SCHEMBL7086956

SCHEMBL7086956

CC(C)C(O)(O)[C](O)O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL263616 0.74
SCHEMBL20266460 0.72
SCHEMBL8031153 0.70
SCHEMBL29388 0.67
Methyl Alcohol SCHEMBL11342151 0.67
SCHEMBL1987869 0.64
Hydrogen Peroxide SCHEMBL10659944 0.64
SCHEMBL1990460 0.64
SCHEMBL1994851 0.64
SCHEMBL1317473 0.64 ALDH1A1 (1.00)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20030129535-A1 Photosensitive thermosetting resin composition NAN YA PLASTICS CORPORATION (TW) 2003-07-10 US claimed
CN-109370308-B Carbon ink 常州博疆新材料科技有限公司 2021-10-15 CN disclosed
US-20030129535-A1 Photosensitive thermosetting resin composition NAN YA PLASTICS CORPORATION (TW) 2003-07-10 US disclosed