SCHEMBL7162162

SCHEMBL7162162

C=CCn1c(=O)n(CC(C)O)c(=O)n(CC(C)O)c1=O

nearest known ligand 0.61

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP3A4 P08684 2/20 0.61
NPSR1 Q6W5P4 1/20 0.44
MAPT P10636 2/20 0.41
SMN1; SMN2 Q16637 2/20 0.39
KMT2A Q03164 1/20 0.39
ADORA2B P29275 3/20 0.37
GAA P10253 1/20 0.36
APLNR P35414 1/20 0.35
TDP1 Q9NUW8 1/20 0.35
ATM Q13315 2/20 0.35
NPC1 O15118 1/20 0.35
RAB9A P51151 1/20 0.35
L3MBTL1 Q9Y468 1/20 0.35
CYP1A2 P05177 1/20 0.35
CYP2D6 P10635 1/20 0.35
ADORA2A P29274 2/20 0.35
MAPK1 P28482 2/20 0.35
KDM4E B2RXH2 1/20 0.35
SLC5A2 P31639 1/20 0.35
PDE4A P27815 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7160182 1.00 CYP3A4 (0.61) CYP3A4NPSR1MAPTSMN1; SMN2KMT2A
SCHEMBL12040268 0.89 CYP3A4 (0.48) CYP3A4NPSR1MAPTSMN1; SMN2KMT2A
SCHEMBL24495872 0.84 CYP3A4 (0.67) CYP3A4NPSR1MAPTSMN1; SMN2KMT2A
SCHEMBL13286724 0.84 CYP3A4 (0.67) CYP3A4NPSR1MAPTSMN1; SMN2KMT2A
SCHEMBL260676 0.83 KDM4E (0.43) MAPTSMN1; SMN2ADORA2BTDP1ATM
SCHEMBL12774670 0.81 CYP3A4 (0.57) CYP3A4NPSR1MAPTSMN1; SMN2KMT2A
SCHEMBL24495893 0.81 CYP3A4 (0.57) CYP3A4NPSR1MAPTSMN1; SMN2KMT2A
SCHEMBL17340081 0.81 CYP3A4 (0.40) CYP3A4NPSR1MAPT
SCHEMBL24495805 0.80 CYP3A4 (0.55) CYP3A4NPSR1MAPTSMN1; SMN2KMT2A
SCHEMBL14312177 0.79 CYP3A4 (0.59) CYP3A4NPSR1MAPTSMN1; SMN2KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-59076073-A None JP disclosed
US-9250525-B2 Resist underlayer film-forming composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-02-02 US disclosed
US-20150362838-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL IND LTD (JP) 2015-12-17 US disclosed
US-9212255-B2 Resist underlayer film-forming composition NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-12-15 US disclosed
US-20150087155-A1 RESIST UNDERLAYER FILM-FORMING COMPOSITION NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-03-26 US disclosed
JP-2003100146-A CONDUCTIVE PASTE AND MANUFACTURING METHOD OF WIRING BOARD USING IT KYOCERA CORP 2003-04-04 JP disclosed
JP-S5976073-A DI(HYDROXYPROPYL)ALLYLISOCYANURATE RES INST FOR PROD DEV 1984-04-28 JP disclosed