⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Fluoride SCHEMBL7929005 | 0.89 | — | — | |
| Fluoride SCHEMBL3988557 | 0.87 | — | — | |
| Fluoride SCHEMBL11299248 | 0.87 | — | — | |
| SCHEMBL5412286 | 0.87 | — | — | |
| Fluoride SCHEMBL10595307 | 0.87 | — | — | |
| Fluoride SCHEMBL4271644 | 0.87 | — | — | |
| SCHEMBL895890 | 0.87 | — | — | |
| Fluoride SCHEMBL11569618 | 0.87 | — | — | |
| SCHEMBL10890316 | 0.87 | — | — | |
| SCHEMBL11576845 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20030209805-A1 | Dielectric film; vapor deposition of silicon fluoride with oxygen and nitrogen | CHOI CHI-HING (US) | 2003-11-13 | — | — | US | claimed |
| WO-2001041203-A1 | IMPROVED FLOURINE DOPED SIO2 FILM | INTEL CORPORATION (US) | 2001-06-07 | — | — | WO | claimed |