Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACE2 | Q9BYF1 | 1/20 | 0.55 |
| ▸ | GPR84 | Q9NQS5 | 7/20 | 0.47 |
| ▸ | CA1 | P00915 | 2/20 | 0.45 |
| ▸ | SPHK1 | Q9NYA1 | 1/20 | 0.45 |
| ▸ | FFAR1 | O14842 | 1/20 | 0.45 |
| ▸ | EPHX1 | P07099 | 1/20 | 0.44 |
| ▸ | MAPT | P10636 | 1/20 | 0.44 |
| ▸ | TP53 | P04637 | 1/20 | 0.44 |
| ▸ | LCK | P06239 | 1/20 | 0.44 |
| ▸ | PPARD | Q03181 | 1/20 | 0.44 |
| ▸ | ZDHHC20 | Q5W0Z9 | 1/20 | 0.44 |
| ▸ | ZDHHC2 | Q9UIJ5 | 1/20 | 0.44 |
| ▸ | OPRM1 | P35372 | 1/20 | 0.43 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL28780138 | 1.00 | ACE2 (0.55) | ACE2GPR84CA1SPHK1FFAR1 | |
| SCHEMBL10058334 | 1.00 | ACE2 (0.55) | ACE2GPR84CA1SPHK1FFAR1 | |
| SCHEMBL24608129 | 1.00 | ACE2 (0.55) | ACE2GPR84CA1SPHK1FFAR1 | |
| SCHEMBL9327533 | 1.00 | ACE2 (0.55) | ACE2GPR84CA1SPHK1FFAR1 | |
| Hydrochloric Acid SCHEMBL30018030 | 0.98 | ACE2 (0.53) | ACE2GPR84CA1SPHK1FFAR1 | |
| SCHEMBL2600466 | 0.98 | ACE2 (0.52) | ACE2GPR84CA1SPHK1FFAR1 | |
| Hydrochloric Acid SCHEMBL27371796 | 0.96 | ACE2 (0.50) | ACE2GPR84CA1SPHK1FFAR1 | |
| SCHEMBL31278193 | 0.91 | CA2 (0.48) | ACE2GPR84CA1EPHX1TP53 | |
| SCHEMBL13038451 | 0.91 | CA2 (0.48) | ACE2GPR84CA1EPHX1TP53 | |
| Hydrochloric Acid SCHEMBL27418380 | 0.89 | CA2 (0.47) | ACE2GPR84CA1EPHX1TP53 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10429735-B2 | Coating agent for reducing roughness of resist pattern, and method for forming resist pattern in which roughness is reduced | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-10-01 | — | — | US | disclosed |
| US-10254651-B2 | Coating agent for reducing roughness of resist pattern, and method for forming resist pattern in which roughness is reduced | TOKYO OHKA KOGYO CO., LTD. (JP) | 2019-04-09 | — | — | US | disclosed |
| US-20180102246-A1 | COATING AGENT FOR REDUCING ROUGHNESS OF RESIST PATTERN, AND METHOD FOR FORMING RESIST PATTERN IN WHICH ROUGHNESS IS REDUCED | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-04-12 | — | — | US | disclosed |
| US-20180101098-A1 | COATING AGENT FOR REDUCING ROUGHNESS OF RESIST PATTERN, AND METHOD FOR FORMING RESIST PATTERN IN WHICH ROUGHNESS IS REDUCED | TOKYO OHKA KOGYO CO., LTD. (JP) | 2018-04-12 | — | — | US | disclosed |
| US-9417532-B2 | Coating agent for forming fine pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2016-08-16 | — | — | US | disclosed |
| US-20150277228-A1 | COATING AGENT FOR FORMING FINE PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-10-01 | — | — | US | disclosed |
| US-9063430-B2 | Coating agent for forming fine pattern | TOKYO OHKA KOGYO CO., LTD. (JP) | 2015-06-23 | — | — | US | disclosed |
| US-8124312-B2 | Method for forming pattern, and material for forming coating film | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20100255429-A1 | FINE PATTERN FORMING METHOD AND COAT FILM FORMING MATERIAL | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-10-07 | — | — | US | disclosed |
| US-20100090372-A1 | COATING FORMATION AGENT FOR PATTERN MICRO-FABRICATION, AND MICROPATTERN FORMATION METHOD USING THE SAME | TOKYO OHKA KOGYO CO., LTD. | 2010-04-15 | — | — | US | disclosed |
| US-20100035177-A1 | METHOD FOR FORMING PATTERN, AND MATERIAL FOR FORMING COATING FILM | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-02-11 | — | — | US | disclosed |