SCHEMBL7106151

SCHEMBL7106151

CCc1ccc(OC(C)OCC(C)C)cc1

nearest known ligand 0.44

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
PPARG P37231 1/20 0.41
PPARA Q07869 1/20 0.41
NPC1 O15118 1/20 0.37
CYP2C19 P33261 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
POLB P06746 2/20 0.36
CYP1A2 P05177 1/20 0.35
CYP3A4 P08684 1/20 0.35
CYP2C9 P11712 1/20 0.35
MAPT P10636 3/20 0.34
ALDH1A1 P00352 1/20 0.34
LMNA P02545 1/20 0.34
HPGD P15428 1/20 0.34
ABCB1 P08183 2/20 0.33
TSHR P16473 1/20 0.33
MAPK1 P28482 1/20 0.33
ATM Q13315 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
L3MBTL1 Q9Y468 1/20 0.33
RXRA P19793 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7101059 0.86 PPARG (0.41) PPARGPPARAPOLBMAPTALDH1A1
SCHEMBL5701335 0.85 PPARA (0.42) PPARGPPARACYP2C19SMN1; SMN2POLB
SCHEMBL5300988 0.84 PPARG (0.47) PPARGPPARACYP2C19SMN1; SMN2POLB
SCHEMBL7104719 0.83 SLC6A4 (0.35) PPARGPPARANPC1POLB
SCHEMBL7104721 0.82 HTT (0.38) CYP2C19SMN1; SMN2POLBMAPTMAPK1
SCHEMBL13156094 0.80 PPARG (0.45) PPARGPPARACYP2C19SMN1; SMN2POLB
SCHEMBL13439646 0.80 ALDH1A1 (0.40) PPARGPPARASMN1; SMN2MAPTALDH1A1
SCHEMBL14047944 0.80 CYP1A2 (0.33) CYP2C19SMN1; SMN2POLBCYP1A2MAPT
SCHEMBL10231953 0.79 IDO1 (0.37) NPC1CYP2C19SMN1; SMN2POLBCYP1A2
SCHEMBL4965000 0.79 SLC2A1 (0.35) CYP2C19POLBCYP1A2CYP3A4CYP2C9

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170329224-A1 PROCESS FOR PRODUCING PHOTORESIST PATTERN AND PHOTORESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2017-11-16 US disclosed
EP-1113005-B1 Sulfonium salt compounds WAKO PURE CHEM IND LTD (JP) 2003-08-06 EP disclosed
EP-1238969-A2 Sulfonium salt compounds Wako Pure Chemical Industries, Ltd. (JP) 2002-09-11 EP disclosed
EP-1113005-A1 Sulfonium salt compounds Wako Pure Chemical Industries, Ltd. (JP) 2001-07-04 EP disclosed