Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA12 | O43570 | 8/20 | 1.00 |
| ▸ | CA2 | P00918 | 7/20 | 1.00 |
| ▸ | CA9 | Q16790 | 6/20 | 1.00 |
| ▸ | KDM4E | B2RXH2 | 2/20 | 0.84 |
| ▸ | CA1 | P00915 | 1/20 | 0.54 |
| ▸ | SIRT2 | Q8IXJ6 | 1/20 | 0.53 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.47 |
| ▸ | GAA | P10253 | 2/20 | 0.47 |
| ▸ | MAPT | P10636 | 2/20 | 0.47 |
| ▸ | HPGD | P15428 | 2/20 | 0.47 |
| ▸ | POLB | P06746 | 1/20 | 0.47 |
| ▸ | THRB | P10828 | 1/20 | 0.47 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.47 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.47 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.47 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.47 |
| ▸ | CTRC | Q99895 | 1/20 | 0.47 |
| ▸ | DUSP3 | P51452 | 1/20 | 0.47 |
| ▸ | PTPN5 | P54829 | 1/20 | 0.47 |
| ▸ | PTPN11 | Q06124 | 1/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL1981346 | 1.00 | CA12 (1.00) | CA12CA2CA9KDM4ECA1 | |
| SCHEMBL13786954 | 1.00 | CA12 (1.00) | CA12CA2CA9KDM4ECA1 | |
| SCHEMBL4909683 | 1.00 | CA12 (1.00) | CA12CA2CA9KDM4ECA1 | |
| SCHEMBL710369 | 1.00 | CA12 (1.00) | CA12CA2CA9KDM4ECA1 | |
| SCHEMBL29386676 | 1.00 | CA12 (1.00) | CA12CA2CA9KDM4ECA1 | |
| SCHEMBL5373121 | 0.98 | CA12 (0.96) | CA12CA2CA9KDM4ECA1 | |
| SCHEMBL710363 | 0.96 | CA12 (1.00) | CA12CA2CA9KDM4ECA1 | |
| SCHEMBL29683674 | 0.96 | CA12 (1.00) | CA12CA2CA9KDM4ECA1 | |
| SCHEMBL710364 | 0.96 | CA12 (1.00) | CA12CA2CA9KDM4ECA1 | |
| SCHEMBL24435598 | 0.94 | CA12 (1.00) | CA12CA2CA9KDM4ECA1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3786233-B1 | RESIN COMPOSITION, LAMINATE, SEMICONDUCTOR WAFER WITH RESIN COMPOSITION LAYER, SUBSTRATE FOR MOUNTING SEMICONDUCTOR WITH RESIN COMPOSITION LAYER AND SEMICONDUCTOR DEVICE | MITSUBISHI GAS CHEMICAL CO (JP) | 2025-04-23 | — | — | EP | claimed |
| US-11924979-B2 | Resin composition, laminate, semiconductor wafer with resin composition layer, substrate for mounting semiconductor with resin composition layer and semiconductor device | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2024-03-05 | — | — | US | claimed |
| US-20210147680-A1 | RESIN COMPOSITION, LAMINATE, SEMICONDUCTOR WAFER WITH RESIN COMPOSITION LAYER, SUBSTRATE FOR MOUNTING SEMICONDUCTOR WITH RESIN COMPOSITION LAYER, AND SEMICONDUCTOR DEVICE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-05-20 | — | — | US | claimed |
| US-20210147629-A1 | RESIN COMPOSITION, LAMINATE, SEMICONDUCTOR WAFER WITH RESIN COMPOSITION LAYER, SUBSTRATE FOR MOUNTING SEMICONDUCTOR WITH RESIN COMPOSITION LAYER AND SEMICONDUCTOR DEVICE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-05-20 | — | — | US | claimed |
| EP-3790039-A1 | RESIN COMPOSITION, LAMINATE, SEMICONDUCTOR WAFER WITH RESIN COMPOSITION LAYER, SUBSTRATE FOR MOUNTING SEMICONDUCTOR WITH RESIN COMPOSITION LAYER, AND SEMICONDUCTOR DEVICE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-10 | — | — | EP | claimed |
| EP-3786233-A1 | RESIN COMPOSITION, LAMINATE, RESIN COMPOSITION LAYER-ATTACHED SEMICONDUCTOR WAFER, SUBSTRATE FOR MOUNTING RESIN COMPOSITION LAYER-ATTACHED SEMICONDUCTOR, AND SEMICONDUCTOR DEVICE | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2021-03-03 | — | — | EP | claimed |
| US-10066054-B2 | Continuous method for manufacturing a polyester from cyclic ester monomer | SULZER CHEMTECH AG (CH) | 2018-09-04 | — | — | US | claimed |
| US-20170240697-A1 | A Continuous Method for Manufacturing a Polyester from Cyclic Ester Monomer | SULZER CHEMTECH AG (CH) | 2017-08-24 | — | — | US | claimed |
| EP-3194468-A1 | A METHOD FOR STABILIZING A CONDENSED PHASE COMPOSITION INCLUDING A CYCLIC ESTER IN A PROCESS OF MANUFACTURING A POLYESTER OR OF LACTIDE | Sulzer Chemtech AG (CH) | 2017-07-26 | — | — | EP | claimed |
| EP-3180385-A1 | A CONTINUOUS METHOD FOR MANUFACTURING A POLYESTER FROM CYCLIC ESTER MONOMER | Sulzer Chemtech AG (CH) | 2017-06-21 | — | — | EP | claimed |
| WO-2016041782-A1 | A CONTINUOUS METHOD FOR MANUFACTURING A POLYESTER FROM CYCLIC ESTER MONOMER | SULZER CHEMTECH AG (CH) | 2016-03-24 | — | — | WO | claimed |
| WO-2016041722-A1 | A METHOD FOR STABILIZING A CONDENSED PHASE COMPOSITION INCLUDING A CYCLIC ESTER IN A PROCESS OF MANUFACTURING A POLYESTER OR OF LACTIDE | SULZER CHEMTECH AG (CH) | 2016-03-24 | — | — | WO | claimed |
| EP-2998337-A1 | A method for stabilizing a condensed phase composition including a cyclic ester for example in a process of manufacturing a polyester | Sulzer Chemtech AG (CH) | 2016-03-23 | — | — | EP | claimed |
| US-8123976-B2 | Alkaline aqueous solution composition used for washing or etching substrates | KANTO KAGAKU KABUSHIKI KAISHA (JP) | 2012-02-28 | — | — | US | claimed |
| US-20090001315-A1 | ALKALINE AQUEOUS SOLUTION COMPOSITION USED FOR WASHING OR ETCHING SUBSTRATES | KANTO KAGAKU KABUSHIKI KAISHA (JP) | 2009-01-01 | — | — | US | claimed |
| US-7161046-B2 | Process for the preparation of alkylene glycols | SAUDI BASIC INDUSTRIES CORPORATION (SA) | 2007-01-09 | — | — | US | claimed |
| US-20060069293-A1 | Process for the preparation of alkylene glycols | SAUDI BASIC INDUSTRIES CORPORATION | 2006-03-30 | — | — | US | claimed |
| US-12568848-B2 | Film, laminate, semiconductor wafer with film layer, substrate for mounting a semiconductor with film layer, and semiconductor device | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2026-03-03 | — | — | US | disclosed |
| US-4271251-A | LEUCO DYE, PHOTOOXIDIZER, 2,4-DIHYDROXY-BENZALDOXIME | FUJI PHOTO FILM CO., LTD. (JP) | 1981-06-02 | — | — | US | disclosed |
| US-4066459-A | IMINE COMPOUNDS | HORIZONS INCORPORATED, A DIVISION OF HORIZONS RESEARCH INCORPORATED (US) | 1978-01-03 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-12568848-B2 | Film, laminate, semiconductor wafer with film layer, substrate for mounting a semiconductor with film layer, and semiconductor device | TET1, TET3, GPX4 | CA12 204/4885CA2 339/4885CA9 160/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.