SCHEMBL7159595

SCHEMBL7159595

C1=CCC=C1.CC[Ru]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Propane SCHEMBL28004055 0.85
Butane SCHEMBL5376693 0.81
Alcohol SCHEMBL4667948 0.79
Butane SCHEMBL28092363 0.79
Bromoethane SCHEMBL28828229 0.79
Butane SCHEMBL27463824 0.79
Alcohol SCHEMBL1445684 0.79 ALDH1A1 (0.43)
Ethane SCHEMBL27413818 0.76
Ethane SCHEMBL27410589 0.76
SCHEMBL1112264 0.76

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6544835-B2 Method of forming a ruthenium film by CVD HITACHI, LTD. (JP) 2003-04-08 US disclosed
US-20020160566-A1 Semiconductor integrated circuit device and process for manufacturing the same RENESAS ELECTRONICS CORPORATION (JP) 2002-10-31 US disclosed
US-6423593-B1 Semiconductor integrated circuit device and process for manufacturing the same HITACHI, LTD. (JP) 2002-07-23 US disclosed
US-20020047152-A1 Semiconductor integrated circuit device and process for manufacturing the same HITACHI, INC. (JP) 2002-04-25 US disclosed