SCHEMBL7158382

SCHEMBL7158382

C=CC(=O)OC(C)(C)CC(C)(C)OC(=O)C=C

nearest known ligand 0.40

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
TSHR P16473 8/20 0.40
ALDH1A1 P00352 6/20 0.39
TP53 P04637 3/20 0.39
HIF1A Q16665 3/20 0.39
CYP3A4 P08684 2/20 0.39
MAPK1 P28482 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39
HPGD P15428 1/20 0.39
HSD17B10 Q99714 1/20 0.38
THRB P10828 4/20 0.36
THRA P10827 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL15743892 0.94 TSHR (0.36) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL1108027 0.91 TSHR (0.38) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL23771556 0.89 ALDH1A1 (0.39) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL29072786 0.89 TSHR (0.36) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL19495089 0.88 TSHR (0.36) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL21626582 0.87 TSHR (0.35) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL6330520 0.87 TSHR (0.35) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL23746012 0.87 TSHR (0.35) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL17863839 0.87 TSHR (0.44) TSHRALDH1A1TP53HIF1ACYP3A4
SCHEMBL4590512 0.86 TSHR (0.40) TSHRALDH1A1TP53HIF1ACYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 22 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250155808-A1 RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN ZEON CORPORATION (JP) 2025-05-15 US disclosed
WO-2024070672-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 日本ゼオン株式会社 2024-04-04 WO disclosed
WO-2023189969-A1 RESIST COMPOSITION AND METHOD FOR FORMING RESIST PATTERN 日本ゼオン株式会社 2023-10-05 WO disclosed
EP-3932906-B1 NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, AND CURED OBJECT ADEKA CORP (JP) 2023-07-12 EP disclosed
US-11667609-B2 Compound, composition containing said compound, self-healing material, surface coating agent, paint, adhesive, material for battery and cured product ADEKA CORPORATION (JP) 2023-06-06 US disclosed
CN-113544120-B Novel compound, composition containing same, self-repairing material, surface coating agent, paint, adhesive, battery material, and cured product 株式会社ADEKA 2023-05-02 CN disclosed
US-20220153698-A1 NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, SELF-HEALING MATERIAL, SURFACE COATING AGENT, PAINT, ADHESIVE, MATERIAL FOR BATTERY AND CURED PRODUCT ADEKA CORPORATION (JP) 2022-05-19 US disclosed
EP-3733780-A1 SILICONE RUBBER COMPOSITION AND COMPOSITE OBTAINED USING SAME Dow Toray Co., Ltd. (JP) 2020-11-04 EP disclosed
WO-2020189208-A1 LIQUID CRYSTAL COMPOSITE AND LIQUID CRYSTAL DIMMING ELEMENT JNC株式会社 2020-09-24 WO disclosed
WO-2020158038-A1 LIQUID CRYSTAL COMPOSITE AND LIQUID CRYSTAL DIMMER ELEMENT JNC株式会社 2020-08-06 WO disclosed
EP-3101171-B1 MALODOR COUNTERACTING COMPOSITIONS INT FLAVORS & FRAGRANCES INC (US) 2020-02-19 EP disclosed
EP-3553154-A1 LIQUID CRYSTAL COMPOSITE AND LIQUID CRYSTAL DIMMER ELEMENT JNC Corporation (JP) 2019-10-16 EP disclosed
US-9784965-B2 Display element, photosensitive composition and electrowetting display JSR CORPORATION (JP) 2017-10-10 US disclosed
US-9753274-B2 Display element, photosensitive composition and electrowetting display JSR CORPORATION (JP) 2017-09-05 US disclosed
US-9625706-B2 Display element, photosensitive composition and electrowetting display JSR CORPORATION (JP) 2017-04-18 US disclosed
US-20160306166-A1 DISPLAY ELEMENT, PHOTOSENSITIVE COMPOSITION AND ELECTROWETTING DISPLAY JSR CORPORATION (JP) 2016-10-20 US disclosed
US-20160195709-A1 DISPLAY ELEMENT, PHOTOSENSITIVE COMPOSITION AND ELECTROWETTING DISPLAY JSR CORPORATION (JP) 2016-07-07 US disclosed
US-20160178893-A1 DISPLAY ELEMENT, PHOTOSENSITIVE COMPOSITION AND ELECTROWETTING DISPLAY JSR CORPORATION (JP) 2016-06-23 US disclosed
US-7314701-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2008-01-01 US disclosed
US-6537724-B1 Photoresist resins comprising a mixture of polymers which have different properties HYUNDAI ELECTRONICS INDUSTRIES CO., LTD. (KR) 2003-03-25 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-11667609-B2 Compound, composition containing said compound, self-healing material, surface coating agent, paint, adhesive, material for battery and cured product H1-0, H1-10, RAD51 TSHR 4534/4885ALDH1A1 323/4885TP53 2667/4885
US-20220153698-A1 NOVEL COMPOUND, COMPOSITION CONTAINING SAID COMPOUND, SELF-HEALING MATERIAL, SURFACE COATING AGENT, PAINT, ADHESIVE, MATERIAL FOR BATTERY AND CURED PRODUCT H1-0, H1-10, RAD51 TSHR 4592/4885ALDH1A1 367/4885TP53 2848/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.