SCHEMBL7075588

SCHEMBL7075588

COc1cocc1C(=O)Cl

nearest known ligand 0.35

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MAPT P10636 2/20 0.35
CTSD P07339 1/20 0.35
HTT P42858 2/20 0.34
CYP3A4 P08684 2/20 0.34
LCK P06239 1/20 0.33
FYN P06241 1/20 0.33
KDM4E B2RXH2 4/20 0.33
ALDH1A1 P00352 4/20 0.33
LMNA P02545 2/20 0.33
GAA P10253 2/20 0.33
HSD17B10 Q99714 1/20 0.33
CA12 O43570 2/20 0.32
CA1 P00915 2/20 0.32
CA2 P00918 2/20 0.32
CA7 P43166 2/20 0.32
CA9 Q16790 2/20 0.32
CA14 Q9ULX7 2/20 0.32
HPGD P15428 2/20 0.32
TDP1 Q9NUW8 1/20 0.32
HMGCR P04035 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5153932 0.83 LCK (0.48) MAPTHTTLCKFYNKDM4E
SCHEMBL7068764 0.79 TSHR (0.42) HTTCYP3A4KDM4ELMNAHSD17B10
SCHEMBL7231260 0.77 ALDH1A1 (0.39) ALDH1A1
SCHEMBL8902778 0.73 CYP3A4 (0.54) HTTCYP3A4LCKFYNKDM4E
SCHEMBL7072472 0.71
SCHEMBL12515330 0.71 CYP3A4 (0.52) HTTCYP3A4LCKFYNKDM4E
SCHEMBL2762009 0.71
SCHEMBL3651991 0.70 CYP3A4 (0.61) MAPTHTTCYP3A4LCKFYN
SCHEMBL4357189 0.69 CA9 (0.44) MAPTCTSDHTTCYP3A4KDM4E
SCHEMBL7074896 0.68 ALDH1A1 (0.30) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-1231816-C Photoresist compositions SUMITOMO CHEMICAL CO (JP) 2005-12-14 CN disclosed
EP-0945764-B1 Photoresist composition SUMITOMO CHEMICAL CO (JP) 2003-06-18 EP disclosed
US-6258507-B1 UNSATURATED AROMATIC ACRYLATED ESTER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2001-07-10 US disclosed
CN-1230704-A Photoresist compositions SUMITOMO CHEMICAL CO (JP) 1999-10-06 CN disclosed
EP-0945764-A2 Photoresist composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1999-09-29 EP disclosed
US-3982922-A Herbicidal compositions containing furancarboxamides VELSICOL CHEMICAL CORPORATION (US) 1976-09-28 US disclosed