SCHEMBL7079093

SCHEMBL7079093

C=Cc1ccc(OC(=O)C(C)C)cc1

nearest known ligand 0.59

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 2/20 0.59
TAS1R3 Q7RTX0 2/20 0.42
TAS1R1 Q7RTX1 2/20 0.42
LMNA P02545 2/20 0.42
KDM4E B2RXH2 1/20 0.42
MEN1 O00255 1/20 0.42
TTR P02766 1/20 0.42
TP53 P04637 1/20 0.42
CYP3A4 P08684 1/20 0.42
MAPT P10636 1/20 0.42
KMT2A Q03164 1/20 0.42
SMN1; SMN2 Q16637 1/20 0.42
MIF P14174 1/20 0.41
ALDH1A1 P00352 1/20 0.41
THRB P10828 1/20 0.38
FGFR1 P11362 1/20 0.38
TDP1 Q9NUW8 1/20 0.37
CA2 P00918 1/20 0.37
HIF1A Q16665 1/20 0.37
EPAS1 Q99814 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL10204666 0.89 ELANE (0.46) ELANETAS1R3TAS1R1LMNAKDM4E
SCHEMBL18892952 0.86 ELANE (0.43) ELANETAS1R3TAS1R1LMNAKDM4E
SCHEMBL11810240 0.86 ELANE (0.43) ELANETAS1R3TAS1R1LMNAKDM4E
SCHEMBL21534572 0.86 ELANE (0.43) ELANETAS1R3TAS1R1LMNAKDM4E
SCHEMBL21884807 0.85 ELANE (0.47) ELANELMNAKDM4EMEN1TTR
SCHEMBL21795326 0.84 ELANE (0.79) ELANELMNAMEN1MAPTKMT2A
SCHEMBL1665627 0.83 ELANE (0.61) ELANELMNAKDM4EMEN1TTR
SCHEMBL12624377 0.83 TAS1R3 (0.42) ELANETAS1R3TAS1R1LMNAKDM4E
SCHEMBL72231 0.82 MAPT (0.59) ELANELMNAKDM4EMEN1TTR
Bromide SCHEMBL31143723 0.81 MAPT (0.58) ELANELMNAKDM4EMEN1TTR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0949540-B1 Method for producing lithographic printing plate suitable for laser scan exposure, and photopolymerizable composition FUJIFILM CORP (JP) 2012-05-02 EP disclosed
EP-0780732-B1 Polymer composition and resist material WAKO PURE CHEM IND LTD (JP) 2003-07-09 EP disclosed
US-6303264-B1 PROFILE OF PATTERN OF QUARTER MICRON ORDER WITHOUT CAUSING FOOTING, WHILE RETAINING HIGH RESOLUTION ABILITY AND HIGH SENSITIVITY WAKO PURE CHEMICAL INDUSTRIES, LTD (JP) 2001-10-16 US disclosed
US-5976759-A ALKALI SOLUBLE BY HEATING WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) 1999-11-02 US disclosed
EP-0875787-A1 Method for reducing the substrate dependence of resist Wako Pure Chemical Industries, Ltd. (JP) 1998-11-04 EP disclosed
EP-0780732-A2 Polymer composition and resist material WAKO PURE CHEMICAL INDUSTRIES LTD (JP) 1997-06-25 EP disclosed