONER AND TONER | CANON KK (JP) | 2025-10-30 | — | — | US | disclosed |
| US-12360470-B2 | External additive for toner, toner and image forming apparatus | CANON KABUSHIKI KAISHA (JP) | 2025-07-15 | — | — | US | disclosed |
| US-12353167-B2 | External additive for toner and toner | CANON KABUSHIKI KAISHA (JP) | 2025-07-08 | — | — | US | disclosed |
| US-12222677-B2 | Fine particle, external additive for toner, toner, two-component developer, and method for manufacturing toner | CANON KABUSHIKI KAISHA (JP) | 2025-02-11 | — | — | US | disclosed |
| US-12140906-B2 | External additive for toner and toner | CANON KABUSHIKI KAISHA (JP) | 2024-11-12 | — | — | US | disclosed |
| US-7413775-B2 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION (JP) | 2008-08-19 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| CN-1891757-A | Silica film forming material, silica film and method of manufacturing the same | FUJITSU LTD (JP) | 2007-01-10 | — | — | CN | disclosed |
| US-7160625-B2 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION (JP) | 2007-01-09 | — | — | US | disclosed |
| US-20060127683-A1 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION | 2006-06-15 | — | — | US | disclosed |
| US-7005532-B2 | Process of producing alkoxysilanes | TOAGOSEI CO., LTD. (JP) | 2006-02-28 | — | — | US | disclosed |
| US-20050070730-A1 | Production processes for triorganomonoalkoxysilanes and triorganomonochlorosilanes | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2005-03-31 | — | — | US | disclosed |
| US-20050020845-A1 | Process of producing alkoxysilanes | TOAGOSEI CO., LTD. (JP) | 2005-01-27 | — | — | US | disclosed |
| EP-1428828-A1 | PROCESS FOR PREPARATION OF ALKOXYSILANES | TOAGOSEI CO., LTD. (JP) | 2004-06-16 | — | — | EP | disclosed |
| US-20030180550-A1 | Insulating film material containing an organic silane compound, its production method and semiconductor device | TOSOH CORPORATION | 2003-09-25 | — | — | US | disclosed |