SCHEMBL710303

SCHEMBL710303

c1ccc([Si](c2ccccc2)(c2ccccc2)[Si](c2ccccc2)(c2ccccc2)[Si](c2ccccc2)(c2ccccc2)[Si](c2ccccc2)(c2ccccc2)[Si](c2ccccc2)(c2ccccc2)c2ccccc2)cc1

nearest known ligand 0.35

Predicted protein targets (top 7)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 2/20 0.35
TDP1 Q9NUW8 1/20 0.35
ESR1 P03372 1/20 0.33
ESR2 Q92731 1/20 0.33
NPC1 O15118 1/20 0.30
MAPK1 P28482 1/20 0.30
RAB9A P51151 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11026272 0.90 ESR1 (0.35) ALDH1A1TDP1ESR1ESR2NPC1
SCHEMBL14666555 0.82 ESR1 (0.37) ESR1ESR2
SCHEMBL242095 0.79 ALDH1A1 (0.40) ALDH1A1TDP1ESR1ESR2NPC1
SCHEMBL28499734 0.78 ESR1 (0.33) ESR1ESR2
SCHEMBL11025001 0.78 ESR1 (0.38) ESR1ESR2
SCHEMBL17510815 0.77
SCHEMBL29575759 0.76 ESR1 (0.32) ESR1ESR2
SCHEMBL30762339 0.76
SCHEMBL11227311 0.76
SCHEMBL18860255 0.75

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8603426-B1 Method of making a silicon-containing film KOVIO, INC. (US) 2013-12-10 US disclosed
US-8367031-B1 Silane compositions, methods of making the same, method for forming a semiconducting and/or silicon-containing film, and thin film structures formed therefrom KOVIO, INC. (US) 2013-02-05 US disclosed
US-8124040-B1 Methods of making silane compositions KOVIO, INC. (US) 2012-02-28 US disclosed
US-7799302-B1 Silane compositions, methods of making the same, method for forming a semiconducting and/or silicon-containing film, and thin film structures formed therefrom KOVIO, INC. (US) 2010-09-21 US disclosed
US-7498015-B1 Method of making silane compositions KOVIO, INC. (US) 2009-03-03 US disclosed