SCHEMBL7153273

SCHEMBL7153273

CCCCCCCCCC[P+](CCCCCCCCCC)(CCCCCCCCCC)CCCCCCCCCC.F[B-](F)(F)F

nearest known ligand 0.74

Predicted protein targets (top 8)

geneUniProtsupporting neighboursconfidence
DNM1 Q05193 6/20 0.74
TSHR P16473 2/20 0.44
THRB P10828 1/20 0.44
BDKRB2 P30411 3/20 0.39
LMNA P02545 2/20 0.39
MAPT P10636 1/20 0.38
OPRM1 P35372 1/20 0.36
ALDH1A1 P00352 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4532139 1.00 DNM1 (0.74) DNM1TSHRTHRBBDKRB2LMNA
SCHEMBL344163 1.00 DNM1 (0.74) DNM1TSHRTHRBBDKRB2LMNA
SCHEMBL4529953 1.00 DNM1 (0.74) DNM1TSHRTHRBBDKRB2LMNA
SCHEMBL10781521 1.00 DNM1 (0.74) DNM1TSHRTHRBBDKRB2LMNA
SCHEMBL4534803 1.00 DNM1 (0.74) DNM1TSHRTHRBBDKRB2LMNA
SCHEMBL2771548 1.00 DNM1 (0.74) DNM1TSHRTHRBBDKRB2LMNA
SCHEMBL4526503 1.00 DNM1 (0.74) DNM1TSHRTHRBBDKRB2LMNA
SCHEMBL4520327 0.97 DNM1 (0.79) DNM1TSHRTHRBBDKRB2LMNA
SCHEMBL4527227 0.97 DNM1 (0.79) DNM1TSHRTHRBBDKRB2LMNA
SCHEMBL3784215 0.97 DNM1 (0.79) DNM1TSHRTHRBBDKRB2LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023180310-A1 A PROCESS UTILIZING A THERMOMORPHIC DEEP EUTECTIC SOLVENT SYSTEM WITHIN BIOCATALYTIC APPLICATIONS TO RECOVER THE BIOCATALYST AND THE PRODUCTS AARHUS UNIVERSITET (DK) 2023-09-28 WO claimed
WO-2023180310-A1 A PROCESS UTILIZING A THERMOMORPHIC DEEP EUTECTIC SOLVENT SYSTEM WITHIN BIOCATALYTIC APPLICATIONS TO RECOVER THE BIOCATALYST AND THE PRODUCTS AARHUS UNIVERSITET (DK) 2023-09-28 WO disclosed
US-10100214-B2 Ink composition for ink jet SEIKO EPSON CORPORATION (JP) 2018-10-16 US disclosed
US-20170283641-A1 INK COMPOSITION FOR INK JET SEIKO EPSON CORP (JP) 2017-10-05 US disclosed
US-9708499-B2 Ink composition for ink jet SEIKO EPSON CORPORATION (JP) 2017-07-18 US disclosed
US-20160333211-A1 INK COMPOSITION FOR INK JET SEIKO EPSON CORPORATION (JP) 2016-11-17 US disclosed
EP-1287007-A1 PHOSPHONIUM SALTS CYTEC TECHNOLOGY CORP. (US) 2003-03-05 EP disclosed
WO-2001087900-A1 PHOSPHONIUM SALTS CYTEC TECHNOLOGY CORP. (US) 2001-11-22 WO disclosed