⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ammonia Solution, Strong SCHEMBL30216781 | 0.96 | — | — | |
| SCHEMBL20987333 | 0.74 | — | — | |
| SCHEMBL2307231 | 0.67 | TSHR (0.33) | — | |
| SCHEMBL6461850 | 0.67 | — | — | |
| SCHEMBL17008598 | 0.67 | — | — | |
| SCHEMBL6686 | 0.65 | — | — | |
| SCHEMBL3899946 | 0.65 | ALDH1A1 (0.31) | — | |
| SCHEMBL1014268 | 0.64 | — | — | |
| SCHEMBL20522573 | 0.61 | — | — | |
| SCHEMBL1136669 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 171 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| WO-2025245366-A1 | COMPOSITIONS, METHODS, AND SYSTEMS FOR CARBON CAPTURE | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2025-11-27 | — | — | WO | claimed |
| CN-117659351-A | Silicon-nitrogen modified epoxy resin, preparation method thereof, photosensitive resin prepared from silicon-nitrogen modified epoxy resin and preparation method of photosensitive resin | 上海信斯帝克新材料有限公司 | 2024-03-08 | — | — | CN | claimed |
| WO-2023244541-A1 | COMPOSITIONS, METHODS, AND SYSTEMS FOR CARBON CAPTURE | BOARD OF REGENTS, THE UNIVERSITY OF TEXAS SYSTEM (US) | 2023-12-21 | — | — | WO | claimed |
| CN-114058019-B | Ultrahigh-temperature ceramic precursor capable of being melt-spun, and preparation method and application thereof | 中国人民解放军国防科技大学 | 2023-02-07 | — | — | CN | claimed |
| CN-114058019-A | Ultrahigh-temperature ceramic precursor capable of being melt-spun, and preparation method and application thereof | 中国人民解放军国防科技大学 | 2022-02-18 | — | — | CN | claimed |
| US-20180135167-A1 | Transparent Sheet Materials | FUJIFILM MANUFACTURING EUROPE B.V. (NL) | 2018-05-17 | — | — | US | claimed |
| EP-2362809-A2 | PROCESS FOR ACCELERATED CAPTURE OF CARBON DIOXIDE | Akermin, Inc. (US) | 2011-09-07 | — | — | EP | claimed |
| WO-2010037109-A2 | PROCESS FOR ACCELERATED CAPTURE OF CARBON DIOXIDE | AKERMIN, INC. (US) | 2010-04-01 | — | — | WO | claimed |
| US-6365643-B1 | Photoinitiators for cationic curing | TH. GOLDSCHMIDT AG (DE) | 2002-04-02 | — | — | US | claimed |
| EP-0184567-B1 | PROCESS FOR THE FORMATION OF NEGATIVE PATTERNS IN A PHOTORESIST LAYER | UCB Electronics, S.A. (BE) | 1989-12-13 | — | — | EP | claimed |
| EP-0248779-A1 | Process for producing positive patterns in a photoresist layer | U C B, S.A. (BE) | 1987-12-09 | — | — | EP | claimed |
| EP-0184567-A1 | Process for the formation of negative patterns in a photoresist layer | UCB Electronics, S.A. (BE) | 1986-06-11 | — | — | EP | claimed |
| JP-4187673-A | — | — | None | — | — | JP | disclosed |
| WO-2025261606-A1 | METHOD FOR ANALYSIS OF A CHROMATOGRAM | HighChem s.r.o. (SK) | 2025-12-26 | — | — | WO | disclosed |
| WO-2025261604-A1 | METHOD FOR ANALYSIS OF A CHROMATOGRAM OF SAMPLES CONTAINING ISOMERS | HighChem s.r.o (SK) | 2025-12-26 | — | — | WO | disclosed |
| CN-121087487-A | Blade surface treatment method | 江西犀瑞制造有限公司 | 2025-12-09 | — | — | CN | disclosed |
| EP-0184567-A1 | Process for the formation of negative patterns in a photoresist layer | UCB Electronics, S.A. (BE) | 1986-06-11 | — | — | EP | disclosed |
| US-4550105-A | BETA-LACTAMASE INHIBITORS, ANTIBIOTICS | TAKEDA CHEMICAL INDUSTRIES, LTD. (JP) | 1985-10-29 | — | — | US | disclosed |
| US-4431508-A | Solid state graphite electrode | NUESTRO MEDICAL CORPORATION | 1984-02-14 | — | — | US | disclosed |
| EP-0053815-A1 | 2-Oxoazetidine derivatives, their production and use | Takeda Chemical Industries, Ltd. (JP) | 1982-06-16 | — | — | EP | disclosed |