Hydrazine

Hydrazine

SCHEMBL7120403

CC[Ga](Cl)CC.NN

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL3856168 0.87
Methylhydrazine SCHEMBL7127058 0.82
SCHEMBL7128732 0.75
SCHEMBL301806 0.67
SCHEMBL302869 0.64
Ethyl Chloride SCHEMBL11882212 0.61
Hydrazine SCHEMBL7128840 0.61
Propane SCHEMBL10555844 0.59
Propane SCHEMBL9551184 0.59
SCHEMBL7782451 0.58

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-1061083-B1 Adduct of a dialkylgalliumazide with hydrazine for MOCVD of GaN KOREA RES INST CHEM TECH (KR) 2003-04-02 EP disclosed
US-6329540-B1 FOR METAL ORGANIC CHEMICAL VAPOR DEPOSITION (MOCVD) PROCESS FOR FORMING A GALLIUM NITRIDE FILM ON SUBSTRATES KOREA RESEARCH INSTITUTE OF CHEMICAL TECHNOLOGY (KR) 2001-12-11 US disclosed
EP-1061083-A1 Adduct of a dialkylgalliumazide with hydrazine for MOCVD of GaN Korea Research Institute of Chemical Technology (KR) 2000-12-20 EP disclosed