Predicted protein targets (top 10)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | NOS3 | P29474 | 1/20 | 0.40 |
| ▸ | NOS1 | P29475 | 1/20 | 0.40 |
| ▸ | NOS2 | P35228 | 1/20 | 0.40 |
| ▸ | HTR1D | P28221 | 1/20 | 0.36 |
| ▸ | HTR1B | P28222 | 1/20 | 0.36 |
| ▸ | NISCH | Q9Y2I1 | 3/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 1/20 | 0.33 |
| ▸ | TOP2A | P11388 | 1/20 | 0.30 |
| ▸ | TOP2B | Q02880 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL709291 | 1.00 | NOS3 (0.40) | NOS3NOS1NOS2HTR1DHTR1B | |
| Hydrochloric Acid SCHEMBL3032314 | 0.98 | NOS3 (0.39) | NOS3NOS1NOS2HTR1DHTR1B | |
| Hydrochloric Acid SCHEMBL226047 | 0.98 | NOS3 (0.39) | NOS3NOS1NOS2HTR1DHTR1B | |
| Hydrochloric Acid SCHEMBL5186472 | 0.98 | NOS3 (0.39) | NOS3NOS1NOS2HTR1DHTR1B | |
| Hydrochloric Acid SCHEMBL226046 | 0.98 | NOS3 (0.39) | NOS3NOS1NOS2HTR1DHTR1B | |
| SCHEMBL25827493 | 0.96 | NOS3 (0.38) | NOS3NOS1NOS2HTR1DHTR1B | |
| SCHEMBL5164534 | 0.94 | NISCH (0.37) | NOS3NOS1NOS2HTR1DHTR1B | |
| SCHEMBL5164536 | 0.94 | NISCH (0.37) | NOS3NOS1NOS2HTR1DHTR1B | |
| Hydrochloric Acid SCHEMBL234486 | 0.92 | NISCH (0.36) | NOS3NOS1NOS2HTR1DHTR1B | |
| SCHEMBL11316440 | 0.92 | NISCH (0.36) | NOS3NOS1NOS2HTR1DHTR1B |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 125 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3569634-B1 | CURABLE UNSATURATED CRYSTALLINE POLYESTER POWDER AND METHODS OF MAKING THE SAME | XEROX CORP (US) | 2023-04-19 | — | — | EP | claimed |
| EP-2616473-B1 | MIXTURES CONTAINING PHOSPHOROUS, PROCEDURES FOR THEIR PRODUCTION AND USE | CLARIANT INT LTD (CH) | 2016-11-09 | — | — | EP | claimed |
| US-20250092281-A1 | AQUEOUS COATING COMPOSITION AND METHOD FOR PRODUCING AQUEOUS COATING COMPOSITION | NIPPON PAINT AUTOMOTIVE COATINGS CO., LTD. (JP) | 2025-03-20 | — | — | US | disclosed |
| US-20250043103-A1 | RESIN PARTICLE COMPOSITION, TEST KIT, AND MANUFACTURING METHOD OF RESIN PARTICLE COMPOSITION | SAIDEN CHEMICAL INDUSTRY CO., LTD. (JP) | 2025-02-06 | — | — | US | disclosed |
| EP-4501971-A1 | RESIN PARTICLE COMPOSITION, TEST KIT, AND MANUFACTURING METHOD OF RESIN PARTICLE COMPOSITION | Saiden Chemical Industry Co., Ltd. (JP) | 2025-02-05 | — | — | EP | disclosed |
| US-20230312970-A1 | AQUEOUS COATING COMPOSITION AND METHOD FOR PRODUCING AQUEOUS COATING COMPOSITION | NIPPON PAINT AUTOMOTIVE COATINGS CO., LTD. (JP) | 2023-10-05 | — | — | US | disclosed |
| EP-3816246-B1 | AQUEOUS COATING COMPOSITION AND METHOD FOR PRODUCING AQUEOUS COATING COMPOSITION | NIPPON PAINT AUTOMOTIVE COATINGS CO LTD (JP) | 2023-08-23 | — | — | EP | disclosed |
| US-20230174816-A1 | AQUEOUS COATING COMPOSITION AND MULTILAYERED COATING FILM FORMATION METHOD | NIPPON PAINT AUTOMOTIVE COATINGS CO., LTD. (JP) | 2023-06-08 | — | — | US | disclosed |
| EP-4122990-A1 | AQUEOUS COATING COMPOSITION AND MULTILAYERED COATING FILM FORMATION METHOD | Nippon Paint Automotive Coatings Co., Ltd. (JP) | 2023-01-25 | — | — | EP | disclosed |
| CN-115210327-A | Aqueous coating composition and method for forming multilayer coating film | 日涂汽车涂料有限公司 | 2022-10-18 | — | — | CN | disclosed |
| EP-3816246-A1 | AQUEOUS COATING COMPOSITION AND METHOD FOR PRODUCING AQUEOUS COATING COMPOSITION | Nippon Paint Automotive Coatings Co., Ltd. (JP) | 2021-05-05 | — | — | EP | disclosed |
| EP-0458298-A1 | Electrophotographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1991-11-27 | — | — | EP | disclosed |
| US-5041352-A | Dispersion stability, ink receptivity | FUJI PHOTO FILM CO., LTD. (JP) | 1991-08-20 | — | — | US | disclosed |
| EP-0416591-A2 | Electrophotographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1991-03-13 | — | — | EP | disclosed |
| EP-0410324-A2 | Electrophotographic light-sensitive material | FUJI PHOTO FILM CO., LTD (JP) | 1991-01-30 | — | — | EP | disclosed |
| US-4977055-A | RESIN DISPESEDIN NONAQUEOUS SOLVENT | FUJI PHOTO FILM CO., LTD. (JP) | 1990-12-11 | — | — | US | disclosed |
| EP-0399469-A1 | Electrophotographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1990-11-28 | — | — | EP | disclosed |
| US-4968576-A | POSITIVE CHARGING ABILITY, IMPROVED FLOWABILITY | NIPPON PAINT CO., LTD. (JP) | 1990-11-06 | — | — | US | disclosed |
| EP-0389928-A2 | Electrophotographic light-sensitive material | FUJI PHOTO FILM CO., LTD. (JP) | 1990-10-03 | — | — | EP | disclosed |
| US-4260713-A | AZOBIS/N,N*DIMETHYLENEISOBUTYLAMIDINE | WAKO PURE CHEMICAL INDUSTRIES, LTD. (JP) | 1981-04-07 | — | — | US | disclosed |