SCHEMBL7156178

SCHEMBL7156178

CCO[Si](CCN=C=O)(CCN=C=O)OCC

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL395331 0.92
SCHEMBL2888671 0.89
SCHEMBL1456199 0.88
SCHEMBL19125248 0.83 NAAA (0.31)
SCHEMBL151263 0.83
SCHEMBL15157925 0.81
SCHEMBL393630 0.81
SCHEMBL191068 0.80
SCHEMBL23521497 0.79
SCHEMBL394078 0.79

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6653043-B1 Mixtures of photoresists, sensitizers and active materials such as silica sol modified by resorcin coupled to silanes, used to improve sensitivity and resolution KANSAI RESEARCH INSTITUTE, INC. (JP) 2003-11-25 US disclosed
US-6534235-B1 Photosensitive resin and inorganic particles having a functional group obtained by a reaction between inorganic particles and a coupling agent KANSAI RESEARCH INSTITUTE, INC. (JP) 2003-03-18 US disclosed
EP-1096313-A1 Active particle, photosensitive resin composition, and process for forming pattern Kansai Research Institute, Inc. (JP) 2001-05-02 EP disclosed