SCHEMBL7080175

SCHEMBL7080175

Nc1ccc(C(F)(F)C(F)(F)C(F)(F)C(F)(F)c2ccc(N)cc2)cc1

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KIF11 P52732 3/20 0.54
MAPT P10636 2/20 0.44
MEN1 O00255 1/20 0.44
KMT2A Q03164 1/20 0.44
ALDH1A1 P00352 5/20 0.42
TDP1 Q9NUW8 2/20 0.42
KDM4E B2RXH2 1/20 0.42
MAOB P27338 2/20 0.39
PTGS1 P23219 3/20 0.38
CYP3A4 P08684 2/20 0.38
TP53 P04637 1/20 0.38
MAPK1 P28482 3/20 0.38
NPC1 O15118 1/20 0.38
HPGD P15428 1/20 0.38
RAB9A P51151 1/20 0.38
TSHR P16473 2/20 0.36
GLA P06280 1/20 0.36
POLB P06746 1/20 0.36
GAA P10253 1/20 0.36
ALOX15 P16050 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7076981 0.97 KIF11 (0.52) KIF11MAPTMEN1KMT2AALDH1A1
SCHEMBL17817842 0.97 KIF11 (0.52) KIF11MAPTMEN1KMT2AALDH1A1
SCHEMBL7078537 0.97 KIF11 (0.52) KIF11MAPTMEN1KMT2AALDH1A1
SCHEMBL7072713 0.94 KIF11 (0.54) KIF11MAPTMEN1KMT2AALDH1A1
SCHEMBL447473 0.93 KIF11 (0.48) KIF11MAPTMEN1KMT2AALDH1A1
SCHEMBL3871917 0.91 KIF11 (0.46) KIF11MAPTMEN1KMT2AALDH1A1
SCHEMBL486692 0.91 KIF11 (0.46) KIF11MAPTMEN1KMT2AALDH1A1
SCHEMBL30891615 0.91 KIF11 (0.46) KIF11MAPTMEN1KMT2AALDH1A1
SCHEMBL8176042 0.90 KIF11 (0.50) KIF11MAPTMEN1KMT2AALDH1A1
SCHEMBL8733113 0.88 KIF11 (0.59) KIF11MAPTMEN1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 261 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-5399655-A Acid-labile poly(amic acetal ester) E. I. DU PONT DE NEMOURS AND COMPANY (US) 1995-03-21 US claimed
US-20260147277-A1 TRANSFER FILM, PATTERN FORMING METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE FUJIFILM CORPORATION (JP) 2026-05-28 US disclosed
CN-122074126-A Photosensitive composition, transfer film, method for producing laminate, and semiconductor package 富士胶片株式会社 2026-05-22 CN disclosed
EP-3893054-B1 PATTERN FORMING METHOD, PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, AND DEVICE FUJIFILM CORP (JP) 2026-05-06 EP disclosed
EP-3633455-B1 PHOTOSENSITIVE RESIN COMPOSITION, POLYMERIC PRECURSOR, CURED FILM, LAMINATE, CURED FILM PRODUCTION METHOD, AND SEMICONDUCTOR DEVICE FUJIFILM CORP (JP) 2026-04-08 EP disclosed
EP-3859447-B1 PHOTOSENSITIVE RESIN COMPOSITION, CURED FILM, LAMINATE, METHOD FOR PRODUCING CURED FILM, AND SEMICONDUCTOR DEVICE FUJIFILM CORP (JP) 2025-11-19 EP disclosed
US-12473403-B2 Curable resin composition, cured film, laminate, method for manufacturing cured film, semiconductor device, and polymer precursor FUJIFILM CORPORATION (JP) 2025-11-18 US disclosed
US-12422750-B2 Method of manufacturing cured film, photocurable resin composition, method of manufacturing laminate, and method of manufacturing semiconductor device FUJIFILM CORPORATION (JP) 2025-09-23 US disclosed
US-20250264801-A1 RESIN COMPOSITION, CURED SUBSTANCE, LAMINATE, MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE, AND SEMICONDUCTOR DEVICE FUJIFILM CORPORATION (JP) 2025-08-21 US disclosed
US-12393116-B2 Pattern forming method, photosensitive resin composition, cured film, laminate, and device FUJIFILM CORPORATION (JP) 2025-08-19 US disclosed
US-5516875-A POLYAMIDES ESTERIFIED WITH VINYL ETHERS, PHOTOACID CATALYZED CLEAVAGE OF THE ACID LABILE ESTERS, IMIDATION E. I. DU PONT DE NEMOURS AND COMPANY (US) 1996-05-14 US disclosed
EP-0601063-B1 FLUORINE-CONTAINING DIAMINES, POLYAMIDES, AND POLYIMIDES DU PONT (US) 1995-10-18 EP disclosed
US-5399655-A Acid-labile poly(amic acetal ester) E. I. DU PONT DE NEMOURS AND COMPANY (US) 1995-03-21 US disclosed
US-5399460-A Aminoacrylated polyimide E. I. DU PONT DE NEMOURS AND COMPANY (US) 1995-03-21 US disclosed
WO-1995004305-A1 PHOTOSENSITIVE FLUORINATED POLY(AMIC ACID) AMINOACRYLATE SALT E.I. DU PONT DE NEMOURS AND COMPANY (US) 1995-02-09 WO disclosed
EP-0624826-A1 Method of forming relief patterns by i-line light irradiation OCG Microelectronic Materials Inc. (US) 1994-11-17 EP disclosed
US-5322917-A Fluorine-containing diamines polyamides, and polyimides E. I. DU PONT DE NEMOURS AND COMPANY (US) 1994-06-21 US disclosed
US-5302489-A Patterning a photoresist E. I. DU PONT DE NEMOURS AND COMPANY (US) 1994-04-12 US disclosed
US-5286841-A Fluorine-containing diamines, polyamides, and polyimides E. I. DU PONT DE NEMOURS AND COMPANY (US) 1994-02-15 US disclosed
US-5175367-A Fluorine-containing diamines, polyamides, and polyimides E. I. DU PONT DE NEMOURS AND COMPANY (US) 1992-12-29 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20260147277-A1 TRANSFER FILM, PATTERN FORMING METHOD, LAMINATE, AND SEMICONDUCTOR PACKAGE LCP1, PCNA, FDFT1 KIF11 3873/4885MAPT 1037/4885MEN1 3594/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.