SCHEMBL7169504

SCHEMBL7169504

C=COCC.C=COCCC

nearest known ligand 0.33

Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 1/20 0.33
ALDH1A1 P00352 1/20 0.33
MAPT P10636 1/20 0.33
HTT P42858 1/20 0.33
TSHR P16473 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21295903 0.91 ALDH1A1 (0.36) KDM4EALDH1A1MAPTHTTTSHR
SCHEMBL36108 0.91
Butane SCHEMBL8216264 0.88 ALDH1A1 (0.35) KDM4EALDH1A1MAPTHTTTSHR
Water SCHEMBL29011338 0.88 ALDH1A1 (0.35) KDM4EALDH1A1MAPTHTTTSHR
Water SCHEMBL27618542 0.88
Ammonia Solution, Strong SCHEMBL741408 0.88
Ethylene SCHEMBL3959150 0.88
Ammonia Solution, Strong SCHEMBL11078007 0.88
Fluoride SCHEMBL28059455 0.88
SCHEMBL28027544 0.88

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-3993624-A Light-sensitive high molecular weight compound capable of being cross-linked by irradiation with light or an electron beam FUJI PHOTO FILM CO., LTD. (JA) 1976-11-23 US claimed
US-6566028-B2 Toner particles each have a silicon compound-containing coating layer formed on the surface and are stuck to one another CANON KABUSHIKI KAISHA (JP) 2003-05-20 US disclosed
US-20020197551-A1 Toner, and process for producing toner TAZAWA YAYOI (JP) 2002-12-26 US disclosed
US-6358658-B1 COLOR TONERS AND BINDERS CANON KABUSHIKI KAISHA (JP) 2002-03-19 US disclosed
EP-1003080-A1 Toner, and process for producing toner CANON KABUSHIKI KAISHA (JP) 2000-05-24 EP disclosed
US-4100225-A ANTISOILANT CIBA-GEIGY CORPORATION (US) 1978-07-11 US disclosed