⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL706242 | 0.97 | — | — | |
| SCHEMBL704851 | 0.92 | — | — | |
| SCHEMBL703869 | 0.92 | — | — | |
| SCHEMBL4270164 | 0.89 | — | — | |
| SCHEMBL4275389 | 0.89 | — | — | |
| SCHEMBL705685 | 0.89 | — | — | |
| SCHEMBL4082797 | 0.85 | — | — | |
| SCHEMBL4074037 | 0.85 | — | — | |
| SCHEMBL4074351 | 0.85 | — | — | |
| SCHEMBL704902 | 0.83 | LMNA (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 31 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119998691-A | Antireflection film, liquid composition set, and method for producing antireflection film | 日本板硝子株式会社 | 2025-05-13 | — | — | CN | disclosed |
| WO-2024080149-A1 | ANTI-REFLECTION FILM, LIQUID COMPOSITION, LIQUID COMPOSITION GROUP, AND METHOD FOR MANUFACTURING ANTI-REFLECTION FILM | 日本板硝子株式会社 | 2024-04-18 | — | — | WO | disclosed |
| CN-109641835-B | Method for producing carbamate | 国立研究开发法人产业技术综合研究所 | 2021-07-20 | — | — | CN | disclosed |
| EP-3508473-B1 | METHOD FOR PRODUCING CARBAMIC ACID ESTER | AIST (JP) | 2021-05-26 | — | — | EP | disclosed |
| US-10752579-B2 | Production method of carbamic acid ester | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2020-08-25 | — | — | US | disclosed |
| EP-3508473-A1 | METHOD FOR PRODUCING CARBAMIC ACID ESTER | National Institute of Advanced Industrial Science and Technology (JP) | 2019-07-10 | — | — | EP | disclosed |
| US-20190185420-A1 | PRODUCTION METHOD OF CARBAMIC ACID ESTER | NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY (JP) | 2019-06-20 | — | — | US | disclosed |
| US-20160027946-A1 | OPTICAL DEVICE | JSR CORPORATION (JP) | 2016-01-28 | — | — | US | disclosed |
| US-8968458-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2015-03-03 | — | — | US | disclosed |
| US-8808446-B2 | Composition for resist underlayer film and process for producing same | JSR CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| CN-100535054-C | Silica film forming material, silica film and preparation method thereof | FUJITSU LTD (JP) | 2009-09-02 | — | — | CN | disclosed |
| US-20090050020-A1 | COMPOSITION FOR RESIST UNDERLAYER FILM AND PROCESS FOR PRODUCING SAME | JSR CORPORATION (JP) | 2009-02-26 | — | — | US | disclosed |
| US-20080290521-A1 | FILM-FORMING COMPOSITION, INSULATING FILM WITH LOW DIELECTRIC CONSTANT, FORMATION METHOD THEREOF, AND SEMICONDUCTOR DEVICE | SHIN ETSU CHEMICAL CO., LTD. | 2008-11-27 | — | — | US | disclosed |
| US-20080292863-A1 | SILOXANE POLYMER, PREPARATION METHOD THEREOF, POROUS-FILM FORMING COATING SOLUTION CONTAINING THE POLYMER, POROUS FILM, AND SEMICONDUCTOR DEVICE USING THE POROUS FILM | SHIN ETSU CHEMICAL CO., LTD. | 2008-11-27 | — | — | US | disclosed |
| EP-1855159-A1 | COMPOSITION FOR UNDERLAYER FILM OF RESIST AND PROCESS FOR PRODUCING THE SAME | JSR Corporation (JP) | 2007-11-14 | — | — | EP | disclosed |
| US-20070026689-A1 | Silica film forming material, silica film and method of manufacturing the same, multilayer wiring structure and method of manufacturing the same, and semiconductor device and method of manufacturing the same | FUJITSU LIMITED (JP) | 2007-02-01 | — | — | US | disclosed |
| CN-1891757-A | Silica film forming material, silica film and method of manufacturing the same | FUJITSU LTD (JP) | 2007-01-10 | — | — | CN | disclosed |
| US-20060269724-A1 | Comprising silica particles and at least one binder compound; good mechanical strength and abrasion resistance | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2006-11-30 | — | — | US | disclosed |
| US-20050118742-A1 | Method for reducing the adhesive properties of MEMS and anti-adhesion-coated device | ROBERT BOSCH GMBH (DE) | 2005-06-02 | — | — | US | disclosed |
| US-20040077757-A1 | Coating composition for use in producing an insulating thin film | ASAHI KASEI KABUSHIKI KAISHA (JP) | 2004-04-22 | — | — | US | disclosed |