Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 4/20 | 0.71 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.71 |
| ▸ | CDC25B | P30305 | 1/20 | 0.71 |
| ▸ | MAOA | P21397 | 6/20 | 0.58 |
| ▸ | MAPT | P10636 | 4/20 | 0.58 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.58 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.58 |
| ▸ | APAF1 | O14727 | 2/20 | 0.58 |
| ▸ | TDP2 | O95551 | 2/20 | 0.58 |
| ▸ | RECQL | P46063 | 2/20 | 0.58 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.58 |
| ▸ | S100A4 | P26447 | 2/20 | 0.58 |
| ▸ | CES2 | O00748 | 1/20 | 0.58 |
| ▸ | TERT | O14746 | 1/20 | 0.58 |
| ▸ | NPC1 | O15118 | 1/20 | 0.58 |
| ▸ | PLIN1 | O60240 | 1/20 | 0.58 |
| ▸ | S1PR4 | O95977 | 1/20 | 0.58 |
| ▸ | LMNA | P02545 | 1/20 | 0.58 |
| ▸ | PLA2G1B | P04054 | 1/20 | 0.58 |
| ▸ | BCHE | P06276 | 1/20 | 0.58 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Anthraquinone SCHEMBL11041458 | 0.92 | MEN1 (0.67) | MEN1KMT2ACDC25BMAOAMAPT | |
| Anthraquinone SCHEMBL9879416 | 0.85 | KMT2A (0.57) | MEN1KMT2ACDC25BMAOAMAPT | |
| Anthraquinone SCHEMBL183074 | 0.84 | MEN1 (0.86) | MEN1KMT2ACDC25BMAOAMAPT | |
| Anthraquinone SCHEMBL1901249 | 0.84 | MEN1 (1.00) | MEN1KMT2ACDC25BMAOAMAPT | |
| Anthraquinone SCHEMBL29358690 | 0.84 | MEN1 (1.00) | MEN1KMT2ACDC25BMAOAMAPT | |
| Anthraquinone SCHEMBL14943 | 0.84 | MEN1 (1.00) | MEN1KMT2ACDC25BMAOAMAPT | |
| Anthraquinone SCHEMBL11698233 | 0.82 | MEN1 (0.71) | MEN1KMT2ACDC25BMAOAMAPT | |
| Anthraquinone SCHEMBL28037980 | 0.81 | MEN1 (0.80) | MEN1KMT2ACDC25BMAOAMAPT | |
| Anthraquinone SCHEMBL27774426 | 0.81 | CDC25B (0.80) | MEN1KMT2ACDC25BMAOAMAPT | |
| Anthraquinone SCHEMBL11302120 | 0.81 | CDC25B (0.80) | MEN1KMT2ACDC25BMAOAMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-116194842-A | Negative photoresist composition for I-line for improving step difference and LER between center and edge, and negative photoresist composition for I-line for improving process margin | 荣昌化学制品株式会社 | 2023-05-30 | — | — | CN | disclosed |
| CN-107850841-B | Negative photoresist composition for KrF laser for forming semiconductor pattern | 荣昌化学制品株式会社 | 2021-04-02 | — | — | CN | disclosed |
| CN-107924124-B | Negative photoresist composition for I-line with excellent etching resistance | 荣昌化学制品株式会社 | 2020-12-15 | — | — | CN | disclosed |
| US-10162261-B2 | Negative photoresist composition for KrF laser for forming semiconductor patterns | YOUNG CHANG CHEMICAL CO., LTD (KR) | 2018-12-25 | — | — | US | disclosed |
| US-20180246404-A1 | I-LINE NEGATIVE TYPE PHOTORESIST COMPOSITION HAVING EXCELLENT ETCHING RESISTANCE | YCCHEM CO., LTD. (KR) | 2018-08-30 | — | — | US | disclosed |
| US-20180203351-A1 | NEGATIVE PHOTORESIST COMPOSITION FOR KRF LASER FOR FORMING SEMICONDUCTOR PATTERNS | YCCHEM CO., LTD. (KR) | 2018-07-19 | — | — | US | disclosed |
| CN-107924124-A | Negative photoresist composition for I-line with excellent etching resistance | 荣昌化学制品株式会社 | 2018-04-17 | — | — | CN | disclosed |
| CN-107850841-A | Negative photoresist composition for KrF laser for forming semiconductor pattern | 荣昌化学制品株式会社 | 2018-03-27 | — | — | CN | disclosed |
| EP-0763580-B1 | Aqueous type pigment dispersing agent, composition containing the same and aqueous pigment dispersion | TOYO INK MFG CO (JP) | 2003-08-13 | — | — | EP | disclosed |
| US-5854323-A | Pigment dispersing agent, composition containing the same, and aqueous pigment dispersion | TOYO INK MANUFACTURING CO., LTD. (JP) | 1998-12-29 | — | — | US | disclosed |
| EP-0763580-A2 | Aqueous type pigment dispersing agent, composition containing the same and aqueous pigment dispersion | TOYO INK MANUFACTURING CO., LTD. (JP) | 1997-03-19 | — | — | EP | disclosed |