Predicted protein targets (top 14)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MAPK1 | P28482 | 4/20 | 0.49 |
| ▸ | POLB | P06746 | 1/20 | 0.49 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.48 |
| ▸ | KDM4E | B2RXH2 | 4/20 | 0.46 |
| ▸ | ALDH1A1 | P00352 | 4/20 | 0.46 |
| ▸ | HPGD | P15428 | 2/20 | 0.46 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.46 |
| ▸ | CYP1A2 | P05177 | 2/20 | 0.45 |
| ▸ | CYP2C19 | P33261 | 2/20 | 0.45 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.45 |
| ▸ | TSHR | P16473 | 2/20 | 0.42 |
| ▸ | GAA | P10253 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.39 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.39 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL19012506 | 1.00 | MAPK1 (0.49) | MAPK1POLBSMN1; SMN2KDM4EALDH1A1 | |
| Methacrylic Acid SCHEMBL17062929 | 0.95 | MAPK1 (0.46) | MAPK1POLBSMN1; SMN2KDM4EALDH1A1 | |
| SCHEMBL1899739 | 0.90 | MAPK1 (0.41) | MAPK1POLBSMN1; SMN2KDM4EALDH1A1 | |
| SCHEMBL12603695 | 0.87 | MAPK1 (0.50) | MAPK1POLBSMN1; SMN2KDM4EALDH1A1 | |
| SCHEMBL14523973 | 0.86 | POLB (0.46) | MAPK1POLBSMN1; SMN2KDM4EALDH1A1 | |
| SCHEMBL17247224 | 0.85 | ALDH1A1 (0.44) | MAPK1POLBSMN1; SMN2KDM4EALDH1A1 | |
| SCHEMBL27047573 | 0.84 | POLB (0.44) | MAPK1POLBSMN1; SMN2KDM4EALDH1A1 | |
| SCHEMBL13496319 | 0.84 | MAPK1 (0.48) | MAPK1POLBSMN1; SMN2KDM4EALDH1A1 | |
| SCHEMBL15085763 | 0.84 | MAPK1 (0.36) | MAPK1POLBSMN1; SMN2KDM4EALDH1A1 | |
| SCHEMBL12123895 | 0.84 | KDM4E (0.43) | MAPK1POLBSMN1; SMN2KDM4EALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 3846 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119020011-B | Multi-crosslinking-point drag reducer, viscosity-variable fracturing fluid and preparation method thereof | 四川兰冠能源科技有限公司 | 2025-02-18 | — | — | CN | claimed |
| CN-119020011-A | Multi-crosslinking-point drag reducer, viscosity-variable fracturing fluid and preparation method thereof | 四川兰冠能源科技有限公司 | 2024-11-26 | — | — | CN | claimed |
| CN-117003698-A | Polymerizable oxime sulfonate photoinduced acid generator, photoresist resin and preparation method thereof | 上海大学 | 2023-11-07 | — | — | CN | claimed |
| CN-108572516-B | Positive photosensitive resin composition, display device and pattern forming method thereof | 株式会社东进世美肯 | 2023-10-17 | — | — | CN | claimed |
| CN-113388075-B | Composition for 3D printing, 3D printing method and device | 珠海赛纳三维科技有限公司 | 2023-03-24 | — | — | CN | claimed |
| CN-113548988-A | Fluorine-containing photoacid generator, and preparation method and application thereof | 安徽庆润新材料技术有限公司 | 2021-10-26 | — | — | CN | claimed |
| EP-3456785-B1 | COMPOSITION FOR ORGANIC ELECTRONIC DEVICE ENCAPSULANT AND ENCAPSULANT FORMED USING SAME | MOMENTIVE PERFORMANCE MAT KOREA CO LTD (KR) | 2021-10-20 | — | — | EP | claimed |
| CN-111123644-A | Photosensitive resin composition, display, and method for forming pattern of display | 株式会社东进世美肯 | 2020-05-08 | — | — | CN | claimed |
| US-10618997-B2 | Composition for organic electronic device encapsulant and encapsulant formed using same | MOMENTIVE PERFORMANCE MATERIALS KOREA CO., LTD. (KR) | 2020-04-14 | — | — | US | claimed |
| US-9840568-B2 | Polymer and method for producing same | MITSUBISHI CHEMICAL CORPORATION (JP) | 2017-12-12 | — | — | US | claimed |
| US-6406830-B2 | BIS(SULFONIUM METHYL)KETONE BISPERFLUOROALKANESULFONATE ACID GENERATOR WITH TRIPHENYLSULFONIUM OR DIPHENYLIODONIUM SALTS, AND A RESIN HAVING A UNIT UNSTABLE TO AN ACID, SUCH AS 2-ALKYL-2-ADAMANTYL (METH)ACRYLATE; RESOLUTION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-06-18 | — | — | US | claimed |
| US-6383713-B1 | ADAMANTYL ACRYLATE POLYMERS AND ACID GENERATORS | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-05-07 | — | — | US | claimed |
| US-6348297-B1 | COMPOSITION COMPRISING ACID GENERATOR COMPRISING ALIPHATIC SULFONIUM SALT, TRIPHENYLSULFONIUM OR DIPHENYLIODONIUM SALT,RESIN HAVING ACID-LABILE GROUP WHICH IS INSOLUBLE IN ALKALI BUT BECOMES SOLUBLE BY ACTION OF ACID | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-02-19 | — | — | US | claimed |
| US-20020006582-A1 | Chemical amplification type positive resist compositions and sulfonium salts | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2002-01-17 | — | — | US | claimed |
| EP-1154321-A1 | Chemical amplification type positive resist compositions and sulfonium salts | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2001-11-14 | — | — | EP | claimed |
| US-6239231-B1 | HAS THE POLYMERIZATION UNIT OF 2-ALKYL-2-ADAMANTYL (METH)ACRYLATE AND ONE OR BOTH OF THE POLYMERIZATION UNIT OF 3-HYDROXY-1-ADAMANTYL (METH)ACRYLATE OR (METH)ACRYLONITRILE; ACID GENERATOR; SEMICONDUCTORS | SUMITOMO CHEMICAL, COMPANY LIMITED (JP) | 2001-05-29 | — | — | US | claimed |
| EP-1055654-A1 | PROCESS FOR THE PREPARATION OF ORGANIC COMPOUNDS WITH IMIDE CATALYSTS | Daicel Chemical Industries, Ltd. (JP) | 2000-11-29 | — | — | EP | claimed |
| EP-1041442-A1 | Chemical amplification type positive resist | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-10-04 | — | — | EP | claimed |
| EP-1020767-A1 | Chemical amplification type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-07-19 | — | — | EP | claimed |
| EP-0982628-A2 | A chemical amplifying type positive resist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2000-03-01 | — | — | EP | claimed |