⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL6054001 | 0.77 | — | — | |
| SCHEMBL338657 | 0.75 | — | — | |
| SCHEMBL6545068 | 0.71 | — | — | |
| SCHEMBL9120448 | 0.71 | DGAT1 (0.50) | — | |
| SCHEMBL7053116 | 0.71 | — | — | |
| SCHEMBL28941979 | 0.71 | — | — | |
| SCHEMBL6247891 | 0.69 | — | — | |
| SCHEMBL7982773 | 0.69 | — | — | |
| SCHEMBL7059566 | 0.69 | CYP4F2 (0.33) | — | |
| Ammonia Solution, Strong SCHEMBL28824831 | 0.69 | DGAT1 (0.48) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8148446-B2 | Silyl esters, their use in binder systems and paint compositions and a process of production thereof | SIGMAKALON B.V. (NL) | 2012-04-03 | — | — | US | claimed |
| US-20100249298-A1 | Silyl esters, their use in binder systems and paint compositions and a process of production thereof | GILLARD MICHEL | 2010-09-30 | — | — | US | claimed |
| EP-1620514-A2 | SILYL ESTERS, THEIR USE IN BINDER SYSTEMS AND PAINT COMPOSITIONS AND A PROCESS OF PRODUCTION THEREOF | SigmaKalon B.V. (NL) | 2006-02-01 | — | — | EP | claimed |
| WO-2004099326-A2 | SILYL ESTERS, THEIR USE IN BINDER SYSTEMS AND PAINT COMPOSITIONS AND A PROCESS OF PRODUCTION THEREOF | SIGMAKALON B.V. (NL) | 2004-11-18 | — | — | WO | claimed |
| US-8148446-B2 | Silyl esters, their use in binder systems and paint compositions and a process of production thereof | SIGMAKALON B.V. (NL) | 2012-04-03 | — | — | US | disclosed |
| US-8124239-B2 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100249298-A1 | Silyl esters, their use in binder systems and paint compositions and a process of production thereof | GILLARD MICHEL | 2010-09-30 | — | — | US | disclosed |
| US-20100155121-A1 | SILICA FILM FORMING MATERIAL, SILICA FILM AND METHOD OF MANUFACTURING THE SAME, MULTILAYER WIRING STRUCTURE AND METHOD OF MANUFACTURING THE SAME, AND SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING THE SAME | FUJITSU LIMITED (JP) | 2010-06-24 | — | — | US | disclosed |
| US-7659357-B2 | Precursor organosilicon polymer of 1,2-Bis(dimethylethoxysilyl)ethane, 1,4-bis(dimethylethoxysilyl)benzene, tetraethoxysilane, methyltriethoxysilane, phenyltriethoxysilane; dielectric (DE) films having etching/chemical/moisture resistance; adhesion; low DE constant; minimal wiring delay; high speed | FUJITSU LIMITED (JP) | 2010-02-09 | — | — | US | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| EP-1620514-A2 | SILYL ESTERS, THEIR USE IN BINDER SYSTEMS AND PAINT COMPOSITIONS AND A PROCESS OF PRODUCTION THEREOF | SigmaKalon B.V. (NL) | 2006-02-01 | — | — | EP | disclosed |
| WO-2004099326-A2 | SILYL ESTERS, THEIR USE IN BINDER SYSTEMS AND PAINT COMPOSITIONS AND A PROCESS OF PRODUCTION THEREOF | SIGMAKALON B.V. (NL) | 2004-11-18 | — | — | WO | disclosed |