SCHEMBL7110883

SCHEMBL7110883

CC(C/C=C/c1ccccc1)OC(C)C/C=C/c1ccccc1

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
HTR2A P28223 3/20 0.63
IDO1 P14902 2/20 0.47
GRIK1 P39086 2/20 0.42
GRIK2 Q13002 2/20 0.42
PAM P19021 1/20 0.42
MEN1 O00255 1/20 0.42
KMT2A Q03164 1/20 0.42
NPC1 O15118 1/20 0.41
MTOR P42345 1/20 0.41
TP53 P04637 1/20 0.41
CYP3A4 P08684 1/20 0.41
CYP2D6 P10635 1/20 0.41
CYP2C9 P11712 1/20 0.41
MAPK1 P28482 1/20 0.41
CYP2C19 P33261 1/20 0.41
HSD17B10 Q99714 1/20 0.41
RELA Q04206 1/20 0.40
CHRNB2 P17787 1/20 0.40
CHRNA7 P36544 1/20 0.40
KDM4E B2RXH2 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7110886 1.00 HTR2A (0.63) HTR2AIDO1GRIK1GRIK2PAM
SCHEMBL2170349 0.81 HTR2A (0.70) HTR2AIDO1GRIK1GRIK2PAM
SCHEMBL107851 0.81 HTR2A (0.70) HTR2AIDO1GRIK1GRIK2PAM
SCHEMBL107852 0.81 HTR2A (0.70) HTR2AIDO1GRIK1GRIK2PAM
SCHEMBL14037582 0.81 HTR2A (0.70) HTR2AIDO1GRIK1GRIK2PAM
SCHEMBL29021115 0.78 HTR2A (0.56) HTR2AIDO1GRIK1GRIK2PAM
SCHEMBL5475689 0.78 HTR2A (0.66) HTR2AIDO1GRIK1GRIK2PAM
SCHEMBL19604562 0.78 HTR2A (0.66) HTR2AIDO1GRIK1GRIK2PAM
SCHEMBL19586584 0.78 HTR2A (1.00) HTR2AIDO1GRIK1GRIK2PAM
SCHEMBL21189126 0.78 HTR2A (0.66) HTR2AIDO1GRIK1GRIK2PAM

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0794218-B1 Polycarbonate resin composition stabilized against radiation MITSUBISHI ENG PLASTICS CORP (JP) 2003-10-15 EP disclosed
US-6040367-A EXCELLENT RESISTANCE TO AN IONIZING RADIATION, IN WHICH HETEROCYCLIC COMPOUND CONTAINING OXYMETHYLENE UNITS MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 2000-03-21 US disclosed
US-5948838-A 0.01 TO 5 PARTS BY WEIGHT OF A COMPOUND CONTAINING OXYMETHYLENE UNIT MITSUBISHI ENGINEERING-PLASTICS CORP. (JP) 1999-09-07 US disclosed
EP-0794218-A2 Polycarbonate resin composition stabilized against radiation MITSUBISHI ENGINEERING-PLASTICS CORPORATION (JP) 1997-09-10 EP disclosed