Ricinoleic Acid

Ricinoleic Acid

SCHEMBL716804

CCCCCC[C@@H](O)C/C=C\CCCCCCCC(=O)O.OCC(O)CO

nearest known ligand 0.89

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
FFAR1 O14842 2/20 0.89
FFAR4 Q5NUL3 2/20 0.89
FAAH O00519 3/20 0.69
NFKB1 P19838 1/20 0.67
NFKB2 Q00653 1/20 0.67
RELA Q04206 1/20 0.67
PPARG P37231 4/20 0.62
TERT O14746 3/20 0.62
PTPN1 P18031 3/20 0.62
PPARD Q03181 3/20 0.62
PPARA Q07869 3/20 0.62
MAPT P10636 2/20 0.62
BLM P54132 2/20 0.62
HSD17B10 Q99714 2/20 0.62
FABP4 P15090 2/20 0.62
F7 P08709 2/20 0.62
F3 P13726 2/20 0.62
GMNN O75496 1/20 0.62
USP2 O75604 1/20 0.62
LMNA P02545 1/20 0.62

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ricinoleic Acid SCHEMBL30613320 1.00 FFAR1 (0.89) FFAR1FFAR4FAAHNFKB1NFKB2
Ricinoleic Acid SCHEMBL27360539 1.00 FFAR1 (0.89) FFAR1FFAR4FAAHNFKB1NFKB2
Ricinoleic Acid SCHEMBL28604364 1.00 FFAR1 (0.89) FFAR1FFAR4FAAHNFKB1NFKB2
Ricinoleic Acid SCHEMBL31490260 1.00 FFAR1 (0.89) FFAR1FFAR4FAAHNFKB1NFKB2
Ricinoleic Acid SCHEMBL4435445 1.00 FFAR1 (0.89) FFAR1FFAR4FAAHNFKB1NFKB2
Ricinoleic Acid SCHEMBL31333156 1.00 FFAR1 (0.89) FFAR1FFAR4FAAHNFKB1NFKB2
Ricinoleic Acid SCHEMBL31357513 1.00 FFAR1 (0.89) FFAR1FFAR4FAAHNFKB1NFKB2
Ricinoleic Acid SCHEMBL8734222 1.00 FFAR1 (0.89) FFAR1FFAR4FAAHNFKB1NFKB2
Ricinoleic Acid SCHEMBL21356678 1.00 FFAR1 (0.89) FFAR1FFAR4FAAHNFKB1NFKB2
Ricinoleic Acid SCHEMBL28816965 0.97 FFAR1 (0.85) FFAR1FFAR4FAAHNFKB1NFKB2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 57 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113621146-B Antifogging, antibacterial and mildew-proof polylactic acid master batch, film thereof and preparation method thereof 厦门长塑实业有限公司 2024-02-27 CN claimed
EP-3528784-B1 SUPPOSITORIES COMPRISING CANNABINOIDS APIRX PHARMACEUTICAL USA LLC (US) 2023-08-02 EP claimed
US-20120053133-A1 ANTISEPTIC AGENT COMPOSITION TAIYO CORPORATION (JP) 2012-03-01 US claimed
EP-3950793-B1 POLYLACTIC ACID RESIN EXPANDED SHEET, RESIN MOLDED ARTICLE, AND METHOD FOR PRODUCING POLYLACTIC ACID RESIN EXPANDED SHEET SEKISUI KASEI CO LTD (JP) 2026-05-27 EP disclosed
US-12624611-B2 Expanding metal for plug and abandonment HALLIBURTON ENERGY SERVICES, INC. (US) 2026-05-12 US disclosed
US-20250388472-A1 CARBON NANOTUBE DISPERSION, AND RESIN COMPOSITION, CONDUCTIVE FILM, MIXTURE SLURRY, ELECTRODE FILM, AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY USING SAME ARTIENCE CO., LTD. (JP) 2025-12-25 US disclosed
US-12492126-B2 Carbon nanotube dispersion composition, carbon nanotube resin composition, mixture slurry, electrode film, and non-aqueous electrolyte secondary battery ARTIENCE CO., LTD. (JP) 2025-12-09 US disclosed
EP-4597637-A1 CARBON NANOTUBE DISPERSION, AND RESIN COMPOSITION, CONDUCTIVE FILM, MIXTURE SLURRY, ELECTRODE, AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY USING SAME artience Co., Ltd. (JP) 2025-08-06 EP disclosed
US-20250223168-A1 CARBON NANOTUBE DISPERSION COMPOSITION, CARBON NANOTUBE RESIN COMPOSITION, MIXTURE SLURRY, ELECTRODE FILM, AND NON-AQUEOUS ELECTROLYTE SECONDARY BATTERY ARTIENCE CO., LTD. (JP) 2025-07-10 US disclosed
EP-4538228-A1 CARBON NANOTUBE DISPERSED COMPOSITION, CARBON NANOTUBE RESIN COMPOSITION, MIXTURE SLURRY, ELECTRODE FILM, AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY artience Co., Ltd. (JP) 2025-04-16 EP disclosed
CN-119732900-A Compound selenium sulfide composition and preparation method and application thereof 海南海和制药有限公司 2025-04-01 CN disclosed
US-20220178222-A1 EXPANDING METAL FOR PLUG AND ABANDONMENT HALLIBURTON ENERGY SERVICES, INC. 2022-06-09 US disclosed
US-20220169817-A1 METHOD FOR PRODUCING BIODEGRADABLE RESIN EXPANDED SHEET SEKISUI KASEI CO., LTD. (JP) 2022-06-02 US disclosed
US-20220145035-A1 LAMINATED FOAM SHEET SEKISUI KASEI CO., LTD. (JP) 2022-05-12 US disclosed
US-20220081554-A1 POLYLACTIC ACID RESIN EXPANDED SHEET, RESIN MOLDED ARTICLE, AND METHOD FOR PRODUCING POLYLACTIC ACID RESIN EXPANDED SHEET SEKISUI KASEI CO., LTD. (JP) 2022-03-17 US disclosed
EP-3950299-A1 LAMINATED FOAM SHEET Sekisui Kasei Co., Ltd. (JP) 2022-02-09 EP disclosed
WO-2021261523-A1 INTERMEDIATE FILM FOR LAMINATED GLASSES, AND LAMINATED GLASS 積水化学工業株式会社 2021-12-30 WO disclosed
CN-109645235-A A kind of lutein ester feed addictive and preparation method thereof 山东智领生物科技股份有限公司 2019-04-19 CN disclosed
US-20120053133-A1 ANTISEPTIC AGENT COMPOSITION TAIYO CORPORATION (JP) 2012-03-01 US disclosed
US-4626444-A Process for preparation of dressings comprising W/O/W type multiple emulsions MEIJI MILK PRODUCTS COMPANY LIMITED (JP) 1986-12-02 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (2 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20250388472-A1 CARBON NANOTUBE DISPERSION, AND RESIN COMPOSITION, CONDUCTIVE FILM, MIXTURE SLURRY, ELECTRODE FILM, AND NONAQUEOUS ELECTROLYTE SECONDARY BATTERY USING SAME CNTN1, TEX10, RCC1 FFAR1 4365/4885FFAR4 4544/4885FAAH 4444/4885
US-12624611-B2 Expanding metal for plug and abandonment GET3, CTCF, SLC39A3 FFAR1 3575/4885FFAR4 2893/4885FAAH 4404/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.