SCHEMBL7129513

SCHEMBL7129513

C[Si](C)(C)CCOC(=O)C1CC2CCC1C2

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
POLB P06746 1/20 0.46
HSD11B1 P28845 1/20 0.39
HPGD P15428 3/20 0.38
EPHX2 P34913 2/20 0.37
GAA P10253 1/20 0.37
THRB P10828 1/20 0.37
L3MBTL1 Q9Y468 2/20 0.35
NPC1 O15118 2/20 0.35
RAB9A P51151 2/20 0.35
ALDH1A1 P00352 1/20 0.35
MAPT P10636 1/20 0.35
MAPK1 P28482 1/20 0.35
GFER P55789 1/20 0.35
KCNQ3 O43525 1/20 0.35
KCNQ2 O43526 1/20 0.35
KCNQ4 P56696 1/20 0.35
KCNQ5 Q9NR82 1/20 0.35
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
HTT P42858 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18922923 0.82 POLB (0.46) POLBHSD11B1HPGDEPHX2L3MBTL1
SCHEMBL9908386 0.80 POLB (0.47) POLBHSD11B1HPGDEPHX2GAA
SCHEMBL21853775 0.80 POLB (0.47) POLBHSD11B1HPGDEPHX2GAA
SCHEMBL12251293 0.79 POLB (0.44) POLBHSD11B1HPGDEPHX2L3MBTL1
SCHEMBL1862636 0.78 POLB (0.49) POLBHSD11B1HPGDEPHX2L3MBTL1
SCHEMBL31178057 0.78 POLB (0.49) POLBHSD11B1HPGDEPHX2L3MBTL1
SCHEMBL32688800 0.78 POLB (0.42) POLBHSD11B1HPGDEPHX2L3MBTL1
SCHEMBL16352926 0.78 POLB (0.42) POLBHSD11B1HPGDGAAL3MBTL1
SCHEMBL12120235 0.78 POLB (0.42) POLBHSD11B1HPGDEPHX2GAA
SCHEMBL13477395 0.78 POLB (0.42) POLBHSD11B1HPGDEPHX2L3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20020177066-A1 Silicon-containing copolymer and photosensitive resin composition containing the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 2002-11-28 US claimed
US-6670093-B2 Includes a maleic anhydride repeating unit, a norbornene repeating unit, and at least one silicon group-containing norbornene repeating unit INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE (TW) 2003-12-30 US disclosed
US-20020177066-A1 Silicon-containing copolymer and photosensitive resin composition containing the same INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE 2002-11-28 US disclosed