Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | POLB | P06746 | 1/20 | 0.47 |
| ▸ | HSD11B1 | P28845 | 1/20 | 0.40 |
| ▸ | HPGD | P15428 | 3/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.37 |
| ▸ | NPC1 | O15118 | 2/20 | 0.35 |
| ▸ | RAB9A | P51151 | 2/20 | 0.35 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.35 |
| ▸ | MAPT | P10636 | 1/20 | 0.35 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.35 |
| ▸ | GFER | P55789 | 1/20 | 0.35 |
| ▸ | KCNQ3 | O43525 | 1/20 | 0.35 |
| ▸ | KCNQ2 | O43526 | 1/20 | 0.35 |
| ▸ | KCNQ4 | P56696 | 1/20 | 0.35 |
| ▸ | KCNQ5 | Q9NR82 | 1/20 | 0.35 |
| ▸ | EPHX2 | P34913 | 2/20 | 0.34 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | HTT | P42858 | 2/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | GAA | P10253 | 1/20 | 0.34 |
| ▸ | THRB | P10828 | 1/20 | 0.34 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21853775 | 0.86 | POLB (0.47) | POLBHSD11B1HPGDL3MBTL1NPC1 | |
| SCHEMBL18922923 | 0.84 | POLB (0.46) | POLBHSD11B1HPGDL3MBTL1NPC1 | |
| SCHEMBL32688907 | 0.83 | POLB (0.45) | POLBHSD11B1HPGDL3MBTL1NPC1 | |
| SCHEMBL13564247 | 0.81 | POLB (0.44) | POLBHSD11B1HPGDL3MBTL1NPC1 | |
| SCHEMBL12251293 | 0.81 | POLB (0.44) | POLBHSD11B1HPGDL3MBTL1NPC1 | |
| SCHEMBL7129513 | 0.80 | POLB (0.46) | POLBHSD11B1HPGDL3MBTL1NPC1 | |
| SCHEMBL10172872 | 0.80 | POLB (0.42) | POLBHSD11B1HPGDL3MBTL1NPC1 | |
| SCHEMBL13477395 | 0.80 | POLB (0.42) | POLBHSD11B1HPGDL3MBTL1NPC1 | |
| SCHEMBL16352926 | 0.80 | POLB (0.42) | POLBHSD11B1HPGDL3MBTL1NPC1 | |
| SCHEMBL32688800 | 0.80 | POLB (0.42) | POLBHSD11B1HPGDL3MBTL1NPC1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-101906114-B | Cation ultraviolet curing group-containing silicon oxide compound and preparation method thereof | CHANGXING CHEMICAL MATERIALS ZHUHAI CO LTD | 2013-06-19 | — | — | CN | claimed |
| CN-101906114-A | Cation ultraviolet curing group-containing silicon oxide compound and preparation method thereof | CHANGXING CHEMICAL MATERIALS ZHUHAI CO LTD | 2010-12-08 | — | — | CN | claimed |
| US-9448482-B2 | Pattern forming method, resist pattern formed by the method, method for manufacturing electronic device using the same, and electronic device | FUJIFILM CORPORATION (JP) | 2016-09-20 | — | — | US | disclosed |
| US-20150253673-A1 | PATTERN FORMING METHOD, RESIST PATTERN FORMED BY THE METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING THE SAME, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-09-10 | — | — | US | disclosed |
| CN-102781911-B | Latent acids and their use | BASF SE | 2015-07-22 | — | — | CN | disclosed |
| CN-102186815-B | Sulfonium derivatives and the use therof as latent acids | BASF SE | 2014-07-30 | — | — | CN | disclosed |
| CN-101952269-B | Sulphonium salt initiators | BASF SE | 2014-06-25 | — | — | CN | disclosed |
| CN-102026967-B | Sulphonium salt initiators | CIBA HOLDING INC | 2013-09-18 | — | — | CN | disclosed |
| CN-101906114-B | Cation ultraviolet curing group-containing silicon oxide compound and preparation method thereof | CHANGXING CHEMICAL MATERIALS ZHUHAI CO LTD | 2013-06-19 | — | — | CN | disclosed |
| CN-102161637-B | Photoactive compound | AZ ELECTRONIC MATERIALS USA | 2013-03-13 | — | — | CN | disclosed |
| CN-102161635-B | Photoactive compound | AZ ELECTRONIC MATERIALS USA | 2013-01-02 | — | — | CN | disclosed |
| CN-101679721-A | Resin composition, filling material, insulating layer and semiconductor device | SUMITOMO BAKELITE CO | 2010-03-24 | — | — | CN | disclosed |
| US-20090286188-A1 | Patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2009-11-19 | — | — | US | disclosed |
| US-7547501-B2 | Photoactive compounds | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2009-06-16 | — | — | US | disclosed |
| US-20080187868-A1 | Photoactive Compounds | AZ ELECTRONIC MATERIALS USA CORP. | 2008-08-07 | — | — | US | disclosed |
| US-20080085463-A1 | PHOTOACTIVE COMPOUNDS | AZ ELECTRONICS MATERIALS USA CORP. | 2008-04-10 | — | — | US | disclosed |
| CN-100363343-C | Photoactive compounds | AZ ELECTRONIC MATERIALS USA (US) | 2008-01-23 | — | — | CN | disclosed |
| CN-1303114-C | Cross-linking monomer using for photoresist and process for producing photoresist polymer using the same | HYUNDAI ELECTRONICS IND (KR) | 2007-03-07 | — | — | CN | disclosed |
| CN-1791573-A | Photoactive compounds | AZ ELECTRONIC MATERIALS USA (US) | 2006-06-21 | — | — | CN | disclosed |
| CN-1258670-A | Cross-linking monomer using for photoresist and process for producing photoresist polymer using the same | HYUNDAI ELECTRONICS IND (KR) | 2000-07-05 | — | — | CN | disclosed |